Patents by Inventor Manjesh KUMAR

Manjesh KUMAR has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11953391
    Abstract: Various embodiments are directed to a pressure sensor and method of using the same. A pressure sensor may comprise a substrate having a substrate thickness extending between a first substrate surface and a second substrate surface, wherein the first substrate surface and the second substrate surface define opposing ends of the substrate thickness; a first pressure sensing assembly attached to the first substrate surface and configured to detect a first pressure force associated with a first fluid volume, wherein a portion of the first substrate surface adjacent the first pressure sensing assembly is fluidly isolated from the first volume of fluid; and a second pressure sensing assembly attached to the second substrate surface and configured to detect a second pressure force associated with a second volume of fluid, wherein a portion of the second substrate surface adjacent the second pressure sensing assembly is fluidly isolated from the second fluid volume.
    Type: Grant
    Filed: October 20, 2022
    Date of Patent: April 9, 2024
    Assignee: Honeywell International Inc.
    Inventors: Sathish Vadlamudi, Manjesh Kumar B, Sudheer Beligere Sreeramu
  • Patent number: 11866325
    Abstract: The methods for synthesizing mordenite (MOR) zeolite crystals described herein utilize a combination of organics and produce MOR crystals with reduced size, higher Si/Al ratio, fewer stacking faults, less occluded organics in the final product, and a longer catalyst lifetime.
    Type: Grant
    Filed: May 15, 2019
    Date of Patent: January 9, 2024
    Assignee: UNIVERSITY OF HOUSTON SYSTEM
    Inventors: Jeffrey D. Rimer, Manjesh Kumar
  • Patent number: 11867583
    Abstract: Disclosed are pressure sensors including a die and an application-specific integrated circuit (ASIC) mounted on a top surface of a substrate. The pressure sensor can define an inner volume and a bottom opening configured to abut the substrate. The die and ASIC are mounted on the top surface of the substrate within the inner volume. The substrate defines a first aperture therethrough and the die defines a second aperture therethrough in a direction along an axis perpendicular to the substrate, the first aperture and the second aperture being aligned. Metallic barrier(s) disposed on a bottom surface of the substrate, circumferentially about the first aperture, can be at least partially coated with solder mask to reduce or prevent flow of unwanted materials past the metallic barriers and through the first aperture. The substrate can include electrical connection pads on the bottom surface configured to be in communication with a daughter board.
    Type: Grant
    Filed: November 3, 2022
    Date of Patent: January 9, 2024
    Assignee: Honeywell International Inc.
    Inventors: Manjesh Kumar B, Alistair David Bradley, Josh M. Fribley, Sudheer Beligere Sreeramu, Sathish Vadlamudi
  • Publication number: 20230086677
    Abstract: Disclosed are pressure sensors including a die and an application-specific integrated circuit (ASIC) mounted on a top surface of a substrate. The pressure sensor can define an inner volume and a bottom opening configured to abut the substrate. The die and ASIC are mounted on the top surface of the substrate within the inner volume. The substrate defines a first aperture therethrough and the die defines a second aperture therethrough in a direction along an axis perpendicular to the substrate, the first aperture and the second aperture being aligned. Metallic barrier(s) disposed on a bottom surface of the substrate, circumferentially about the first aperture, can be at least partially coated with solder mask to reduce or prevent flow of unwanted materials past the metallic barriers and through the first aperture. The substrate can include electrical connection pads on the bottom surface configured to be in communication with a daughter board.
    Type: Application
    Filed: November 3, 2022
    Publication date: March 23, 2023
    Inventors: Manjesh Kumar B, Alistair David BRADLEY, Josh M. FRIBLEY, Sudheer Beligere SREERAMU, Sathish VADLAMUDI
  • Publication number: 20230058515
    Abstract: Various embodiments are directed to a pressure sensor and method of using the same. A pressure sensor may comprise a substrate having a substrate thickness extending between a first substrate surface and a second substrate surface, wherein the first substrate surface and the second substrate surface define opposing ends of the substrate thickness; a first pressure sensing assembly attached to the first substrate surface and configured to detect a first pressure force associated with a first fluid volume, wherein a portion of the first substrate surface adjacent the first pressure sensing assembly is fluidly isolated from the first volume of fluid; and a second pressure sensing assembly attached to the second substrate surface and configured to detect a second pressure force associated with a second volume of fluid, wherein a portion of the second substrate surface adjacent the second pressure sensing assembly is fluidly isolated from the second fluid volume.
