Patents by Inventor Man-Hung Wu

Man-Hung Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for cleaning a glass substrate before photoresist coating
    Publication number: 20080196752
    Abstract: A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.
    Type: Application
    Filed: April 23, 2008
    Publication date: August 21, 2008
    Inventors: Wei-Ting Chen, Man-Hung Wu, Hung-Yi Cheng
  • Apparatus and method for cleaning a glass substrate before photoresist coating
    Patent number: 7402212
    Abstract: A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.
    Type: Grant
    Filed: April 16, 2003
    Date of Patent: July 22, 2008
    Assignee: Au Optronics Corp.
    Inventors: Wei-Ting Chen, Man-Hung Wu, Hung-Yi Cheng
  • Apparatus and method for cleaning a glass substrate before photoresist coating
    Publication number: 20040118429
    Abstract: A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.
    Type: Application
    Filed: April 16, 2003
    Publication date: June 24, 2004
    Applicant: AU Optronics Corp.
    Inventors: Wei-Ting Chen, Man-Hung Wu, Hung-Yi Cheng