Patents by Inventor Manfred Schnoeller

Manfred Schnoeller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4914565
    Abstract: The invention is directed to a piezo-electric transducer having electrodes that adhere well both to ceramic as well as to plastics and that are composed of intrinsically conductive plastic. The invention is also directed to a method for the manufacture thereof. A conductive polymer layer is produced on the surface of a piezo-ceramic component by chemical or anodic oxidation of a monomer. The monomers are selected from the class of 5-member heterocycles containing sulfur or nitrogen as heteroatom, or aniline, azuline, or derivatives of the said compounds. The components provided with the economical electrodes can be advantageously composed to form sandwich-like transducers having plastic intermediate layers that exhibit good electro-acoustical properties.
    Type: Grant
    Filed: April 28, 1988
    Date of Patent: April 3, 1990
    Assignee: Siemens Aktiengesellschaft
    Inventors: Manfred Schnoeller, Jutta Mohaupt, Wolfram Wersing, Karl Lubitz
  • Patent number: 4900972
    Abstract: The invention provides an electrode for piezoelectric composites having high acoustic attenuation. The electrode is composed of a first layer having high elasticity and lower conductivity and of a second layer lying thereabove that has higher conductivity. The invention also provides a method for the manufacture thereof. The first layer is an intrinsically conductive plastic directly deposited on the ceramic whose polymerization is initiated by chemical or anodic oxidation of the corresponding monomers. The second layer is fashioned of adequately conductive metal and is preferably first sputtered on or vapor-deposited in a thinner layer and is then subsequently electrolytically reinforced. Piezoelectric composites that exhibit high acoustic attenation and, thus, prevent an acoustic crosstalk between the individual transducer elements can be manufactured from piezoelectric ceramic lamina or foils provided with such electrodes.
    Type: Grant
    Filed: June 30, 1988
    Date of Patent: February 13, 1990
    Assignee: Siemens Aktiengesellschaft
    Inventors: Wolfram Wersing, Manfred Schnoeller, Karl Lubitz, Jutta Mohaupt
  • Patent number: 4617707
    Abstract: A method for the manufacture of a linear or annular ultrasonics antenna array for the megahertz range, which consists in providing a laminate of alternating layers of unsintered ceramic and spacing layers, the spacing layers being composed of a filler material which is heat fugitive at the sintering temperature of the ceramic, the spacing material also including refractory grains distributed therein of a size which corresponds to the spacing desired between the ceramic layers, sintering the laminate to thereby liberate the filler material and leave voids between the refractory grains, impregnating the resulting laminate with a polymerizable resin to bond the sintered ceramic layers together, and separating the resulting laminate into individual transducer elements.
    Type: Grant
    Filed: September 9, 1985
    Date of Patent: October 21, 1986
    Assignee: Siemens Aktiengesellschaft
    Inventors: Jutta Mohaupt, Karl Lubitz, Manfred Schnoeller, Wolfram Wersing
  • Patent number: 4119441
    Abstract: A method is disclosed for the production of n-doped silicon single crystals, each having a dish-shaped specific electrical resistance profile in a radial direction about a central axis of the crystal. A silicon single crystal is exposed to a pattern of radiation with neutrons according to the reaction 30.sub.Si (n,.gamma.) 31.sub.Si .sup..beta.-.fwdarw. 31.sub.P. The neutron radiation causes a weaker doping concentration in marginal regions of the crystals due to the production of fewer phosphorus atoms. Either p-conductive silicon crystals or n-conductive silicon crystals may be utilized as an initial material for exposure to the neutron radiation.
    Type: Grant
    Filed: October 12, 1976
    Date of Patent: October 10, 1978
    Assignee: Siemens Aktiengesellschaft
    Inventors: Ernst Haas, Karl Platzoeder, Manfred Schnoeller
  • Patent number: 4073859
    Abstract: Method and apparatus for forming silicon U-shaped carrier members from straight silicon rods using a combination of rod movement, zone heating, and controlled bending.
    Type: Grant
    Filed: December 4, 1975
    Date of Patent: February 14, 1978
    Assignee: Siemens Aktiengesellschaft
    Inventors: Werner Baumgartner, Manfred Schnoeller
  • Patent number: 4048508
    Abstract: An apparatus for doping a semiconductor crystalline rod by nuclear or radiogenic reactions comprised of a hollow irradiation housing having axially and rotatably movable rod support means within the chamber thereof and a neutron conductive sleeve connected with the housing and providing communication between a neutron source and the housing chamber. Accurate and controlled doping of a semiconductor crystalline rod mounted on the rod support means within the housing chamber occurs via controlled rod movement in relation to the neutron source.
    Type: Grant
    Filed: August 11, 1975
    Date of Patent: September 13, 1977
    Assignee: Siemens Aktiengesellschaft
    Inventors: Joachim Martin, Ernst Haas, Manfred Schnoeller
  • Patent number: 4042454
    Abstract: Si monocrystals of the n-type are produced by zone melting polycrystalline Si rods under conditions sufficient to produce monocrystal rods, measuring the specific conductivity of such monocrystal rods and subjecting such monocrystal rods to a controlled radiation by thermal neutrons based on the measured conductivity to produce a desired degree of n-conductivity in the ultimately attained rods.
    Type: Grant
    Filed: November 6, 1974
    Date of Patent: August 16, 1977
    Assignee: Siemens Aktiengesellschaft
    Inventors: Ernst Haas, Joachim Martin, Konrad Reuschel, Manfred Schnoeller
  • Patent number: 4027051
    Abstract: Homogeneously doped Si monocrystals of the n-type are produced from p- or n-type Si crystals having a random dopant concentration in radial and axial directions of the crystal and the dopant concentration within such crystals is adjusted by subjecting such crystals to controlled thermal neutron radiation.
    Type: Grant
    Filed: December 6, 1974
    Date of Patent: May 31, 1977
    Assignee: Siemens Aktiengesellschaft
    Inventors: Konrad Reuschel, Manfred Schnoeller, Alfred Muehlbauer, Eberhard Spenke, Wolfgang Keller
  • Patent number: 3974561
    Abstract: Hollow semiconductor bodies are formed from a gaseous phase by deposition on a heated mandrel and end zones of a so-produced body are doped so as to be conductive at room temperature.
    Type: Grant
    Filed: May 30, 1974
    Date of Patent: August 17, 1976
    Assignee: Siemens Aktiengesellschaft
    Inventor: Manfred Schnoeller
  • Patent number: 3967982
    Abstract: A semiconductor layer, such as an epitaxial layer on a suitable substrate is subjected to controlled bombardment by neutrons whereby the atoms of the semiconductor layer are converted via nuclear reaction into doping material atoms.
    Type: Grant
    Filed: July 11, 1975
    Date of Patent: July 6, 1976
    Assignee: Siemens Aktiengesellschaft
    Inventors: Heinz-Herbert Arndt, Joachim Burtscher, Gustav Fischer, Ernst Haas, Joachim Martin, Gunter Raab, Manfred Schnoeller