Patents by Inventor Manabu Katsumura
Manabu Katsumura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11759998Abstract: An object of the present invention is to provide a method for producing a gelatin formed body having a minimized content of a component harmful to a living body and high biocompatibility with high shaping accuracy, and a gelatin formed body produced by the method. According to the present invention, provided is a method for producing a gelatin formed body, the method including: a step a of forming, on a substrate, a layer containing a powder which is obtained by air-drying an aqueous gelatin solution and has an average particle diameter of 25 to 200 ?m; and a step b of jetting liquid droplets of an aqueous solution containing alcohols having a boiling point of 120° C. or lower toward the layer formed in the step a from a nozzle and flying the jetted liquid droplets so that the liquid droplets are landed on the layer formed in the step a, thereby forming a gelatin formed body.Type: GrantFiled: December 7, 2018Date of Patent: September 19, 2023Assignee: FUJIFILM CorporationInventors: Manabu Katsumura, Takahiro Hiratsuka, Hideo Fushimi, Yoshio Ishii, Ai Okamura, Hiroshi Ota, Jun Arakawa
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Patent number: 10953131Abstract: Provided are a method for rapidly producing a calcium phosphate molded article having high strength with high shaping precision, a calcium phosphate molded article produced by the method, and a material for transplantation. Disclosed is a method for producing a calcium phosphate molded article, the method including: step (a) of forming a layer containing a calcium phosphate powder having a ratio of the numbers of atoms of Ca/P of 1.4 to 1.8 on a substrate; and step (b) of producing a calcium phosphate molded article by jetting an organic acid solution having a pH of 3.5 or lower and including an organic acid whose calcium salt has a solubility in water of 1 g/100 mL or less, through a nozzle unit into a liquid droplet state, thereby dropping the organic acid solution onto the layer containing a calcium phosphate powder formed in step (a).Type: GrantFiled: November 29, 2018Date of Patent: March 23, 2021Assignee: FUJIFILM CorporationInventors: Hiroshi Ota, Manabu Katsumura, Kazuya Kawasaki, Yoshio Ishii, Hideo Fushimi, Takahiro Hiratsuka, Ai Okamura, Mamoru Nishitani, Masayuki Ezumi
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Publication number: 20190167841Abstract: Provided are a method for rapidly producing a calcium phosphate molded article having high strength with high shaping precision, a calcium phosphate molded article produced by the method, and a material for transplantation. Disclosed is a method for producing a calcium phosphate molded article, the method including: step (a) of forming a layer containing a calcium phosphate powder having a ratio of the numbers of atoms of Ca/P of 1.4 to 1.8 on a substrate; and step (b) of producing a calcium phosphate molded article by jetting an organic acid solution having a pH of 3.5 or lower and including an organic acid whose calcium salt has a solubility in water of 1 g/100 mL or less, through a nozzle unit into a liquid droplet state, thereby dropping the organic acid solution onto the layer containing a calcium phosphate powder formed in step (a).Type: ApplicationFiled: November 29, 2018Publication date: June 6, 2019Applicant: FUJIFILM CorporationInventors: Hiroshi OTA, Manabu KATSUMURA, Kazuya KAWASAKI, Yoshio ISHII, Hideo FUSHIMI, Takahiro HIRATSUKA, Ai OKAMURA, Mamoru NISHITANI, Masayuki EZUMI
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Publication number: 20190168444Abstract: An object of the present invention is to provide a method for producing a gelatin formed body having a minimized content of a component harmful to a living body and high biocompatibility with high shaping accuracy, and a gelatin formed body produced by the method. According to the present invention, provided is a method for producing a gelatin formed body, the method including: a step a of forming, on a substrate, a layer containing a powder which is obtained by air-drying an aqueous gelatin solution and has an average particle diameter of 25 to 200 ?m; and a step b of jetting liquid droplets of an aqueous solution containing alcohols having a boiling point of 120° C. or lower toward the layer formed in the step a from a nozzle and flying the jetted liquid droplets so that the liquid droplets are landed on the layer formed in the step a, thereby forming a gelatin formed body.Type: ApplicationFiled: December 7, 2018Publication date: June 6, 2019Applicant: FUJIFILM CorporationInventors: Manabu KATSUMURA, Takahiro HIRATSUKA, Hideo FUSHIMI, Yoshio ISHII, Ai OKAMURA, Hiroshi OTA, Jun ARAKAWA
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Patent number: 9457562Abstract: A liquid ejection device includes an ink jet head in which a plurality of nozzle portions are arranged in a matrix; a plurality of pressurizing elements that generate an ejection force; and a driving voltage supply unit that supplies a driving voltage to the pressurizing elements. In the device, the ink jet head is provided with supply flow paths, the nozzle portions which are supplied with the liquid from the same the supply flow path are divided into two or more groups, the driving voltage supply unit supplies an ejection driving voltage for ejecting the liquid to each of the groups when a dummy jet is performed, and during a period of time when the dummy jet is performed for one group, the driving voltage supply unit supplies a non-ejection driving voltage for preventing the liquid from being ejected to the other groups.Type: GrantFiled: August 27, 2015Date of Patent: October 4, 2016Assignee: FUJIFILM CorporationInventors: Manabu Katsumura, Tsuyoshi Mita
