Abstract: A microscope measuring arrangement for inspecting a substrate includes a microscope, an illuminating system, preferably a sight glass, a holder, a substrate pallet and a rotary apparatus and/or tilting apparatus. The substrate pallet can be moved between at least two positions, which lie in the visual ranges respectively of the microscope and the sight glass. The substrate is first subject to an oblique light inspection for finding defect positions by the rotary and/or tilting apparatus. Without having to remove the substrate from the substrate pallet, the microscope to undertake a high-resolution inspection for classifying the defect at the defect position found.

Abstract: A microscope measuring arrangement for inspecting a substrate comprises a microscope, an illuminating system, preferably a sight glass, a holder, a substrate pallet and a rotary apparatus and/or tilting apparatus. The substrate pallet can be moved between at least two positions, which lie in the visual ranges 11, 21 respectively of the microscope and the sight glass. The substrate can firstly be subjected by means of the rotary and/or tilting apparatus 71, 72 to an oblique light inspection for finding defect positions. Without having to remove the substrate from the substrate pallet, it is subsequently possible to use the microscope to undertake a high-resolution inspection for the purpose of classifying the defect at the defect position found.