Abstract: A plasma control system including a direct digital synthesizer (DDS) for generating more than one individual RF power signal, where the individual RF power signals are combined to define a combined RF power signal. The DDS includes an accumulator which receives a phase increment signal that defines a frequency of a frequency signal generated by the accumulator. The frequency signal is split and input to a plurality of adders. Each adder receives a phase offset signal that defines a phase shift of the frequency signal input to that particular adder. The phase increment signal and phase offset may be stored to reduce the startup portion of the plasma control system.

Abstract: A plasma control system including a direct digital synthesizer (DDS) for generating more than one individual RF power signal, where the individual RF power signals are combined to define a combined RF power signal. The DDS includes an accumulator which receives a phase increment signal that defines a frequency of a frequency signal generated by the accumulator. The frequency signal is split and input to a plurality of adders. Each adder receives a phase offset signal that defines a phase shift of the frequency signal input to that particular adder. The phase increment signal and phase offset may be stored to reduce the startup portion of the plasma control system.