Patents by Inventor Manjesh KUMAR
Manjesh KUMAR has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12039057Abstract: A cryptography agent is implemented to serve as an intermediary for a client application executing on an unsecured portion of a machine to bring greater hardware-based security to the client application. The cryptography agent does so by generating a public/private key pair for the client application and sealing the key pair inside an enclave that resides on a secured portion of the machine. The cryptography agent fetches confidential information for the client application from a secure server, where the confidential information is encrypted using the public key. The cryptography agent seals the confidential information using seal keys that are directly fused into hardware of the machine on which the enclave resides, which prevents the client application from accessing the confidential information in plaintext form. The client application sends commands to the cryptography agent, which performs operations within the enclave according to the commands once the client application is validated.Type: GrantFiled: December 3, 2021Date of Patent: July 16, 2024Assignee: PAYPAL, INC.Inventors: Harsha Kushtagi, Manjesh Srinivasa, Aman Kumar
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Patent number: 11953391Abstract: Various embodiments are directed to a pressure sensor and method of using the same. A pressure sensor may comprise a substrate having a substrate thickness extending between a first substrate surface and a second substrate surface, wherein the first substrate surface and the second substrate surface define opposing ends of the substrate thickness; a first pressure sensing assembly attached to the first substrate surface and configured to detect a first pressure force associated with a first fluid volume, wherein a portion of the first substrate surface adjacent the first pressure sensing assembly is fluidly isolated from the first volume of fluid; and a second pressure sensing assembly attached to the second substrate surface and configured to detect a second pressure force associated with a second volume of fluid, wherein a portion of the second substrate surface adjacent the second pressure sensing assembly is fluidly isolated from the second fluid volume.Type: GrantFiled: October 20, 2022Date of Patent: April 9, 2024Assignee: Honeywell International Inc.Inventors: Sathish Vadlamudi, Manjesh Kumar B, Sudheer Beligere Sreeramu
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Patent number: 11866325Abstract: The methods for synthesizing mordenite (MOR) zeolite crystals described herein utilize a combination of organics and produce MOR crystals with reduced size, higher Si/Al ratio, fewer stacking faults, less occluded organics in the final product, and a longer catalyst lifetime.Type: GrantFiled: May 15, 2019Date of Patent: January 9, 2024Assignee: UNIVERSITY OF HOUSTON SYSTEMInventors: Jeffrey D. Rimer, Manjesh Kumar
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Patent number: 11867583Abstract: Disclosed are pressure sensors including a die and an application-specific integrated circuit (ASIC) mounted on a top surface of a substrate. The pressure sensor can define an inner volume and a bottom opening configured to abut the substrate. The die and ASIC are mounted on the top surface of the substrate within the inner volume. The substrate defines a first aperture therethrough and the die defines a second aperture therethrough in a direction along an axis perpendicular to the substrate, the first aperture and the second aperture being aligned. Metallic barrier(s) disposed on a bottom surface of the substrate, circumferentially about the first aperture, can be at least partially coated with solder mask to reduce or prevent flow of unwanted materials past the metallic barriers and through the first aperture. The substrate can include electrical connection pads on the bottom surface configured to be in communication with a daughter board.Type: GrantFiled: November 3, 2022Date of Patent: January 9, 2024Assignee: Honeywell International Inc.Inventors: Manjesh Kumar B, Alistair David Bradley, Josh M. Fribley, Sudheer Beligere Sreeramu, Sathish Vadlamudi
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Publication number: 20230086677Abstract: Disclosed are pressure sensors including a die and an application-specific integrated circuit (ASIC) mounted on a top surface of a substrate. The pressure sensor can define an inner volume and a bottom opening configured to abut the substrate. The die and ASIC are mounted on the top surface of the substrate within the inner volume. The substrate defines a first aperture therethrough and the die defines a second aperture therethrough in a direction along an axis perpendicular to the substrate, the first aperture and the second aperture being aligned. Metallic barrier(s) disposed on a bottom surface of the substrate, circumferentially about the first aperture, can be at least partially coated with solder mask to reduce or prevent flow of unwanted materials past the metallic barriers and through the first aperture. The substrate can include electrical connection pads on the bottom surface configured to be in communication with a daughter board.Type: ApplicationFiled: November 3, 2022Publication date: March 23, 2023Inventors: Manjesh Kumar B, Alistair David BRADLEY, Josh M. FRIBLEY, Sudheer Beligere SREERAMU, Sathish VADLAMUDI
