Patents by Inventor Manfred G. Tenner

Manfred G. Tenner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment device and lithographic apparatus provided with such a device
    Patent number: 5917604
    Abstract: A device is described for aligning a first object provided with a first alignment mark (P) with respect to a second object provided with a second alignment mark (M), which marks have a periodical structure and are imaged onto each other. By selecting beam portions from the radiation from the first alignment mark (P) with the aid of an order diaphragm (55'), which beam portions are deflected through larger angles, the sensitivity of the device to errors can be decreased. Such a device may be used to great advantage in a lithographic apparatus.
    Type: Grant
    Filed: March 13, 1997
    Date of Patent: June 29, 1999
    Assignee: U.S. Philips Corporation
    Inventors: Peter Dirksen, Jan E. Van Der Werf, Manfred G. Tenner
  • Method of determining the radiation dose in a lithographic apparatus
    Patent number: 5910847
    Abstract: A method and apparatus for forming a pattern on a substrate (w), either or not via a mask pattern (c), are described. The radiation dose can be measured accurately and reliably by measuring a latent image of a new, asymmetrical test mark (TM) by means of an optical alignment device present in the apparatus or associated therewith, this latent image being formed by means of production radiation (PB) in the radiation-sensitive layer on the substrate.
    Type: Grant
    Filed: February 18, 1997
    Date of Patent: June 8, 1999
    Assignee: U.S. Philips Corporation
    Inventors: Jan E. Van der Werf, Peter Dirksen, Manfred G. Tenner
  • Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method
    Patent number: 5673101
    Abstract: A method and apparatus for repetitively imaging a mask pattern (C) on a substrate (W) are described. Various parameters of the apparatus and the projection lens system (PL) can be measured accurately and reliably and measuring devices of the apparatus can be calibrated by measuring a latent image of a mark by means of a scanning microscope (LID) forming a diffraction-limited radiation spot (Sp) on the photoresist layer on the substrate (W), in which layer the latent image is formed by means of a projection beam (PB).
    Type: Grant
    Filed: May 25, 1995
    Date of Patent: September 30, 1997
    Assignee: U.S. Philips Corporation
    Inventors: Manfred G. Tenner, Jan E. van der Werf, Cornelis M. J. van Uijen, Peter Dirksen
  • Radiation-source unit for generating a beam having two directions of polarisation and two frequencies
    Patent number: 5485272
    Abstract: A radiation-source unit is described which produces a radiation beam (30) with two components (9, 10) which are polarized perpendicularly relative to one another and which have different frequencies. The unit comprises a radiation source, a beam splitter (4), an acousto-optical modulation system (13, 18) for generating the frequency difference, and a beam combiner (25). Since the beam splitter and the beam combiner are transmission elements and their connecting line extends through the center of the modulation system the unit is compact and no alignment problems occur. Moreover, the frequency difference is adjustable over a wide range.
    Type: Grant
    Filed: May 24, 1994
    Date of Patent: January 16, 1996
    Assignee: U.S. Philips Corporation
    Inventors: Peter Dirksen, Manfred G. Tenner, Jan E. van der Werf