Patents by Inventor Manuel Pfeiffer

Manuel Pfeiffer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device for mask projection of femtosecond and picosecond laser beams with blade, mask, and lens system
    Patent number: 10780525
    Abstract: The present application relates to a device for the mask projection of femtosecond or picosecond laser beams (2) onto a substrate surface, in which the laser beam (2) consisting of laser beam pulses is, at a location of the optical axis, formed to make laser beam pulses with an expanded laser beam cross section or laser beam pulses with a reduced laser beam cross section and said laser beam (2) has a homogeneous intensity distribution over the laser beam cross section. A stop (6) with a predetermined stop aperture geometry and a mask (7) with a predetermined mask aperture geometry are positioned in succession in the beam (2) path at the location.
    Type: Grant
    Filed: May 12, 2015
    Date of Patent: September 22, 2020
    Assignee: Boegli-Gravures SA
    Inventors: Günter Reisse, Steffen Weissmantel, Andy Engel, Manuel Pfeiffer, Alexander Kratsch, Charles Boegli, Matthias Kahl
  • Device for Mask Projection of Femtosecond and Picosecond Laser Beams with Blade, Mask, and Lens System
    Publication number: 20170066079
    Abstract: The present application relates to a device for the mask projection of femtosecond or picosecond laser beams (2) onto a substrate surface, in which the laser beam (2) consisting of laser beam pulses is, at a location of the optical axis, formed to make laser beam pulses with an expanded laser beam cross section or laser beam pulses with a reduced laser beam cross section and said laser beam (2) has a homogeneous intensity distribution over the laser beam cross section. A stop (6) with a predetermined stop aperture geometry and a mask (7) with a predetermined mask aperture geometry are positioned in succession in the beam (2) path at the location.
    Type: Application
    Filed: May 12, 2015
    Publication date: March 9, 2017
    Inventors: Günther Reisse, Steffen Weissmantel, Andy Engel, Manuel Pfeiffer, Alexander Kratsch, Charles Boegli, Matthias Kahl