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Publication number: 20230058515Abstract: Various embodiments are directed to a pressure sensor and method of using the same. A pressure sensor may comprise a substrate having a substrate thickness extending between a first substrate surface and a second substrate surface, wherein the first substrate surface and the second substrate surface define opposing ends of the substrate thickness; a first pressure sensing assembly attached to the first substrate surface and configured to detect a first pressure force associated with a first fluid volume, wherein a portion of the first substrate surface adjacent the first pressure sensing assembly is fluidly isolated from the first volume of fluid; and a second pressure sensing assembly attached to the second substrate surface and configured to detect a second pressure force associated with a second volume of fluid, wherein a portion of the second substrate surface adjacent the second pressure sensing assembly is fluidly isolated from the second fluid volume.Type: ApplicationFiled: October 20, 2022Publication date: February 23, 2023Inventors: Sathish Vadlamudi, Manjesh Kumar B., Sudheer Beligere Sreeramu
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Patent number: 11519800Abstract: Disclosed are pressure sensors including a die and an application-specific integrated circuit (ASIC) mounted on a top surface of a substrate. The pressure sensor can define an inner volume and a bottom opening configured to abut the substrate. The die and ASIC are mounted on the top surface of the substrate within the inner volume. The substrate defines a first aperture therethrough and the die defines a second aperture therethrough in a direction along an axis perpendicular to the substrate, the first aperture and the second aperture being aligned. Metallic barrier(s) disposed on a bottom surface of the substrate, circumferentially about the first aperture, can be at least partially coated with solder mask to reduce or prevent flow of unwanted materials past the metallic barriers and through the first aperture. The substrate can include electrical connection pads on the bottom surface configured to be in communication with a daughter board.Type: GrantFiled: December 27, 2019Date of Patent: December 6, 2022Assignee: HONEYWELL INTERNATIONAL INC.Inventors: Manjesh Kumar B, Alistair David Bradley, Josh M. Fribley, Sudheer Beligere Sreeramu, Sathish Vadlamudi
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Patent number: 11506557Abstract: Various embodiments are directed to a pressure sensor and method of using the same. A pressure sensor may comprise a substrate having a substrate thickness extending between a first substrate surface and a second substrate surface, wherein the first substrate surface and the second substrate surface define opposing ends of the substrate thickness; a first pressure sensing assembly attached to the first substrate surface and configured to detect a first pressure force associated with a first fluid volume, wherein a portion of the first substrate surface adjacent the first pressure sensing assembly is fluidly isolated from the first volume of fluid; and a second pressure sensing assembly attached to the second substrate surface and configured to detect a second pressure force associated with a second volume of fluid, wherein a portion of the second substrate surface adjacent the second pressure sensing assembly is fluidly isolated from the second fluid volume.Type: GrantFiled: October 7, 2020Date of Patent: November 22, 2022Assignee: HONYWELL INTERNATIONAL INC.Inventors: Sathish Vadlamudi, Manjesh Kumar B, Sudheer Beligere Sreeramu
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Publication number: 20220107234Abstract: Various embodiments are directed to a pressure sensor and method of using the same. A pressure sensor may comprise a substrate having a substrate thickness extending between a first substrate surface and a second substrate surface, wherein the first substrate surface and the second substrate surface define opposing ends of the substrate thickness; a first pressure sensing assembly attached to the first substrate surface and configured to detect a first pressure force associated with a first fluid volume, wherein a portion of the first substrate surface adjacent the first pressure sensing assembly is fluidly isolated from the first volume of fluid; and a second pressure sensing assembly attached to the second substrate surface and configured to detect a second pressure force associated with a second volume of fluid, wherein a portion of the second substrate surface adjacent the second pressure sensing assembly is fluidly isolated from the second fluid volume.Type: ApplicationFiled: October 7, 2020Publication date: April 7, 2022Inventors: Sathish Vadlamudi, Manjesh Kumar B, Sudheer Beligere Sreeramu
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Publication number: 20210214237Abstract: The methods for synthesizing mordenite (MOR) zeolite crystals described herein utilize a combination of organics and produce MOR crystals with reduced size, higher Si/Al ratio, fewer stacking faults, less occluded organics in the final product, and a longer catalyst lifetime.Type: ApplicationFiled: May 15, 2019Publication date: July 15, 2021Applicant: University of Houston SystemInventors: Jeffrey D. Rimer, Manjesh Kumar
