Abstract: A granular pesticidal composition in which a powdery pesticide is aggregated and coated with a thermosetting resin is capable of enabling a pesticidal active ingredient to be controlled-released. Further, the controlled-release pesticidal granule can be produced by mixing a powdery pesticide with a first liquid component serving as a raw material for a thermosetting resin, a process of adding a second liquid component serving as a raw material for a thermosetting resin, and then making the first liquid component react with the second liquid component to produce a thermosetting resin.

Abstract: Disclosed is a powdery pesticidal composition which comprises a mixture of a coated pesticide comprising a powdery pesticide coated with a thermosetting resin and having a volume median diameter of 10 to 150 ?m and a calcium carbonate micropowder having a bulk density of 0.6 g/ml or less, wherein the weight-based ratio of the coated pesticide to the calcium carbonate micropowder is 100:1 to 100:30. The powdery pesticidal composition has good fluidability.

Abstract: A granular pesticidal composition in which a powdery pesticide is aggregated and coated with a thermosetting resin is capable of enabling a pesticidal active ingredient to be controlled-released. Further, the controlled-release pesticidal granule can be produced by mixing a powdery pesticide with a first liquid component serving as a raw material for a thermosetting resin, a process of adding a second liquid component serving as a raw material for a thermosetting resin, and then making the first liquid component react with the second liquid component to produce a thermosetting resin.

Abstract: A coated seed obtained by coating a seed with a coating material containing an inorganic mineral powder and a thermosetting resin powder having an average particle diameter of 10 to 200 ?m, wherein the thermosetting resin powder is a thermosetting resin powder obtained by aggregating a powdery pesticide with a thermosetting resin has an excellent quality.

Abstract: A coated seed obtained by coating a seed with a coating material containing an inorganic mineral powder and a thermosetting resin powder having an average particle diameter of 10 to 200 ?m, wherein the thermosetting resin powder is a thermosetting resin powder obtained by aggregating a powdery pesticide with a thermosetting resin has an excellent quality.

Abstract: Disclosed is a powdery pesticidal composition which comprises a mixture of a coated pesticide comprising a powdery pesticide coated with a thermosetting resin and having a volume median diameter of 10 to 150 ?m and a calcium carbonate micropowder having a bulk density of 0.6 g/ml or less, wherein the weight-based ratio of the coated pesticide to the calcium carbonate micropowder is 100:1 to 100:30. The powdery pesticidal composition has good fluidability.

Abstract: A coated pesticidal granule obtained by aggregating a powdery pesticide with a thermosetting resin is capable of enabling a pesticidal active ingredient to be controlled-released. Further, the controlled-release pesticidal granule can be produced by mixing a powdery pesticide with a first liquid component serving as a raw material for a thermosetting resin, a process of adding a second liquid component serving as a raw material for a thermosetting resin, and then making the first liquid component react with the second liquid component to produce a thermosetting resin.

Abstract: A thin film is fabricated while causing ions in a plasma P to be incident by effecting biasing relative to the space potential of the plasma P by imparting a set potential to the surface of a substrate 9. A bias system 6 causes the substrate surface potential Vs to vary in pulse form by imposing an electrode imposed voltage Ve in pulse form on a bias electrode 23 which is in a dielectric block 22. The pulse frequency is lower than the oscillation frequency of ions in the plasma P, and the pulse period T, pulse width t and pulse height h are controlled by a control section 62 in a manner such that the incidence of ions is optimized. The imposed pulses are controlled in a manner such that the substrate surface potential Vs recovers to a floating potential Vf at the end of a pulse period T, and that the ion incidence energy temporarily crosses a thin film sputtering threshold value in a pulse period T.

Abstract: A thin film is fabricated while causing ions in a plasma P to be incident by effecting biasing relative to the space potential of the plasma P by imparting a set potential to the surface of a substrate 9. A bias system 6 causes the substrate surface potential Vs to vary in pulse form by imposing an electrode imposed voltage Ve in pulse form on a bias electrode 23 which is in a dielectric block 22. The pulse frequency is lower than the oscillation frequency of ions in the plasma P, and the pulse period T, pulse width t and pulse height h are controlled by a control section 62 in a manner such that the incidence of ions is optimized. The imposed pulses are controlled in a manner such that the substrate surface potential Vs recovers to a floating potential Vf at the end of a pulse period T, and that the ion incidence energy temporarily crosses a thin film sputtering threshold value in a pulse period T.

