Abstract: The present invention concerns a process for the preparation of a porous carbon structure comprising the steps: a) providing a template comprising voids, b) filling of at least part of the voids with a precursor for the formation of the porous carbon structure, c) carbonizing the precursor for the formation of the porous carbon structure and d) removing at least part of the template. In preferred embodiments the precursor for the formation of the porous carbon structure is a formaldehyde-phenol resin, especially a cross-linked resorcinol-formaldehyde resin. The template further preferably comprises a block copolymer and an amphiphilic molecule, wherein the block copolymer comprises polymeric units of at least one lipophilic monomer and polymeric units of at least one hydrophilic monomer. Further preferred is a process wherein the template comprises a bimodal mixture of particles of silicon dioxide.

Abstract: The present invention concerns a process for the preparation of a porous carbon structure comprising the steps: a) providing a template comprising voids, b) filling of at least part of the voids with a precursor for the formation of the porous carbon structure, c) carbonizing the precursor for the formation of the porous carbon structure and d) removing at least part of the template. In preferred embodiments the precursor for the formation of the porous carbon structure is a formaldehyde-phenol resin, especially a cross-linked resorcinol-formaldehyde resin. The template further preferably comprises a block copolymer and an amphiphilic molecule, wherein the block copolymer comprises polymeric units of at least one lipophilic monomer and polymeric units of at least one hydrophilic monomer. Further preferred is a process wherein the template comprises a bimodal mixture of particles of silicon dioxide.

Abstract: The invention refers to the fields of chemistry and mechanical engineering, relates to a permanent coating, which have a functionalization of the surfaces for the avoidance or reduction of ice growth on this surface. The object of the present solution is to disclose a permanent coating that is durable and reliably inhibits and/or prevents an icing of the surface. The object is attained through a permanent coating of surfaces for inhibiting and/or preventing icing down to ambient temperatures of ?10° C., in which the coating comprises polymers with main chains and side chains, wherein the polymer main chains are hydrophobic and the side chains are hydrophilic and the polymer main chains have entered into a chemical and/or chemically-coordinative and/or physical interaction with the surface to be coated and the side chains are arranged on the polymer main chain essentially in the direction away from the surface and at least do not permanently interact with one another.

Abstract: The invention refers to the fields of chemistry and mechanical engineering, relates to a permanent coating, which have a functionalization of the surfaces for the avoidance or reduction of ice growth on this surface. The object of the present solution is to disclose a permanent coating that is durable and reliably inhibits and/or prevents an icing of the surface. The object is attained through a permanent coating of surfaces for inhibiting and/or preventing icing down to ambient temperatures of ?10° C., in which the coating comprises polymers with main chains and side chains, wherein the polymer main chains are hydrophobic and the side chains are hydrophilic and the polymer main chains have entered into a chemical and/or chemically-coordinative and/or physical interaction with the surface to be coated and the side chains are arranged on the polymer main chain essentially in the direction away from the surface and at least do not permanently interact with one another.

Abstract: A method for fabricating patterned resist masks. Firstly, a photoresist film is applied on a semiconductor substrate in a customary manner, which photoresist film is then exposed by means of customary techniques. In the development step, a rinsing medium containing a cationic surfactant is used. If the patterned resist is dried after development, the sidewalls of the resist webs are rendered hydrophobic by the cationic surfactant, so that the contact angle can be increased to values of approximately 90°, reducing capillary forces acting on the webs of the patterned resist to approximately zero. As a result, even in the case of single-layer resist films, the line width of the webs can be reduced without a line collapse being observed.