Patents by Inventor Malav KAPADIA

Malav KAPADIA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SITU CLEAN FOR BEVEL AND EDGE RING
    Publication number: 20230386823
    Abstract: Embodiments disclosed herein include a method for cleaning a bevel area of a substrate support disposed within a plasma processing chamber. In one example the method begins by placing a cover substrate on a substrate support disposed in an interior volume of a processing chamber. A cleaning gas is provided into the interior volume of the processing chamber. A plasma is struck in the interior volume of the processing chamber. A cleaning gas is provided through the substrate support to a bevel edge area defined between an outer diameter of the cover substrate and an edge ring disposed on the substrate support.
    Type: Application
    Filed: May 31, 2022
    Publication date: November 30, 2023
    Inventors: Kaushik ALAYAVALLI, Andrew NGUYEN, Edward HAYWOOD, Lu LIU, Malav KAPADIA