Patents by Inventor Mao-Chang Yeh

Mao-Chang Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for cleaning a metal etching chamber
    Publication number: 20020074014
    Abstract: The present invention relates to a method for cleaning a metal etching chamber. The method is accomplished by using waterless auto cleaning first, followed by an Argon clean. The waterless auto cleaning process comprises two steps. First, oxygen plasma is used to eliminate the byproducts produced from the side reaction with photo resistant in the etching reaction. Second, chlorine plasma is used to eliminate the byproducts produced from the side reaction with a metal thin film under a photo resistant and the residual oxygen of the previous step. The Argon clean can further eliminate the residual chlorine of the previous step and the products produced in the chemical reaction during the process of waterless auto clean.
    Type: Application
    Filed: July 26, 2001
    Publication date: June 20, 2002
    Inventors: Mao-Chang Yeh, Ta Chin Chen, Chen Lung Fan, Kai Chin Chang, Jing Kae Liu