Patents by Inventor MANDAR BALASAHEB PANDIT

MANDAR BALASAHEB PANDIT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9355820
    Abstract: Embodiments of methods for removing carbon-containing films are provided herein. In some embodiments, a method for removing a carbon-containing layer includes providing an ammonia containing process gas to a process chamber having a substrate with a silicon oxide layer disposed atop the substrate and a carbon-containing layer disposed atop the silicon oxide layer disposed in the process chamber; providing RF power to the process chamber to ignite the ammonia containing process gas to form a plasma; and exposing the substrate to NH and/or NH2 radicals and hydrogen radicals formed in the plasma to remove the carbon-containing layer.
    Type: Grant
    Filed: September 12, 2014
    Date of Patent: May 31, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Wei Liu, Naomi Yoshida, Mandar Balasaheb Pandit
  • Publication number: 20150072526
    Abstract: Embodiments of methods for removing carbon-containing films are provided herein. In some embodiments, a method for removing a carbon-containing layer includes providing an ammonia containing process gas to a process chamber having a substrate with a silicon oxide layer disposed atop the substrate and a carbon-containing layer disposed atop the silicon oxide layer disposed in the process chamber; providing RF power to the process chamber to ignite the ammonia containing process gas to form a plasma; and exposing the substrate to NH and/or NH2 radicals and hydrogen radicals formed in the plasma to remove the carbon-containing layer.
    Type: Application
    Filed: September 12, 2014
    Publication date: March 12, 2015
    Inventors: WEI LIU, NAOMI YOSHIDA, MANDAR BALASAHEB PANDIT