Patents by Inventor Manabu Moroishi

Manabu Moroishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080053370
    Abstract: An aspect of the invention provides a silicon single crystal production method in which a dislocation-free feature can easily be achieved to enhance crystal quality irrespective of a crystal orientation. In the silicon single crystal production method of the invention, by a Czochralski method, in dipping the seed crystal in the melt, a melt temperature is set to an optimum temperature at which the seed crystal is brought into contact with a melt surface, the melt temperature is lowered, the seed crystal is pulled up while a pulling rate of the seed crystal is increased, and the pulling rate is kept at a constant rate to form the neck portion at the time that a pulling diameter reaches a target neck diameter. The invention is suitable to the case in which a silicon single crystal having a crystal orientation <110> is pulled up using the seed crystal having the crystal orientation <110>.
    Type: Application
    Filed: September 4, 2007
    Publication date: March 6, 2008
    Inventors: Shuichi Inami, Kuniharu Inoue, Manabu Moroishi, Tsuguya Fukagawa, Nobuhiro Kusaba
  • Publication number: 20080053368
    Abstract: Exemplary embodiments of the invention provide a method for producing a low-resistivity silicon single crystal in which a silicon wafer having a crystal axis orientation [110] can be obtained and dislocations are sufficiently eliminated, and a method for producing a low-resistance silicon wafer having the crystal axis orientation [110] from the silicon single crystal obtained by the low-resistivity silicon single crystal production method. In the silicon single crystal production method of the invention which employs a Czochralski method, the silicon single crystal whose center axis is inclined by 0.6° to 100 relative to a-crystal axis [110] is grown by dipping a silicon seed crystal in a silicon melt. Boron as a dopant is added in the silicon melt so that a boron concentration ranges from 6.25×1017 to 2.5×1020 atoms/cm3, a center axis of the silicon seed crystal is inclined by 0.
    Type: Application
    Filed: September 4, 2007
    Publication date: March 6, 2008
    Inventors: Shuichi Inami, Kuniharu Inoue, Manabu Moroishi, Tsuguya Fukagawa, Nobuhiro Kusaba
  • Patent number: 7311772
    Abstract: Means for supplying raw material in additional charging or recharging of solid granular raw material into molten material in the crucible, comprises a raw material supply tube to be filled with said material, a metallic support member which runs through the inside of the tube, connects with the bottom lid, and serves for descending the lid and for ascending the tube and the lid, and a configuration avoiding metallic contamination, whereby the lower-end aperture of the tube is opened for charging said material therein into the crucible in uniform circumferential distribution and in large quantity, thus achieving efficient supply operation to be widely applied for growing silicon single crystals.
    Type: Grant
    Filed: September 20, 2005
    Date of Patent: December 25, 2007
    Assignee: Sumco Corporation
    Inventors: Katsunori Nakashima, Koji Toma, Manabu Moroishi
  • Publication number: 20060060133
    Abstract: Means for supplying raw material in additional charging or recharging of solid granular raw material into molten material in the crucible, comprises a raw material supply tube to be filled with said material, a metallic support member which runs through the inside of the tube, connects with the bottom lid, and serves for descending the lid and for ascending the tube and the lid, and a configuration avoiding metallic contamination, whereby the lower-end aperture of the tube is opened for charging said material therein into the crucible in uniform circumferential distribution and in large quantity, thus achieving efficient supply operation to be widely applied for growing silicon single crystals.
    Type: Application
    Filed: September 20, 2005
    Publication date: March 23, 2006
    Inventors: Katsunori Nakashima, Koji Toma, Manabu Moroishi
  • Patent number: 6805746
    Abstract: Granules/lumps poly-silicon raw material, low in raw material cost and free of the hazard of crack is additionally charged into a crucible in a safe and steady manner. In a single crystal growth according to the CZ method, poly-silicon raw material ins initially charged into a crucible. Above the initially charged poly-silicon raw material, a heat resistant tubular container is placed. The granules/lumps poly-silicon raw material for use in additional charging is charged inot the tubular container. The poly-silicon raw material initially charged into the crucible is melted. The poly-silicon raw material in the tubular container gradually and spontaneously comes down into the crucible, as the bulk of poly-silicon raw material is decreased according to the melting of the initially charged raw material.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: October 19, 2004
    Assignee: Sumitomo Mitsubishi Silicon Corporation
    Inventors: Manabu Moroishi, Kenichi Takenaka
  • Publication number: 20030041795
    Abstract: Granules/lumps poly-silicon raw material, low in raw material cost and free of the hazard of crack, is additionally charged into a crucible in a safe and steady manner.
    Type: Application
    Filed: July 3, 2002
    Publication date: March 6, 2003
    Inventors: Manabu Moroishi, Kenichi Takenaka