Patents by Inventor Manon Elise Will

Manon Elise Will has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10775707
    Abstract: A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alignment measurement of the substrate, applying heat to the substrate table to reduce cooling of the substrate table provided by the cooling system, the heat being applied between a time at which the alignment measurement is performed and a time at which the lithographic exposure is performed and performing the lithographic exposure of the substrate.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: September 15, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Güneş Nakìbo{hacek over (g)}lu, Manon Elise Will, Sander Catharina Reinier Derks, Johannes Wilhelmus Mollen
  • Publication number: 20200041916
    Abstract: A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alignment measurement of the substrate, applying heat to the substrate table to reduce cooling of the substrate table the substrate table provided by the cooling system, the heat being applied between a time at which the alignment measurement is performed and a time at which the lithographic exposure is performed and performing the lithographic exposure of the substrate.
    Type: Application
    Filed: September 21, 2017
    Publication date: February 6, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Günes NAKÌBOGLU, Manon Elise WILL, Sander Catharina Reinier DERKS, Johannes Wilhelmus MOLLEN
  • Patent number: 9494875
    Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed.
    Type: Grant
    Filed: September 19, 2012
    Date of Patent: November 15, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Sebastiaan Maria Johannes Cornelissen, Noud Jan Gilissen, Anko Jozef Cornelus Sijben, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Ronald Van Der Wilk, Manon Elise Will
  • Patent number: 9429857
    Abstract: An electrostatic clamp (21) configured to hold an object, the electrostatic clamp comprising an electrode (24), a resistive portion (23) formed from a resistive material located on the electrode, and a dielectric portion (22) formed from a dielectric material located on the resistive portion.
    Type: Grant
    Filed: March 19, 2013
    Date of Patent: August 30, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Ronald Van Der Wilk, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Manon Elise Will
  • Publication number: 20150103325
    Abstract: An electrostatic clamp (21) configured to hold an object, the electrostatic clamp comprising an electrode (24), a resistive portion (23) formed from a resistive material located on the electrode, and a dielectric portion (22) formed from a dielectric material located on the resistive portion.
    Type: Application
    Filed: March 19, 2013
    Publication date: April 16, 2015
    Inventors: Ronald Van Der Wilk, Roger Schmitz, Arnoud Willem Notenboom, Manon Elise Will
  • Publication number: 20140253900
    Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed.
    Type: Application
    Filed: September 19, 2012
    Publication date: September 11, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Sebastiaan Maria Johannes Cornelissen, Noud Jan Gilissen, Anko Jozef Cornelus Sijben, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Ronald Van Der Wilk, Manon Elise Will