Abstract: A raised solder-mask-defined (SMD) pad configured for receiving a solder ball on a laminate electronic circuit board and a method of creating the raised SMD pad on a laminate electronic circuit board. The method may comprise forming a base bump, covering the base bump with a conductive bump layer and layering a surrounding material over an extended edge of the conductive bump layer. The surrounding material is patterned to expose a pad face and of a portion of the sides of the conductive bump layer, such that the pad face is disposed above the surface of the surrounding material. The surrounding material may be patterned by a photolithography operation or alternatively, a laser-drill operation.

Abstract: Embodiments of the present invention may provide ways and uses for correlating actual wire bonding machine adjustment parameters to inputs needed for FEA simulations in modeling actual wire bonding operations of a specified capillary design and wire bonding machine. Simulations of wire bonding operations using the specified capillary design are performed with a range of inputs (e.g., capillary displacement, wire yield strength) to develop empirical equations relating to the simulations. Actual wire bonding operations are performed using the specified capillary design with ranges of the actual wire bonding machine adjustment parameters, and the results provide empirical equations relating to the actual wire bonding machine adjustment parameters. The empirical equations are combined to provide empirical equations for the simulation inputs as functions of the actual wire bonding machine adjustment parameters. Such equations may aid in performing chip failure analysis and/or may be incorporated into design rules.

Abstract: A raised solder-mask-defined (SMD) pad configured for receiving a solder ball on a laminate electronic circuit board and a method of creating the raised SMD pad on a laminate electronic circuit board. The method may comprise forming a base bump, covering the base bump with a conductive bump layer and layering a surrounding material over an extended edge of the conductive bump layer. The surrounding material is patterned to expose a pad face and of a portion of the sides of the conductive bump layer, such that the pad face is disposed above the surface of the surrounding material. The surrounding material may be patterned by a photolithography operation or alternatively, a laser-drill operation.