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Publication number: 20150360464Abstract: A liquid ejection device includes an ink jet head in which a plurality of nozzle portions are arranged in a matrix; a plurality of pressurizing elements that generate an ejection force; and a driving voltage supply unit that supplies a driving voltage to the pressurizing elements. In the device, the ink jet head is provided with supply flow paths, the nozzle portions which are supplied with the liquid from the same the supply flow path are divided into two or more groups, the driving voltage supply unit supplies an ejection driving voltage for ejecting the liquid to each of the groups when a dummy jet is performed, and during a period of time when the dummy jet is performed for one group, the driving voltage supply unit supplies a non-ejection driving voltage for preventing the liquid from being ejected to the other groups.Type: ApplicationFiled: August 27, 2015Publication date: December 17, 2015Applicant: FUJIFILM CORPORATIONInventors: Manabu KATSUMURA, Tsuyoshi MITA
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Patent number: 8304015Abstract: A method forms a resin film on a substrate by depositing droplets of resin liquid by an inkjet method. The method includes: a first resin liquid arrangement step of arranging a plurality of droplets of a first resin liquid separately from each other on a substrate in such a manner that the droplets do not make contact with each other; a first resin liquid curing step of curing at least a surface of each of the droplets of the first resin liquid arranged on the substrate; a second resin liquid arrangement step of arranging a plurality of droplets of a second resin liquid at substantially central positions between the droplets of the first resin liquid on the substrate, after the at least the surface of each of the droplets of the first resin liquid is cured; and a second resin liquid curing step of curing the droplets of the second resin liquid arranged on the substrate.Type: GrantFiled: March 27, 2008Date of Patent: November 6, 2012Assignee: Fujifilm CorporationInventors: Junichi Yoshida, Seiichi Inoue, Jun Yamanobe, Manabu Katsumura
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Publication number: 20110284158Abstract: A method of manufacturing a functionally gradient material having a gradient from a first material to a second material different to the first material by ejecting inks onto a base material from a plurality of inkjet heads, includes the steps of: supplying a first functional ink containing the first material to a first inkjet head; supplying a second functional ink containing the second material to a second inkjet head; specifying a ratio between a volume of the first functional ink ejected from the first inkjet head and a volume of the second functional ink ejected from the second inkjet head; causing the first inkjet head to eject the first functional ink and/or causing the second inkjet head to eject the second functional ink, in accordance with the specified ratio, so as to form one layer; and stacking a plurality of layers onto the base material by repeating the forming step, so as to obtain a laminated body, wherein in the control step, the ratio between the first functional ink and the second functionaType: ApplicationFiled: May 18, 2011Publication date: November 24, 2011Applicant: FUJIFILM CorporationInventor: Manabu Katsumura
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Patent number: 7607762Abstract: The nozzle plate comprises: a nozzle through which liquid is ejected; a nozzle forming surface in which the nozzle is provided; and a liquid-repellency layer which is provided on the nozzle forming surface, the liquid-repellency layer including a carbon nanotube layer.Type: GrantFiled: August 28, 2006Date of Patent: October 27, 2009Assignee: Fujifilm CorporationInventors: Manabu Katsumura, Shinya Sugimoto, Tsutomu Yokouchi
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Publication number: 20080241360Abstract: A method forms a resin film on a substrate by depositing droplets of resin liquid by an inkjet method. The method includes: a first resin liquid arrangement step of arranging a plurality of droplets of a first resin liquid separately from each other on a substrate in such a manner that the droplets do not make contact with each other; a first resin liquid curing step of curing at least a surface of each of the droplets of the first resin liquid arranged on the substrate; a second resin liquid arrangement step of arranging a plurality of droplets of a second resin liquid at substantially central positions between the droplets of the first resin liquid on the substrate, after the at least the surface of each of the droplets of the first resin liquid is cured; and a second resin liquid curing step of curing the droplets of the second resin liquid arranged on the substrate.Type: ApplicationFiled: March 27, 2008Publication date: October 2, 2008Inventors: Junichi YOSHIDA, Seiichi Inoue, Jun Yamanobe, Manabu Katsumura
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Publication number: 20080174619Abstract: A dispersion liquid manufacturing apparatus manufactures a dispersion liquid in which fine droplets of a second liquid are dispersed in a first liquid. The dispersion liquid manufacturing apparatus includes: a first liquid accommodating device which accommodates the first liquid; and an ejection head which has an ejection face opposing the first liquid accommodating device, the ejection head being disposed so that the ejection face is separated from a surface of the first liquid in the first liquid accommodating device by a prescribed distance, the ejection head ejecting the fine droplets of the second liquid from the ejection face to the surface of the first liquid through a gas phase between the ejection face and the surface of the first liquid.Type: ApplicationFiled: September 26, 2007Publication date: July 24, 2008Inventor: Manabu Katsumura
