Patents by Inventor Man-Hyung Ryoo

Man-Hyung Ryoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060127816
    Abstract: The present invention provides a double photolithography method in which, after a first photoresist pattern including a crosslinkable agent is formed on a semiconductor substrate, a crosslinkage is formed in a molecular structure of the first photoresist pattern. A second photoresist film may be formed on a surface of the semiconductor substrate on which the crosslinked first photoresist patterns are formed. Second photoresist patterns may be formed by exposing, post-exposure baking, and developing the second photoresist film.
    Type: Application
    Filed: December 7, 2005
    Publication date: June 15, 2006
    Inventors: Yool Kang, Han-ku Cho, Sang-Gyun Woo, Suk-Joo Lee, Man-Hyung Ryoo, Mitsuhiro Hata, Hyung-Rae Lee