Patents by Inventor Mandayam Sriram

Mandayam Sriram has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PECVD processes for silicon dioxide films
    Publication number: 20070054505
    Abstract: Embodiments of the present invention provide PECVD (plasma enhanced chemical vapor deposition) processes that produce uniform, dense SiO2 (silicon dioxide) films having a high purity that are suitable for use in IC device fabrication. Advantageously, these processes do not require the use of a DC bias or dual frequency RF power and can use some of the same precursors used to make low-k ILD films.
    Type: Application
    Filed: September 2, 2005
    Publication date: March 8, 2007
    Inventors: George Antonelli, Mandayam Sriram
  • Method of forming boron-doped and fluorine-doped organosilicate glass films
    Publication number: 20060222864
    Abstract: An embodiment of the invention is a method of forming a low-k carbon doped oxide dielectric material with improved mechanical properties.
    Type: Application
    Filed: March 31, 2005
    Publication date: October 5, 2006
    Inventors: George Antonelli, Mandayam Sriram, Michael Goodner