Abstract: An integrated circuit (IC) chip with a self-contained fluid sensor and method of making the chip. The sensor is in a conduit formed between a semiconductor substrate and a non-conductive cap with fluid entry and exit points through the cap. The conduit may be entirely in the cap, in the substrate or in both. The conduit includes encased temperature sensors at both ends and a central encased heater. The temperature sensors may each include multiple encased diodes and the heater may include multiple encased resistors.

Abstract: A method of forming low-energy x-ray absorbers. Sensors may be formed on a semiconductor, e.g., silicon, wafer. A seed metal layer, e.g., gold, is deposited on the wafer and patterned into stem pads for electroplating. Stems, e.g., gold, are electroplated from the stem seed pads through a stem mask. An absorber layer, e.g., gold, is deposited on the wafer, preferably e-beam evaporated. After patterning the absorbers, absorber and stem mask material is removed, e.g., in a solvent bath and critical point drying.

Abstract: An integrated circuit (IC) chip with a self-contained fluid sensor and method of making the chip. The sensor is in a conduit formed between a semiconductor substrate and a non-conductive cap with fluid entry and exit points through the cap. The conduit may be entirely in the cap, in the substrate or in both. The conduit includes encased temperature sensors at both ends and a central encased heater. The temperature sensors may each include multiple encased diodes and the heater may include multiple encased resistors.

Abstract: A method of forming low-energy x-ray absorbers. Sensors may be formed on a semiconductor, e.g., silicon, wafer. A seed metal layer, e.g., gold, is deposited on the wafer and patterned into stem pads for electroplating. Stems, e.g., gold, are electroplated from the stem seed pads through a stem mask. An absorber layer, e.g., gold, is deposited on the wafer, preferably e-beam evaporated. After patterning the absorbers, absorber and stem mask material is removed, e.g., in a solvent bath and critical point drying.

Abstract: Lab-on-a-chip microfluidic devices having micro-channels able to withstand an internal channel pressure of more than 4,000 psi are described. The micro-channels have rounded cross-sections that prevent turbulent flow within a fluid conveyed within the channel. The channel may have serpentine-shaped length extending between a channel inlet and a channel outlet, the channel thereby being of sufficient length to observe both the stationary and moving phases of the fluid in a chip having a sufficiently small footprint that it is suitable for incorporation into a miniaturized spectrometer. Methods of fabricating lab-on-a-chip microfluidic devices are described by etching recesses in chip substrates such that a first substrate recess mirrors a second substrate recess in an opposed orientation, aligning the substrates such the recesses cooperatively define a micro-channel having a rounded cross-section, and bonding the substrates to define a smooth-walled micro-channel.