Patents by Inventor Mamoru Soga

Mamoru Soga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030221586
    Abstract: An aggregation stabilizer is further added to an ink composition for inkjet recording which contains a colorant, a humectant, water, and a water-soluble substance that is condensation-polymerized in the absence of the water. With this aggregation stabilizer, a hardly-soluble or insoluble component formed by the colorant and the water-soluble substance is modified so as to be readily dissolved in water, whereby generation of an aggregate in the ink is prevented.
    Type: Application
    Filed: May 19, 2003
    Publication date: December 4, 2003
    Inventors: Hidekazu Arase, Mamoru Soga
  • Publication number: 20030213403
    Abstract: An ultraviolet absorber having an acidic group is further added to an ink composition for inkjet recording which contains a colorant, a humectant, water, and a water-soluble substance that is condensation-polymerized in the absence of the water. A radical trapping agent having an acidic group is further added to an ink composition for inkjet recording which contains a colorant, a humectant, water, and a water-soluble substance that is condensation-polymerized in the absence of the water.
    Type: Application
    Filed: May 15, 2003
    Publication date: November 20, 2003
    Inventors: Mamoru Soga, Hidekazu Arase
  • Publication number: 20030206214
    Abstract: An ink composition is produced using a water-soluble substance that undergoes condensation polymerization in the absence of water (e.g., a hydrolyzable silane compound), which includes fluoroalkyl groups. Alternatively, a water-repellent film 9a of a nozzle plate 9 is subjected to a surface treatment with a trialkyl silane compound.
    Type: Application
    Filed: January 13, 2003
    Publication date: November 6, 2003
    Inventors: Mamoru Soga, Hidekazu Arase
  • Publication number: 20030197769
    Abstract: In order to improve the water-resisting property of an image formed on a recording medium such as recording paper and plain paper by using an ink-jet recording ink, while also improving the light-resisting property of the image, an ink-jet recording ink, which contains a color material, water, a moisture-retaining agent, an organic silicon compound and an ultraviolet-ray absorbing agent, is allowed to contain an organic silicon compound in a range of 0.1 parts by weight to 50 parts by weight and an ultraviolet-ray absorbing agent in a range of 0.1 parts by weight to 10 parts by weight with respect to 100 parts by weight of the ink. The ultraviolet-ray absorbing agent is at least one compound selected from the group consisting of benzophenone-based, benzotriazole-based, cyanoacrylate-based and oxalic acid anilide-based compounds.
    Type: Application
    Filed: March 4, 2003
    Publication date: October 23, 2003
    Inventors: Mamoru Soga, Takuma Takasu, Hidekazu Arase
  • Patent number: 6627264
    Abstract: A coat liquid, in which a methoxysilane or ethoxysilane compound which is a precursor of silicon oxide and an ethoxysilane or methoxysilane compound which contains therein a carbon fluoride chain are dissolved, is applied onto the surface of a base material of SUS having a thickness of 20 &mgr;m. This is followed by drying the base material for one hour at room temperature condition. Thereafter, the base material is baked at 200 degrees centigrade for 30 minutes thereby to form a water repellent thin film having a thickness of from 10 nm to 1000 nm and containing therein a molecule in which fluoroalkyl chains are bonded to the silicon oxide. A nozzle orifice is formed by electrical discharge machining from the lower side of the base material.
    Type: Grant
    Filed: March 30, 2000
    Date of Patent: September 30, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kenji Tomita, Tohru Nakagawa, Mamoru Soga, Keisuke Shimamoto
  • Publication number: 20030179267
    Abstract: The present invention provides an ink composition for ink jet recording, including an azo dye, a humectant, water, and an amino-group-containing water-soluble compound that undergoes condensation polymerization in the absence of the water (e.g., an aminosilane compound), wherein a straight-chain or branched alkyl group whose carbon number is two or more, an alkoxyl group, a phenyl group or a derivative group thereof, a phenoxyl group, or a six-membered or larger cycloalkyl group is introduced to a carbon atom at an a-position of the amino group in the amino-group-containing water-soluble compound that undergoes condensation polymerization in the absence of water.
    Type: Application
    Filed: January 13, 2003
    Publication date: September 25, 2003
    Inventors: Mamoru Soga, Hidekazu Arase
  • Patent number: 6521334
    Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film. The monomolecule film is formed with chemical coupling of chlorosilane surface active compound, for example, of the formula: F(CF2)m(CH2)nSiRqX3−q where m is an integer of from 1 to 15, n is an integer of from 0 to 15 provided that the total of m and n is an integer of from 10 to 30 and R is an alkyl or an alkoxyl group, or F(CF2)m′(CH2)n′A(CH2)pSiRqX3−q where m represents an integer ranging from 1 to 8, n′ represents an integer ranging from 0 to 2, p represents an integer ranging from 5 to 25, q represents an integer ranging from 0 to 2, X represents a halogen atom or an alkoxyl group, R represents an alkyl or an alkoxyl group, and A represents O, a —COO— or —Si(CH3)2—. The transparent substrate such as glass is made hydrophobic and free of contamination.
