Patents by Inventor Mamoru Yoshizako

Mamoru Yoshizako has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4931578
    Abstract: This invention is concerned with an improved process for producing trialkoxysilanes comprising (i) an activation step where elemental silicon and a copper catalyst are activated, (ii) a reaction step where an alcohol is contacted with elemental silicon and the copper catalyst to allow it to react with the elemental silicon and (iii) a purification step where reaction product obtained is separated and/or refined, which is characterized in that a halide is introduced into the reaction system and/or mixture in one or more of the above steps (i) to (iii). With the introduction of a halide, the lowering in the selectivity of trialkoxysilanes can be prevented, and the percentage of elemental silicon reacted can be increased. In addition, the trialkoxysilanes contained in the reaction product can be stabilized.
    Type: Grant
    Filed: February 22, 1988
    Date of Patent: June 5, 1990
    Inventors: Yoshiro Ohta, Mamoru Yoshizako
  • Patent number: 4892625
    Abstract: A distillable liquid containing non-volatile impurities is freed of those impurities by boiling the liquid to form vapors of the liquid, passing the vapors through a packed column heated to a temperature such that liquid entrained in the vapors is completely vaporized and the non-volatile impurities remain in the packed column, and condensing the vapors from the column.
    Type: Grant
    Filed: June 23, 1987
    Date of Patent: January 9, 1990
    Assignees: Tama Chemicals Co., Ltd., Moses Lake Industries, Inc.
    Inventors: Shumpei Shimizu, Mamoru Yoshizako, Toshitsura Cho
  • Patent number: 4873120
    Abstract: According to the invention, an antistatic/anti-reflecting film of high adhesive strength can be formed easily by forming an SiO.sub.2 film on a cathode-ray tube faceplate by means of a condensation reaction of polyalkyl siloxane consisting essentially of condensed alkyl silicates. As a result, the sintering conditions for forming an antistatic/anti-reflecting film can be set adequately. The antistatic effect can be further enhanced, reflection of the external light can be decreased, and workability can be greatly improved.
    Type: Grant
    Filed: December 23, 1987
    Date of Patent: October 10, 1989
    Assignees: Kabushiki Kaisha Toshiba, Tama Chemicals Co., Ltd.
    Inventors: Takeo Itou, Hidemi Matsuda, Mamoru Yoshizako, Osamu Yagi
  • Patent number: 4806329
    Abstract: A method of producing synthetic silica which is characterized by hydrolyzing a tetraalkoxysilane under a basic condition in the presence of an ammonium salt.
    Type: Grant
    Filed: September 4, 1986
    Date of Patent: February 21, 1989
    Assignee: Tama Chemicals Co., Ltd.
    Inventors: Toshitsura Cho, Mamoru Yoshizako