Patents by Inventor Mao-Hsiung Lin

Mao-Hsiung Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9520353
    Abstract: A metal-insulation-metal (MIM) device including a first metal layer, a first insulation layer, a second metal layer, and a second insulation layer is provided. The first insulation layer is disposed on the first metal layer. The second metal layer is disposed on a part of the first insulation layer. The second insulation layer is disposed on a side wall of the second metal layer and on another part of the first insulation layer. A width of the first insulation layer under the second metal layer and the second insulation layer parallel to the first metal layer is greater than a with of the second metal layer parallel to the first metal layer.
    Type: Grant
    Filed: May 12, 2015
    Date of Patent: December 13, 2016
    Assignee: HIMAX TECHNOLOGIES LIMITED
    Inventors: Hung-Sui Lin, Mao-Hsiung Lin
  • Publication number: 20150243728
    Abstract: A metal-insulation-metal (MIM) device including a first metal layer, a first insulation layer, a second metal layer, and a second insulation layer is provided. The first insulation layer is disposed on the first metal layer. The second metal layer is disposed on a part of the first insulation layer. The second insulation layer is disposed on a side wall of the second metal layer and on another part of the first insulation layer. A width of the first insulation layer under the second metal layer and the second insulation layer parallel to the first metal layer is greater than a with of the second metal layer parallel to the first metal layer.
    Type: Application
    Filed: May 12, 2015
    Publication date: August 27, 2015
    Inventors: Hung-Sui Lin, Mao-Hsiung Lin
  • Patent number: 9059192
    Abstract: A metal-insulation-metal (MIM) device including a first metal layer, a first insulation layer, a second metal layer, and a second insulation layer is provided. The first insulation layer is disposed on the first metal layer. The second metal layer is disposed on a part of the first insulation layer. The second insulation layer is disposed on a side wall of the second metal layer and on another part of the first insulation layer. A width of the first insulation layer under the second metal layer and the second insulation layer parallel to the first metal layer is greater than a with of the second metal layer parallel to the first metal layer. A manufacture method of an MIM device is also provided.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: June 16, 2015
    Assignee: HIMAX TECHNOLOGIES LIMITED
    Inventors: Hung-Sui Lin, Mao-Hsiung Lin
  • Publication number: 20120248571
    Abstract: A metal-insulation-metal (MIM) device including a first metal layer, a first insulation layer, a second metal layer, and a second insulation layer is provided. The first insulation layer is disposed on the first metal layer. The second metal layer is disposed on a part of the first insulation layer. The second insulation layer is disposed on a side wall of the second metal layer and on another part of the first insulation layer. A width of the first insulation layer under the second metal layer and the second insulation layer parallel to the first metal layer is greater than a with of the second metal layer parallel to the first metal layer. A manufacture method of an MIM device is also provided.
    Type: Application
    Filed: August 2, 2011
    Publication date: October 4, 2012
    Applicant: HIMAX TECHNOLOGIES LIMITED
    Inventors: Hung-Sui Lin, Mao-Hsiung Lin