    Type: Application
    Filed: October 20, 2022
    Publication date: February 23, 2023
    Inventors: Sathish Vadlamudi, Manjesh Kumar B., Sudheer Beligere Sreeramu
  • Patent number: 11519800
    Abstract: Disclosed are pressure sensors including a die and an application-specific integrated circuit (ASIC) mounted on a top surface of a substrate. The pressure sensor can define an inner volume and a bottom opening configured to abut the substrate. The die and ASIC are mounted on the top surface of the substrate within the inner volume. The substrate defines a first aperture therethrough and the die defines a second aperture therethrough in a direction along an axis perpendicular to the substrate, the first aperture and the second aperture being aligned. Metallic barrier(s) disposed on a bottom surface of the substrate, circumferentially about the first aperture, can be at least partially coated with solder mask to reduce or prevent flow of unwanted materials past the metallic barriers and through the first aperture. The substrate can include electrical connection pads on the bottom surface configured to be in communication with a daughter board.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: December 6, 2022
    Assignee: HONEYWELL INTERNATIONAL INC.
    Inventors: Manjesh Kumar B, Alistair David Bradley, Josh M. Fribley, Sudheer Beligere Sreeramu, Sathish Vadlamudi
  • Patent number: 11506557
    Abstract: Various embodiments are directed to a pressure sensor and method of using the same. A pressure sensor may comprise a substrate having a substrate thickness extending between a first substrate surface and a second substrate surface, wherein the first substrate surface and the second substrate surface define opposing ends of the substrate thickness; a first pressure sensing assembly attached to the first substrate surface and configured to detect a first pressure force associated with a first fluid volume, wherein a portion of the first substrate surface adjacent the first pressure sensing assembly is fluidly isolated from the first volume of fluid; and a second pressure sensing assembly attached to the second substrate surface and configured to detect a second pressure force associated with a second volume of fluid, wherein a portion of the second substrate surface adjacent the second pressure sensing assembly is fluidly isolated from the second fluid volume.
    Type: Grant
    Filed: October 7, 2020
    Date of Patent: November 22, 2022
    Assignee: HONYWELL INTERNATIONAL INC.
    Inventors: Sathish Vadlamudi, Manjesh Kumar B, Sudheer Beligere Sreeramu
  • Publication number: 20220107234
    Abstract: Various embodiments are directed to a pressure sensor and method of using the same. A pressure sensor may comprise a substrate having a substrate thickness extending between a first substrate surface and a second substrate surface, wherein the first substrate surface and the second substrate surface define opposing ends of the substrate thickness; a first pressure sensing assembly attached to the first substrate surface and configured to detect a first pressure force associated with a first fluid volume, wherein a portion of the first substrate surface adjacent the first pressure sensing assembly is fluidly isolated from the first volume of fluid; and a second pressure sensing assembly attached to the second substrate surface and configured to detect a second pressure force associated with a second volume of fluid, wherein a portion of the second substrate surface adjacent the second pressure sensing assembly is fluidly isolated from the second fluid volume.
    Type: Application
    Filed: October 7, 2020
    Publication date: April 7, 2022
    Inventors: Sathish Vadlamudi, Manjesh Kumar B, Sudheer Beligere Sreeramu
  • Publication number: 20210214237
    Abstract: The methods for synthesizing mordenite (MOR) zeolite crystals described herein utilize a combination of organics and produce MOR crystals with reduced size, higher Si/Al ratio, fewer stacking faults, less occluded organics in the final product, and a longer catalyst lifetime.
    Type: Application
    Filed: May 15, 2019
    Publication date: July 15, 2021
    Applicant: University of Houston System
    Inventors: Jeffrey D. Rimer, Manjesh Kumar
  • Publication number: 20210199526
    Abstract: Disclosed are pressure sensors including a die and an application-specific integrated circuit (ASIC) mounted on a top surface of a substrate. The pressure sensor can define an inner volume and a bottom opening configured to abut the substrate. The die and ASIC are mounted on the top surface of the substrate within the inner volume. The substrate defines a first aperture therethrough and the die defines a second aperture therethrough in a direction along an axis perpendicular to the substrate, the first aperture and the second aperture being aligned. Metallic barrier(s) disposed on a bottom surface of the substrate, circumferentially about the first aperture, can be at least partially coated with solder mask to reduce or prevent flow of unwanted materials past the metallic barriers and through the first aperture. The substrate can include electrical connection pads on the bottom surface configured to be in communication with a daughter board.
