Abstract: Disclosed is a mask defect repair apparatus that is capable of performing defect repair with high accuracy without exposure of a mask to air while being moved between the mask defect repair apparatus and an inspection device. The mask defect repair apparatus emits charged particle beams with an amount of irradiation therewith which is corrected by a correction unit while supplying gas to a defect of the mask, thereby forming a deposition film.

Abstract: Disclosed is a mask defect repair apparatus that is capable of performing defect repair with high accuracy without exposure of a mask to air while being moved between the mask defect repair apparatus and an inspection device. The mask defect repair apparatus emits charged particle beams with an amount of irradiation therewith which is corrected by a correction unit while supplying gas to a defect of the mask, thereby forming a deposition film.

Abstract: Disclosed are a charged particle beam apparatus wherein the charged particle beam apparatus can efficiently performs finish processing of a sample and acquisition of a high-precision SEM image of a processing surface of the sample in a short time, and a sample processing observation method using the same. The charged particle beam apparatus includes: a gallium ion beam column radiating a gallium ion beam toward a sample to form a cross-section of the sample; an electron beam column having a semi-in-lens type objective lens and radiating an electron beam toward the sample; a gas ion beam column radiating a gas ion beam toward the sample to perform finish processing of the cross-section of the sample, wherein the gas ion beam has a beam diameter larger than a maximum diameter of the cross-section of the sample.

Abstract: Disclosed are a charged particle beam apparatus wherein the charged particle beam apparatus can efficiently performs finish processing of a sample and acquisition of a high-precision SEM image of a processing surface of the sample in a short time, and a sample processing observation method using the same. The charged particle beam apparatus includes: a gallium ion beam column radiating a gallium ion beam toward a sample to form a cross-section of the sample; an electron beam column having a semi-in-lens type objective lens and radiating an electron beam toward the sample; a gas ion beam column radiating a gas ion beam toward the sample to perform finish processing of the cross-section of the sample, wherein the gas ion beam has a beam diameter larger than a maximum diameter of the cross-section of the sample.

Abstract: A plasma ion source includes: a gas introduction chamber, into which raw gas is introduced; a plasma generation chamber connected to the gas introduction chamber and made of a dielectric material; a coil wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied; an envelope surrounding the gas introduction chamber, the plasma generation chamber and the coil; and insulating liquid filled inside the gas introduction chamber, the plasma generation chamber and the envelope to immerse the coil and having an dielectric strength voltage relatively greater than that of the envelope and the same dielectric dissipation factor as the plasma generation chamber.

Abstract: A plasma ion source includes: a gas introduction chamber, into which raw gas is introduced; an insulation member provided in the gas introduction chamber; a plasma generation chamber connected to the gas introduction chamber; a coil that is wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied; and an electrode arranged at a boundary between the gas introduction chamber and the plasma generation chamber and having a plurality of through-holes formed therein, wherein a size of the through-holes is smaller than a length of a plasma sheath.

Abstract: A plasma ion source includes: a gas introduction chamber, into which raw gas is introduced; a plasma generation chamber connected to the gas introduction chamber and made of a dielectric material; a coil wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied; an envelope surrounding the gas introduction chamber, the plasma generation chamber and the coil; and insulating liquid filled inside the gas introduction chamber, the plasma generation chamber and the envelope to immerse the coil and having an dielectric strength voltage relatively greater than that of the envelope and the same dielectric dissipation factor as the plasma generation chamber.

Abstract: A plasma ion source includes: a gas introduction chamber, into which raw gas is introduced; an insulation member provided in the gas introduction chamber; a plasma generation chamber connected to the gas introduction chamber; a coil that is wound along an outer circumference of the plasma generation chamber and to which high-frequency power is applied; and an electrode arranged at a boundary between the gas introduction chamber and the plasma generation chamber and having a plurality of through-holes formed therein, wherein a size of the through-holes is smaller than a length of a plasma sheath.

