Abstract: There is provided an apparatus for alignment of a thin-film transistor (TFT) panel and a barrier panel of a three-dimensional (3D) display. The apparatus comprises at least one light source for illuminating pixels in at least one region of the TFT panel and for illuminating at least one region of an exposure pattern of the barrier panel; a pattern recognition system for detecting light emitted from the at least one light source that is reflected by or transmitted through the 3D display, to generate alignment data relating to an alignment between the detected illuminated pixels of the TFT panel and the exposure pattern of the barrier panel; and a positioning mechanism for adjusting the relative position between the barrier panel and the TFT panel in relation to the alignment data. The at least one light source comprises at least one invisible light source which emits invisible light outside the visible region of the electromagnetic spectrum.

Abstract: There is provided an apparatus for alignment of a thin-film transistor (TFT) panel and a barrier panel of a three-dimensional (3D) display. The apparatus comprises at least one light source for illuminating pixels in at least one region of the TFT panel and for illuminating at least one region of an exposure pattern of the barrier panel; a pattern recognition system for detecting light emitted from the at least one light source that is reflected by or transmitted through the 3D display, to generate alignment data relating to an alignment between the detected illuminated pixels of the TFT panel and the exposure pattern of the barrier panel; and a positioning mechanism for adjusting the relative position between the barrier panel and the TFT panel in relation to the alignment data. The at least one light source comprises at least one invisible light source which emits invisible light outside the visible region of the electromagnetic spectrum.

Abstract: Real-time alignment of substrates is conducted by way of placing a first substrate together with a second substrate located over the first substrate in a fixed relative position onto a first substrate holder. The first substrate holder is operative to support the first substrate. A second substrate holder is operative to contact and control the position of the second substrate relative to the first substrate. A pattern recognition system is operative to view reference marks on the first and second substrates for determining their relative alignment, and a positioning mechanism coupled to the first substrate holder and/or the second substrate holder will align the first substrate relative to the second substrate based on their relative alignment as determined by the pattern recognition system. Thereafter, the substrates are fully laminated to secure them to each other.

Abstract: Real-time alignment of substrates is conducted by way of placing a first substrate together with a second substrate located over the first substrate in a fixed relative position onto a first substrate holder. The first substrate holder is operative to support the first substrate. A second substrate holder is operative to contact and control the position of the second substrate relative to the first substrate. A pattern recognition system is operative to view reference marks on the first and second substrates for determining their relative alignment, and a positioning mechanism coupled to the first substrate holder and/or the second substrate holder will align the first substrate relative to the second substrate based on their relative alignment as determined by the pattern recognition system. Thereafter, the substrates are fully laminated to secure them to each other.