    Type: Grant
    Filed: May 12, 2000
    Date of Patent: February 18, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 6503567
    Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film. The monomolecule film is formed with chemical coupling of chlorosilane surface active compound, for example, of the formula: F(CF2)m(CH2)nSiRqX3—q where m is an integer of from 1 to 15, n is an integer of from 0 to 15 provided that the total of m and n is an integer of from 10 to 30 and R is an alkyl or an alkoxyl group, or F(CF2)m′(CH2)n′A(CH2)pSiRqX3−q where m represents an integer ranging from 1 to 8, n′ represents an integer ranging from 0 to 2, p represents an integer ranging from 5 to 25, q represents an integer ranging from 0 to 2, X represents a halogen atom or an alkoxyl group, R represents an alkyl or an alkoxyl group, and A represents —O—, a —COO— or —Si(CH3)2—. The transparent substrate such as glass is made hydrophobic and free of contamination.
    Type: Grant
    Filed: March 13, 2001
    Date of Patent: January 7, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Publication number: 20020127331
    Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film.
    Type: Application
    Filed: April 19, 2002
    Publication date: September 12, 2002
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Publication number: 20020094375
    Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film.
    Type: Application
    Filed: February 26, 2002
    Publication date: July 18, 2002
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Publication number: 20020049261
    Abstract: Ink for ink-jet recording contains an oil soluble dye, a humectant, a penetrant, water, and an amphiphilic star block polymer of which the outer portion is hydrophilic. The surface tension of the ink at 25° C. is in the range of 20 to 50 mN/m.
    Type: Application
    Filed: August 14, 2001
    Publication date: April 25, 2002
    Inventors: Mamoru Soga, Masaichiro Tatekawa, Hiroyuki Matsuo
  • Publication number: 20010044021
    Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film.
    Type: Application
    Filed: March 13, 2001
    Publication date: November 22, 2001
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 6207341
    Abstract: According to the present invention, a method for producing a chemically adsorbed film is provided. The method includes the steps of: irradiating a surface of a polymer substrate with ultraviolet laser light so as to produce a hydrophilic group on the surface of the polymer substrate; and contacting a chemical adsorption solution containing a chlorosilane-based chemical adsorbent and a nonaqueous solvent and the polymer substrate on which the hydrophilic group is produced; and reacting the hydrophilic group of the polymer substrate with a chlorosilyl group of the chlorosilane-based chemical adsorbent for forming a covalent bond, thereby forming a chemically adsorbed film on the surface of the polymer substrate.
    Type: Grant
    Filed: June 8, 1998
    Date of Patent: March 27, 2001
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Shigeo Ikuta, Kazufumi Ogawa, Mamoru Soga
  • Patent number: 6183558
    Abstract: A method for forming a molecular film includes the steps of: coating a surface of a substrate having active hydrogen atoms on its surface with a coating solution containing a silane-based compound having at least one reactive group selected from the group consisting of a chloro group, an alkoxy group and an isocyanate group; and effecting an elimination reaction between the active hydrogen atoms on the surface of the substrate and reactive groups of the silane-based compound, thereby covalently bonding the silane-based compounds to the surface of the substrate. The substrate is supplied to a chamber in which an atmosphere is maintained at a low water vapor density. The surface of the substrate is coated with a coating solution containing the silane-based compound and a solvent by using a transfer element. A dehydrochlorination reaction is effected between the active hydrogen atoms and the chloro groups of the silane-based compounds.
    Type: Grant
    Filed: April 19, 1999
    Date of Patent: February 6, 2001
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tadashi Otake, Norihisa Mino, Tohru Nakagawa, Mamoru Soga, Kazufumi Ogawa, Takaiki Nomura, Yasuo Takebe
  • Patent number: 5981056
    Abstract: According to the invention, a fluorine-based or siloxane-based chemical adsorbed film containing a fluorocarbon compound can be formed on a given substrate surface in a laminated state and through chemical bonds (i.e., covalent bonds) with the substrate, it is possible to obtain a laminated film which has satisfactory adhesion to the substrate, is substantially pin-hole free and is very thin. Further, since the outermost layer may be substituted by fluorocarbon groups or hydroxyl groups, it is possible to obtain a film which has excellent water- and oil-repelling properties or hydrophilic and oil-repelling properties and can replace fluorine-based coating films, thus improving the performance of products requiring a coating having a water- and oil-repelling resistant property, weather-resistant property, wear-resistant property and so forth which are desirable in electric products, vehicles, industrial devices and so forth.