Abstract: A sample working/observing apparatus possesses a sample holding mechanism. The sample holding mechanism possesses a sample holder holding a sample, and a base detachably supporting the sample holder. Between these, there are detachably provided a rotation support part supporting so as to be rotatable, a slide support part supporting so as to be slidable from a rotation center toward an X-direction, and a butting support part supporting so as to be slidable in the X-direction and a Y-direction. In an upper face, there are provided an X-direction positioning pin and a Y-direction positioning pin, which are disposed along the Y-direction and the X-direction from the rotation center, and butt against one side and the other side of the sample.

Abstract: A sample working/observing apparatus possesses a sample holding mechanism. The sample holding mechanism possesses a sample holder holding a sample, and a base detachably supporting the sample holder. Between these, there are detachably provided a rotation support part supporting so as to be rotatable, a slide support part supporting so as to be slidable from a rotation center toward an X-direction, and a butting support part supporting so as to be slidable in the X-direction and a Y-direction. In an upper face, there are provided an X-direction positioning pin and a Y-direction positioning pin, which are disposed along the Y-direction and the X-direction from the rotation center, and butt against one side and the other side of the sample.

Abstract: A gas-insulated switch gear has a plurality of bay units having bus ducts each containing a three-phase bus and connected by bellows expansion joints. When the bay unit needs to be inspected for maintenance, the bellows expansion joints are compressed, and only the bay unit can be pulled out of the gas-insulated switchgear.

Abstract: A gas-insulated switchgear of an 1½ CB system, in which three circuit breakers are electrically connected in series between a pair of buses and a connecting line for supplying and receiving electric power is led out from between the circuit breakers, is characterized in that new connecting lines for supplying and receiving electric power are led out from the main buses through disconnecting switches to a diameter which is an end portion of the gas-insulated switchgear. A leading out side of the connecting lines is outside the main bus, and an installation area of the gas-insulated switch gear is not increased.

Abstract: When each three-phase bus conductor for connecting each cable head 251 connected to a generator through a transformer to a terminal pad 100 as an air outgoing point connected to a transmission line is grounded at a part thereof existing between each gas breaker 151 to 159 and the terminal pad 100, one of the ends of a capacitor 300 is connected to the terminal pad 100 as the air outgoing point and the other end, to the ground through a support plate 302, an enclosure 318 and a support table 320.

Abstract: A gas insulation switchgear having a lowered overall height is provided. The height of the gas insulation switchgear can be lowered by constructing the gas insulation switchgear so as to comprise a breaker unit 13 horizontally arranged in the lower side and containing a conductor for one phase in a container; an actuator 41 arranged in the axial direction of the breaker unit 13; and a main bus isolator unit 4 horizontally arranged in both sides of a bus side connecting conductor 46 through the bus side connecting conductor 46 arranged vertically and connected to the breaker unit 13.

Abstract: A gas-insulated switch gear has a plurality of bay units having bus ducts each containing a three-phase bus and connected by bellows expansion joints. When the bay unit needs to be inspected for maintenance, the bellows expansion joints are compressed, and only the bay unit can be pulled out of the gas-insulated switchgear.

Abstract: A gas-insulated switchgear of an 1.1/2CB system, in which three circuit breakers are electrically connected in series between a pair of buses and a connecting line for supplying and receiving electric power is led out from between the circuit breakers, is characterized in that new connecting lines for supplying and receiving electric power are led out from the main buses through disconnecting switches to a diameter which is an end portion of the gas-insulated switchgear. A leading out side of the connecting lines is outside the main bus, and an installation area of the gas-insulated switch gear is not increased.

Abstract: In a three-phase integrated gas insulated bus, three vertical outlets 3 are formed in the longitudinal direction of a cylindrical bus enclosure 1 and three horizontal outlets are formed in almost the same axial position as these vertical outlets 3 in the circumferential direction. The three-phase main bus conductors 7 are laid out to ensure that one side of a triangle having the apexes where three-phase main bus conductors 7 are located is approximately parallel to these horizontal outlets 4. The main bus conductors 7 are extended to the three vertical outlets 3 sequentially starting from the main bus of the phase closest to the vertical outlets 3, and branch buses 8 and 9 are led from the tip positions thereof to the vertical outlets 5 and horizontal outlets 6.

Abstract: A gas insulation switchgear having a lowered overall height is provided.

Abstract: A gas insulation switchgear having a lowered overall height is provided.