Abstract: Support elements for electron beam systems for semiconductor manufacture must be subject to at most minimal temperature influences, as they have important effects on the adjustment precision. The composition of such support elements from a glass ceramic with a crystalline phase with high quartz structure and with a residual vitreous phase permits extensive compensation of the thermal expansion of the two phases. The use of the glass ceramic for mask substrate, mask cassettes, receiving table with support arm, and mirror substrate reduces the time requirement as well as the error susceptibility in the temperature control of the system.