Abstract: A thin film is fabricated while causing ions in a plasma P to be incident by effecting biasing relative to the space potential of the plasma P by imparting a set potential to the surface of a substrate 9. A bias system 6 causes the substrate surface potential Vs to vary in pulse form by imposing an electrode imposed voltage Ve in pulse form on a bias electrode 23 which is in a dielectric block 22. The pulse frequency is lower than the oscillation frequency of ions in the plasma P, and the pulse period T, pulse width t and pulse height h are controlled by a control section 62 in a manner such that the incidence of ions is optimized. The imposed pulses are controlled in a manner such that the substrate surface potential Vs recovers to a floating potential Vf at the end of a pulse period T, and that the ion incidence energy temporarily crosses a thin film sputtering threshold value in a pulse period T.

Abstract: A method of depositing a thin film on a substrate by plasma-enhanced CVD is provided. The method includes introducing H.sub.2 or H.sub.2 and N.sub.2 into a plasma-enhanced CVD reactor; generating a plasma in the reactor; introducing a reaction gas comprising TiCl.sub.4, silane, and either H.sub.2 or H.sub.2 and N.sub.2 into the reactor; and depositing a Ti film or a TiN film containing Si on a substrate in the reactor.

Abstract: An electrode unit of a thermal CVD apparatus is used to generate plasma discharge for an in-situ cleaning process. The electrode unit is configured by a substrate holder and a shield member connected to a high frequency power supply, the gas supply section electrically grounded, and an auxiliary electrode disposed in the gas supply section. In a film deposition process, a reactive gas is supplied from the gas supply section, and the reactive gas is excited in a space in front of a substrate to deposit a thin film onto the substrate. In a periodical in-situ cleaning process, a cleaning gas is supplied from the gas supply section and a cleaning discharge is generated to remove unwanted films deposited on the substrate holder and the shield member. The auxiliary electrode causes the cleaning discharge to be concentrated in a space around unwanted films.

Abstract: A CVD mechanism includes a reactor, a substrate holder, a heating apparatus for heating the substrate holder, a reaction gas supply plate for supplying reaction gas into the reactor, and at least two cylinders disposed in a concentric form on the substrate-facing surface of the reaction gas supply plate so that reaction gas is supplied from an inward portion of each cylinder in the reaction gas supply plate. A power supply mechanism for supplying power to the reaction gas supply plate and the substrate holder, and ring magnets disposed in the upper and lower portions of the reactor are provided so that magnetic lines of force passing through a plasma space are generated by the facing magnetic pole parts of the respective magnets.

Abstract: A CVD apparatus is equipped with a reactor, a substrate holder, an evacuation section, a reactive gas supply mechanism, a heating mechanism for heating the substrate holder, a differential pressure chuck clamping section for clamping the substrate, and a purge gas supply mechanism for supplying purge gas. The substrate holder is configured to have a circular purge gas blowing channel on the top surface thereof, in which a diameter of an outside wall-surface is less than a diameter of the substrate, and a plurality of purge gas passages in an inside thereof, each of which supplies the purge gas into the purge gas blowing channel. The purge gas passing the purge gas blowing channel is blown off through a clearance between the outer periphery of the substrate and the substrate holder. The purge gas passage includes a radius-directed part directed in a radius direction of the substrate holder and has a purge gas outlet provided on the outside wall-surface of the purge gas blowing channel.

Abstract: Insecticidal wettable powders containing an insecticide which is liquid at room temperature and a calcined synthetic hydrated silicon dioxide, which can retain its insecticidal effect for a long time without separating oil drops when used by diluting with water.

Abstract: A fungicidal composition containing a fungicidally effective amount of tolchlofos-methyl [O,O-dimethyl O-(2,6-dichloro-4-methylphenyl) phosphorothioate] as an active ingredient, attapulgite clay as a carrier and polypropylene glycol as a stabilizer, its formulation and its use as a fungicide.

Abstract: A pesticidal aqueous suspension having an excellent dispersion stability, which comprises, as a pesticidally active ingredient, an N-methyl- or N-phenylcarbamate which is solid and has a solubility in water of about 10 to 10,000 ppm at room temperature, suspended in water in a finely dispersed state with a surfactant having a hydrophilelipophile balance (HLB) less than 5 and polyvinyl alcohol having a degree of hydrolysis of about 70 to 90 mol % and a degree of polymerization of about 300 to 2,600 as dispersing agents in the presence of ethylene glycol and liquid paraffin as dispersion stabilizers.