Patents by Inventor Mao Lim

Mao Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND APPARATUS FOR CLEANING A CVD CHAMBER
    Publication number: 20060231205
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Application
    Filed: June 23, 2006
    Publication date: October 19, 2006
    Inventors: Maosheng Zhao, Juan Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao Lim, Shankar Venkataraman, Ju-Hyung Lee
  • METHOD AND APPARATUS FOR CLEANING A CVD CHAMBER
    Publication number: 20060225767
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Application
    Filed: June 19, 2006
    Publication date: October 12, 2006
    Inventors: Maosheng Zhao, Juan Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao Lim, Shankar Venkataraman, Ju-Hyung Lee