Patents by Inventor Manabu Kako

Manabu Kako has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11933682
    Abstract: A pressure sensitive sensor includes: a first conductive member formed into a long shape, the first conductive member having conductivity and elasticity; a second conductive member internally including a long space to arrange the first conductive member, the second conductive member having conductivity and elasticity; and an insulating member having an insulating property and elasticity, the insulating member holding the first conductive member to separate the first conductive member from the second conductive member, the insulating member being movable relative to one or both of the first conductive member and the second conductive member.
    Type: Grant
    Filed: January 24, 2022
    Date of Patent: March 19, 2024
    Assignee: Proterial, Ltd.
    Inventors: Keisuke Sugita, Kentaro Abe, Tomomi Onose, Taichi Oka, Manabu Kako
  • Publication number: 20220236122
    Abstract: A pressure sensitive sensor includes: a first conductive member formed into a long shape, the first conductive member having conductivity and elasticity; a second conductive member internally including a long space to arrange the first conductive member, the second conductive member having conductivity and elasticity; and an insulating member having an insulating property and elasticity, the insulating member holding the first conductive member to separate the first conductive member from the second conductive member, the insulating member being movable relative to one or both of the first conductive member and the second conductive member.
    Type: Application
    Filed: January 24, 2022
    Publication date: July 28, 2022
    Inventors: Keisuke SUGITA, Kentaro ABE, Tomomi ONOSE, Taichi OKA, Manabu KAKO
  • Patent number: 7683378
    Abstract: An AlGaInP based light emitting diode is provided with a distributed Bragg reflector comprising a combination of an AlGaAs layer and an AlInP layer, each having a film thickness determined by following formulas (1) to (3): t1={?0/(4×n1)}×???(1), t2={?0/(4×n2)}×(2??)??(2), and 0.5<?<0.9??(3) wherein t1 is a film thickness [nm] of the AlGaAs layer, t2 is a film thickness [nm] of the AlInP layer, ?0 is a wavelength [nm] of a light to be reflected, n1 is a refractive index of the AlGaAs layer to the wavelength of the light to be reflected, and n2 is a refractive index of the AlInP layer to the wavelength of the light to be reflected.
    Type: Grant
    Filed: February 23, 2006
    Date of Patent: March 23, 2010
    Assignee: Hitachi Cable, Ltd.
    Inventors: Manabu Kako, Takehiko Tani, Taiichiro Konno, Masahiro Arai
  • Publication number: 20070069196
    Abstract: An epitaxial wafer for a light emitting diode has: a light-emitting portion having a n-type cladding layer, a p-type cladding layer and an active layer formed between the n-type cladding layer and the p-type cladding layer, the light-emitting portion being formed on a n-type substrate; and a p-type GaP current spreading layer formed on the light-emitting portion. The p-type GaP current spreading layer is doped with Mg and has a root mean square roughness Rms of 15 nm to 5 ?m on its surface.
    Type: Application
    Filed: March 17, 2006
    Publication date: March 29, 2007
    Applicant: HITACHI CABLE, LTD.
    Inventors: Manabu Kako, Takehiko Tani
  • Publication number: 20060192211
    Abstract: An AlGaInP based light emitting diode is provided with a distributed Bragg reflector comprising a combination of an AlGaAs layer and an AlInP layer, each having a film thickness determined by following formulas (1) to (3): t1={?0/(4×n1)}×???(1), t2={?0/(4×n2)}×(2??) ??(2), and 0.5<?<0.9 ??(3) wherein t1 is a film thickness [nm] of the AlGaAs layer, t2 is a film thickness [nm] of the AlInP layer, ?0 is a wavelength [nm] of a light to be reflected, n1 is a refractive index of the AlGaAs layer to the wavelength of the light to be reflected, and n2 is a refractive index of the AlInP layer to the wavelength of the light to be reflected.
    Type: Application
    Filed: February 23, 2006
    Publication date: August 31, 2006
    Inventors: Manabu Kako, Takehiko Tani, Taiichiro Konno, Masahiro Arai