Abstract: An extreme ultraviolet source with wide-angle vapor containment and reflux is described. In the optical output directions radiating from the source plasma there is an array of tapered buffer gas heat pipes, with wick structures in the walls. In directions toward the insulators separating the discharge electrodes there are disc-shaped buffered gas heat pipes that prevent metal vapor from condensing on these insulators. A preferred electrode configuration has three electrode discs that operate in the star pinch mode. Another electrode configuration comprises two electrode discs and supports a pseudospark discharge. The star pinch variant of this source has efficiently generated 13.5 nm radiation with lithium vapor and helium buffer gas.

Abstract: Small, high velocity liquid metal droplets are produced for applications that require the accurate and remote placement of small quantities of a metal. The magnetic pressure of current flowing through liquid metal is used to force small quantities of liquid metal through an orifice. Examples of applications are to feed metal fuel into plasma extreme ultraviolet sources, and to place solder bumps on an integrated circuit prior to the attachment of connections.

Abstract: A source of extreme ultraviolet or soft X-ray photon source includes discharge chamber containing a buffer gas, first and second electrodes in the discharge chamber configured to deliver a heating current to a plasma discharge region, and an injector to project a particle of a working substance into the plasma discharge region. The particle is evaporated and ionized by the heating current to form a hot plasma that radiates extreme ultraviolet or soft X-ray photons.

Abstract: An optically addressed extreme ultraviolet (EUV) modulator in which a spatial amplitude or phase pattern is provided to an EUV beam that is reflected from, or transmitted through the modulator. The modulator includes a modulator structure that includes a material with a high coefficient of thermal expansion. When a thermal impulse is incident on one part of the modulator, the resulting expansion changes the reflected phase or amplitude of the EUV beam from that part. A thermal pattern is imprinted on the modulator by absorption of a visible or ultraviolet pattern, resulting in a corresponding modulation of the EUV beam. A lithography system is based on the optically addressed EUV modulator.

Abstract: Light amplification for use in an optical amplifier or optical resonator can be obtained by exciting cadmium-mercury molecular dimer with an electron beam sustained discharge. Light amplification can also be obtained by exciting a mercury-ammonia complex with an electron beam sustained discharge or with mercury radiation at 2,537 Angstroms produced in an electron beam sustained discharge.