Patents by Inventor Mamoun El Ouasdad

Mamoun El Ouasdad has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements
    Patent number: 8068212
    Abstract: A lithographic apparatus configured to apply corrections to the dose, within and/or between fields, to compensate for critical dimension variations due to heating of elements of the projection system is disclosed.
    Type: Grant
    Filed: September 28, 2010
    Date of Patent: November 29, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Adrianus Van De Kerkhof, M'Hamed Akhssay, Mamoun El Ouasdad, Asis Uasghiri
  • DEVICE MANUFACTURING METHOD, COMPUTER PROGRAM AND LITHOGRAPHIC APPARATUS
    Publication number: 20110013163
    Abstract: In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of the projection system of the lithographic apparatus.
    Type: Application
    Filed: September 28, 2010
    Publication date: January 20, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Marcus Adrianus VAN DE KERKHOF, M'hamed Akhssay, Mamoun El Ouasdad, Asis Uasghiri
  • Device manufacturing method, computer program and lithographic apparatus
    Patent number: 7829249
    Abstract: In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of the projection system of the lithographic apparatus.
    Type: Grant
    Filed: March 5, 2007
    Date of Patent: November 9, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Adrianus Van De Kerkhof, M'hamed Akhssay, Mamoun El Ouasdad, Asis Uasghiri
  • Device manufacturing method, computer program and lithographic apparatus
    Publication number: 20080220345
    Abstract: In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of the projection system of the lithographic apparatus.
    Type: Application
    Filed: March 5, 2007
    Publication date: September 11, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Marcus Adrianus Van De Kerkhof, M'Hamed Akhssay, Mamoun El Ouasdad, Asis Uasghiri