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Publication number: 20210199526Abstract: Disclosed are pressure sensors including a die and an application-specific integrated circuit (ASIC) mounted on a top surface of a substrate. The pressure sensor can define an inner volume and a bottom opening configured to abut the substrate. The die and ASIC are mounted on the top surface of the substrate within the inner volume. The substrate defines a first aperture therethrough and the die defines a second aperture therethrough in a direction along an axis perpendicular to the substrate, the first aperture and the second aperture being aligned. Metallic barrier(s) disposed on a bottom surface of the substrate, circumferentially about the first aperture, can be at least partially coated with solder mask to reduce or prevent flow of unwanted materials past the metallic barriers and through the first aperture. The substrate can include electrical connection pads on the bottom surface configured to be in communication with a daughter board.Type: ApplicationFiled: December 27, 2019Publication date: July 1, 2021Inventors: Manjesh Kumar B, Alistair David Bradley, Josh M. Fribley, Sudheer Beligere Sreeramu, Sathish Vadlamudi
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Patent number: 10662070Abstract: Embodiments of the invention generally provide compositions of crystalline zeolite materials with tailored crystal habits and the methods for forming such crystalline zeolite materials. The methods for forming the crystalline zeolite materials include binding one or more zeolite growth modifiers (ZGMs) to the surface of a zeolite crystal, which results in the modification of crystal growth rates along different crystallographic directions, leading to the formation of zeolites having a tailored crystal habit. The improved properties enabled by the tailored crystal habit include a minimized crystal thickness, a shortened internal diffusion pathlength, and a greater step density as compared to a zeolite having the native crystal habit prepared by traditional processes. The tailored crystal habit provides the crystalline zeolite materials with an aspect ratio of about 4 or greater and crystal surfaces having a step density of about 25 steps/?m2 or greater.Type: GrantFiled: November 8, 2018Date of Patent: May 26, 2020Assignee: UNIVERSITY OF HOUSTON SYSTEMInventors: Jeffrey D. Rimer, Manjesh Kumar
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Publication number: 20190144291Abstract: Embodiments of the invention generally provide compositions of crystalline zeolite materials with tailored crystal habits and the methods for forming such crystalline zeolite materials. The methods for forming the crystalline zeolite materials include binding one or more zeolite growth modifiers (ZGMs) to the surface of a zeolite crystal, which results in the modification of crystal growth rates along different crystallographic directions, leading to the formation of zeolites having a tailored crystal habit. The improved properties enabled by the tailored crystal habit include a minimized crystal thickness, a shortened internal diffusion pathlength, and a greater step density as compared to a zeolite having the native crystal habit prepared by traditional processes. The tailored crystal habit provides the crystalline zeolite materials with an aspect ratio of about 4 or greater and crystal surfaces having a step density of about 25 steps/?m2 or greater.Type: ApplicationFiled: November 8, 2018Publication date: May 16, 2019Applicant: University of Houston SystemInventors: Jeffrey D. Rimer, Manjesh Kumar
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Patent number: 10173903Abstract: Embodiments of the invention generally provide compositions of crystalline zeolite materials with tailored crystal habits and the methods for forming such crystalline zeolite materials. The methods for forming the crystalline zeolite materials include binding one or more zeolite growth modifiers (ZGMs) to the surface of a zeolite crystal, which results in the modification of crystal growth rates along different crystallographic directions, leading to the formation of zeolites having a tailored crystal habit. The improved properties enabled by the tailored crystal habit include a minimized crystal thickness, a shortened internal diffusion pathlength, and a greater step density as compared to a zeolite having the native crystal habit prepared by traditional processes. The tailored crystal habit provides the crystalline zeolite materials with an aspect ratio of about 4 or greater and crystal surfaces having a step density of about 25 steps/?m2 or greater.Type: GrantFiled: June 16, 2014Date of Patent: January 8, 2019Assignee: UNIVERSITY OF HOUSTON SYSTEMInventors: Jeffrey D. Rimer, Manjesh Kumar
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Publication number: 20150360964Abstract: Embodiments of the invention generally provide compositions of crystalline zeolite materials with tailored crystal habits and the methods for forming such crystalline zeolite materials. The methods for forming the crystalline zeolite materials include binding one or more zeolite growth modifiers (ZGMs) to the surface of a zeolite crystal, which results in the modification of crystal growth rates along different crystallographic directions, leading to the formation of zeolites having a tailored crystal habit. The improved properties enabled by the tailored crystal habit include a minimized crystal thickness, a shortened internal diffusion pathlength, and a greater step density as compared to a zeolite having the native crystal habit prepared by traditional processes. The tailored crystal habit provides the crystalline zeolite materials with an aspect ratio of about 4 or greater and crystal surfaces having a step density of about 25 steps/?m2 or greater.Type: ApplicationFiled: June 16, 2014Publication date: December 17, 2015Inventors: Jeffrey D. RIMER, Manjesh KUMAR