    Type: Application
    Filed: December 27, 2019
    Publication date: July 1, 2021
    Inventors: Manjesh Kumar B, Alistair David Bradley, Josh M. Fribley, Sudheer Beligere Sreeramu, Sathish Vadlamudi
  • Patent number: 10662070
    Abstract: Embodiments of the invention generally provide compositions of crystalline zeolite materials with tailored crystal habits and the methods for forming such crystalline zeolite materials. The methods for forming the crystalline zeolite materials include binding one or more zeolite growth modifiers (ZGMs) to the surface of a zeolite crystal, which results in the modification of crystal growth rates along different crystallographic directions, leading to the formation of zeolites having a tailored crystal habit. The improved properties enabled by the tailored crystal habit include a minimized crystal thickness, a shortened internal diffusion pathlength, and a greater step density as compared to a zeolite having the native crystal habit prepared by traditional processes. The tailored crystal habit provides the crystalline zeolite materials with an aspect ratio of about 4 or greater and crystal surfaces having a step density of about 25 steps/?m2 or greater.
    Type: Grant
    Filed: November 8, 2018
    Date of Patent: May 26, 2020
    Assignee: UNIVERSITY OF HOUSTON SYSTEM
    Inventors: Jeffrey D. Rimer, Manjesh Kumar
  • Publication number: 20190144291
    Abstract: Embodiments of the invention generally provide compositions of crystalline zeolite materials with tailored crystal habits and the methods for forming such crystalline zeolite materials. The methods for forming the crystalline zeolite materials include binding one or more zeolite growth modifiers (ZGMs) to the surface of a zeolite crystal, which results in the modification of crystal growth rates along different crystallographic directions, leading to the formation of zeolites having a tailored crystal habit. The improved properties enabled by the tailored crystal habit include a minimized crystal thickness, a shortened internal diffusion pathlength, and a greater step density as compared to a zeolite having the native crystal habit prepared by traditional processes. The tailored crystal habit provides the crystalline zeolite materials with an aspect ratio of about 4 or greater and crystal surfaces having a step density of about 25 steps/?m2 or greater.
    Type: Application
    Filed: November 8, 2018
    Publication date: May 16, 2019
    Applicant: University of Houston System
    Inventors: Jeffrey D. Rimer, Manjesh Kumar
  • Patent number: 10173903
    Abstract: Embodiments of the invention generally provide compositions of crystalline zeolite materials with tailored crystal habits and the methods for forming such crystalline zeolite materials. The methods for forming the crystalline zeolite materials include binding one or more zeolite growth modifiers (ZGMs) to the surface of a zeolite crystal, which results in the modification of crystal growth rates along different crystallographic directions, leading to the formation of zeolites having a tailored crystal habit. The improved properties enabled by the tailored crystal habit include a minimized crystal thickness, a shortened internal diffusion pathlength, and a greater step density as compared to a zeolite having the native crystal habit prepared by traditional processes. The tailored crystal habit provides the crystalline zeolite materials with an aspect ratio of about 4 or greater and crystal surfaces having a step density of about 25 steps/?m2 or greater.
    Type: Grant
    Filed: June 16, 2014
    Date of Patent: January 8, 2019
    Assignee: UNIVERSITY OF HOUSTON SYSTEM
    Inventors: Jeffrey D. Rimer, Manjesh Kumar
  • Publication number: 20150360964
    Abstract: Embodiments of the invention generally provide compositions of crystalline zeolite materials with tailored crystal habits and the methods for forming such crystalline zeolite materials. The methods for forming the crystalline zeolite materials include binding one or more zeolite growth modifiers (ZGMs) to the surface of a zeolite crystal, which results in the modification of crystal growth rates along different crystallographic directions, leading to the formation of zeolites having a tailored crystal habit. The improved properties enabled by the tailored crystal habit include a minimized crystal thickness, a shortened internal diffusion pathlength, and a greater step density as compared to a zeolite having the native crystal habit prepared by traditional processes. The tailored crystal habit provides the crystalline zeolite materials with an aspect ratio of about 4 or greater and crystal surfaces having a step density of about 25 steps/?m2 or greater.
    Type: Application
    Filed: June 16, 2014
    Publication date: December 17, 2015
    Inventors: Jeffrey D. RIMER, Manjesh KUMAR