    Type: Grant
    Filed: April 22, 1992
    Date of Patent: November 9, 1999
    Assignee: Matsushita Electric Industrial Co.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5948476
    Abstract: A method for forming a molecular film includes the steps of: coating a surface of a substrate having active hydrogen atoms on its surface with a coating solution containing a silane-based compound having at least one reactive group selected from the group consisting of a chloro group, an alkoxy group and an isocyanate group; and effecting an elimination reaction between the active hydrogen atoms on the surface of the substrate and reactive groups of the silane-based compound, thereby covalently bonding the silane-based compounds to the surface of the substrate. The substrate is supplied to a chamber in which an atmosphere is maintained at a low water vapor density. The surface of the substrate is coated with a coating solution containing the silane-based compound and a solvent by using a transfer element. A dehydrochlorination reaction is effected between the active hydrogen atoms and the chloro groups of the silane-based compounds.
    Type: Grant
    Filed: November 4, 1997
    Date of Patent: September 7, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tadashi Otake, Norihisa Mino, Tohru Nakagawa, Mamoru Soga, Kazufumi Ogawa, Takaiki Nomura, Yasuo Takebe
  • Patent number: 5876801
    Abstract: A chemically adsorbed film having a surface layer containing fluorine groups and a stem layer chemically bonded by siloxane bonds to a substrate is formed on the surface of a frictional portion of a machine part such as a gear or a bearing or on the surface of a game ball. An excellently self-lubricating low frictional resistance machine part or game ball thus can be obtained. A frictional portion of a gear or the like, made of SiO.sub.2 or like ceramic material, is dipped and held in a solution containing a surface active material, e.g., CF.sub.3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 SiCl.sub.3 dissolved in a non-aqueous solvent. A hydrochloric acid removal reaction is brought about between SiCl groups of the material, which contains a fluorocarbon and a chlorosilane group, and hydroxyl groups numerously present on the SiO2 surface, thus forming bonds ofCF.sub.3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 Si (O--).sub.3over the entire frictional portion surface.
    Type: Grant
    Filed: September 23, 1997
    Date of Patent: March 2, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5876846
    Abstract: A chemically adsorbed film having a surface layer containing fluorine groups and a stem layer chemically bonded by siloxane bonds to a substrate is formed on the surface of a frictional portion of a machine part such as a gear or a bearing or on the surface of a game ball. An excellently self-lubricating low frictional resistance machine part or game ball thus can be obtained. A frictional portion of a gear or the like, made of SiO.sub.2 or like ceramic material, is dipped and held in a solution containing a surface active material, e.g.,CF.sub.3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 SiCl.sub.3dissolved in a non-aqueous solvent. A hydrochloric acid removal reaction is brought about between SiCl groups of the material, which contains a fluorocarbon and a chlorosilane group, and hydroxyl groups numerously present on the SiO2 surface, thus forming bonds ofCF.sub.3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 Si(O--).sub.3over the entire frictional portion surface.
    Type: Grant
    Filed: September 23, 1997
    Date of Patent: March 2, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5871815
    Abstract: An antistatic film comprising a chemically adsorbed film of straight chain molecules each containing a conductive group and provided on a chargeable substrate via covalent bonds each containing a Si group, said chemically adsorbed film having a conductivity of 10.sup.-10 S/cm or above. With the antistatic chemically adsorbed film according to the invention, conductive functional groups are secured via chemically adsorbed molecules and by siloxane bonds to the surface of a substrate material such as ceramics, glass, synthetic resins or synthetic fibers, a film, a plate, an display screen surface, a light-emitting tube. Thus, the film provides an antistatic effect and does not separate. In addition, this chemically adsorbed film has a thickness at the nanometer level and is thus excellently transparent, as well as capable of preventing contamination of the substrate surface due to charging thereof. The film is also excellently durable.
    Type: Grant
    Filed: July 14, 1997
    Date of Patent: February 16, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: RE37698
    Abstract: A method of contacting a substrate having a surface containing hydroxyl groups with a non-aqueous solution containing a material having a chrolosilyl group; washing if desired; coating the substrate with a non-aqueous solvent containing a compound having a fluorocarbon group and a chlorosilane group or a solvent containing a compound containing a fluorocarbon group and an alkoxysilane; and baking the substrate if necessary in order to form a fluorocarbon-based polymer coating film chemically bonded to the substrate surface. The hydroxyl groups on the substrate surface and chlorosilyl groups are reacted to form a thin film having a large number of silanol groups (—SiOH) capable of connecting the polymer coating film to the substrate to form a heat-, weather-, and wear-resistant film on various surfaces.
    Type: Grant
    Filed: July 10, 2000
    Date of Patent: May 14, 2002
    Assignee: Matsushita Electric Industrial Co.
    Inventors: Kazufumi Ogawa, Mamoru Soga