Abstract: The present disclosure relates to a chemical vapor deposition apparatus for providing a surface of a substrate with a layer, the apparatus comprising: a reactor having a chamber for accommodating at least one substrate, a pressure unit configured to generate, in an inner portion of the chamber, a first predetermined pressure. The pressure unit comprises a first pumping stage having at least one liquid ring vacuum pump, and a second pumping stage having at least one dry screw vacuum pump.

Abstract: An in-line vacuum coating system includes a vacuum chamber, a coating source and a substrate carrier for holding tubular substrates, the carrier being displaceable using the vacuum chamber. A sure method of simply and securely coupling a fixed rotational drive unit to a carrier that can be displaced at a constant rate of speed in an in-line vacuum coating system is accomplished by a fixed splined shaft rotatably installed and connectable to a rotational drive unit, and a gearwheel that can be engaged with the splined shaft and that is rotatably mounted on the carrier. The gearwheel is longitudinally displaceable to a predefined extent in spring-loaded fashion in a direction opposite to the direction of travel of the carrier.

Abstract: An in-line vacuum coating system includes a vacuum chamber, a coating source and a substrate carrier for holding tubular substrates, the carrier being displaceable using the vacuum chamber. A sure method of simply and securely coupling a fixed rotational drive unit to a carrier that can be displaced at a constant rate of speed in an in-line vacuum coating system is accomplished by a fixed splined shaft rotatably installed and connectable to a rotational drive unit, and a gearwheel that can be engaged with the splined shaft and that is rotatably mounted on the carrier. The gearwheel is longitudinally displaceable to a predefined extent in spring-loaded fashion in a direction opposite to the direction of travel of the carrier.