Patents by Inventor Manus K. Wong

Manus K. Wong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Corrosion resistant apparatus
    Patent number: 5891253
    Abstract: An apparatus used for processing substrates in a corrosive process gas is rendered substantially resistant to corrosion, by coating processing components exposed to the corrosive process gas with a coating comprising rhodium. The rhodium coating can be deposited by electroplating, and preferably has a thickness of at least about 10 microinches. A coating of nickel can be also applied between the rhodium coating and the processing component.
    Type: Grant
    Filed: October 12, 1995
    Date of Patent: April 6, 1999
    Assignee: Applied Materials, Inc.
    Inventors: Manus K. Wong, Sandy M. Chew
  • Method of manufacturing using corrosion-resistant apparatus comprising rhodium
    Patent number: 5593541
    Abstract: A metal structure, such as an apparatus used in plasma processing of substrates, is rendered resistant to corrosion by coating components exposed to the plasma with a coating of rhodium. The rhodium coating can be made by electroplating, and preferably has a thickness of at least about 10 microinches, and preferably from about 10 to about 100 microinches. A coating of nickel can be applied between the rhodium coating and the metal component.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: January 14, 1997
    Assignee: Applied Materials, Inc.
    Inventors: Manus K. Wong, Sandy M. Chew
  • Corrosion-resistant apparatus
    Patent number: 5522932
    Abstract: A metal structure, such as an apparatus used in plasma processing of substrates, is rendered resistant to corrosion by coating components exposed to the plasma with a coating of rhodium. The rhodium coating can be made by electroplating, and preferably has a thickness of at least about 10 microinches, and preferably from about 10 to about 100 microinches. A coating of nickel can be applied between the rhodium coating and the metal component.
    Type: Grant
    Filed: May 14, 1993
    Date of Patent: June 4, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Manus K. Wong, Sandy M. Chew
  • Lift fingers for substrate processing apparatus
    Patent number: 5332443
    Abstract: A substrate lifting apparatus for use in a substrate processing apparatus which includes a thermal reactor having a substrate processing chamber and a substrate support located in the chamber. The lifting apparatus consists of a generally circular shaped support with four seats formed therein; four substrate lifting elements, each having a substrate engaging end and a securing tab sized to be received in a seat; a fastener, associated with each lifting element, which secures the tab into the seat; and an adjuster, associated with each lifting element, located between the tab and the seat. When the tab is secured in the seat and the adjuster is operated, the lifting element is caused to move in a plane parallel to a plane formed through the center of the fastener and the adjuster.
    Type: Grant
    Filed: June 9, 1993
    Date of Patent: July 26, 1994
    Assignee: Applied Materials, Inc.
    Inventors: Sandy M.-S. Chew, Shane D. Clark, Ron L. Rose, Dale R. DuBois, Cissy Leung, Alan F. Morrison, Manus K. Wong