Patents by Inventor Manuel Cobian

Manuel Cobian has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deposition Of Metal Films On Diffusion Layers By Atomic Layer Deposition And Organometallic Precursor Complexes Therefor
    Publication number: 20090130466
    Abstract: Organometallic precursor complexes containing a metal and ligands containing electron withdrawing groups are disclosed. The complexes are adapted to undergo exothermic adsorption on a fully passivated diffusion barrier layer and on a metal layer deposited on the diffusion barrier layer and to undergo exothermic reduction on the diffusion barrier layer and the metal layer. The metal is preferably copper. Use of the complexes in atomic layer deposition is also disclosed.
    Type: Application
    Filed: November 16, 2007
    Publication date: May 21, 2009
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Hansong Cheng, Diwakar Garg, Pablo Ordejon, Manuel Cobian