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Patent number: 7384860Abstract: The present invention relates to a method of manufacturing a semiconductor device having an excellent gettering effect. In this method, when phosphorus is added to a poly-Si film, which has been crystallized by the addition of a metal, to subject the resultant poly-Si film to the heat treatment to carry out gettering therefor, the device is performed for the shape of the island-like insulating film on the poly-Si film which is employed when implanting phosphorus. Thereby, the area of the boundary surface between the region to which phosphorus has been added and the region to which no phosphorus has been added is increased to enhance gettering efficiency.Type: GrantFiled: September 15, 2004Date of Patent: June 10, 2008Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Osamu Nakamura, Manabu Katsumura, Shunpei Yamazaki
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Publication number: 20070139483Abstract: The nozzle plate comprises: a nozzle through which liquid is ejected; a nozzle forming surface in which the nozzle is provided; and a liquid-repellency layer which is provided on the nozzle forming surface, the liquid-repellency layer including a carbon nanotube layer.Type: ApplicationFiled: August 28, 2006Publication date: June 21, 2007Inventors: Manabu Katsumura, Shinya Sugimoto, Tsutomu Yokouchi
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Publication number: 20050054181Abstract: The present invention relates to a method of manufacturing a semiconductor device having an excellent gettering effect. In this method, when phosphorus is added to a poly-Si film, which has been crystallized by the addition of a metal, to subject the resultant poly-Si film to the heat treatment to carry out gettering therefor, the device is performed for the shape of the island-like insulating film on the poly-Si film which is employed when implanting phosphorus. Thereby, the area of the boundary surface between the region to which phosphorus has been added and the region to which no phosphorus has been added is increased to enhance gettering efficiency.Type: ApplicationFiled: September 15, 2004Publication date: March 10, 2005Applicant: Semiconductor EnergyInventors: Osamu Nakamura, Manabu Katsumura, Shunpei Yamazaki
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Patent number: 6821827Abstract: The present invention relates to a method of manufacturing a semiconductor device having an excellent gettering effect. In this method, when phosphorus is added to a poly-Si film, which has been crystallized by the addition of a metal, to subject the resultant poly-Si film to the heat treatment to carry out gettering therefor, the device is performed for the shape of the island-like insulating film on the poly-Si film which is employed when implanting phosphorus. Thereby, the area of the boundary surface between the region to which phosphorus has been added and the region to which no phosphorus has been added is increased to enhance gettering efficiency.Type: GrantFiled: December 27, 2000Date of Patent: November 23, 2004Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Osamu Nakamura, Manabu Katsumura, Shunpei Yamazaki
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Patent number: 6787407Abstract: The present invention relates to a method of manufacturing a semiconductor device having an excellent gettering effect. In this method, when phosphorus is added to a poly-Si film, which has been crystallized by the addition of a metal, to subject the resultant poly-Si film to the heat treatment to carry out gettering therefor, the device is performed for the shape of the island-like insulating film on the poly-Si film which is employed when implanting phosphorus. Thereby, the area of the boundary surface between the region to which phosphorus has been added and the region to which no phosphorus has been added is increased to enhance gettering efficiency.Type: GrantFiled: January 3, 2003Date of Patent: September 7, 2004Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Osamu Nakamura, Manabu Katsumura, Shunpei Yamazaki
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Publication number: 20030143794Abstract: The present invention relates to a method of manufacturing a semiconductor device having an excellent gettering effect. In this method, when phosphorus is added to a poly-Si film, which has been crystallized by the addition of a metal, to subject the resultant poly-Si film to the heat treatment to carry out gettering therefor, the device is performed for the shape of the island-like insulating film on the poly-Si film which is employed when implanting phosphorus. Thereby, the area of the boundary surface between the region to which phosphorus has been added and the region to which no phosphorus has been added is increased to enhance gettering efficiency.Type: ApplicationFiled: January 3, 2003Publication date: July 31, 2003Inventors: Osamu Nakamura, Manabu Katsumura, Shunpei Yamazaki
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Publication number: 20010034088Abstract: The present invention relates to a method of manufacturing a semiconductor device having an excellent gettering effect. In this method, when phosphorus is added to a poly-Si film, which has been crystallized by the addition of a metal, to subject the resultant poly-Si film to the heat treatment to carry out gettering therefor, the device is performed for the shape of the island-like insulating film on the poly-Si film which is employed when implanting phosphorus. Thereby, the area of the boundary surface between the region to which phosphorus has been added and the region to which no phosphorus has been added is increased to enhance gettering efficiency.Type: ApplicationFiled: December 27, 2000Publication date: October 25, 2001Inventors: Osamu Nakamura, Manabu Katsumura, Shunpei Yamazaki