Patents by Inventor Mao-Syong Lin

Mao-Syong Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for providing a side-chain dendrimer vesicle
    Patent number: 8895674
    Abstract: A method disclosed for making a side-chain dendrimer vesicle. The method includes the steps of: At first, there is provided a random copolymer with a narrow distribution of molecular weights by active polymerization and chemical modification. Then, chemical modification is executed to graft various generations of dendrimers to the random copolymer to provide a side-chain dendritic random copolymer with various generations. Two steps of emulsification are taken to induce macromolecular self-assembling of the side-chain dendritic random copolymer solution to form the macromolecular vesicle. The side-chain dendrimer includes C10˜C18 hydrophobic alkyl chains.
    Type: Grant
    Filed: January 23, 2014
    Date of Patent: November 25, 2014
    Assignee: Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense
    Inventors: Wen-Chiung Su, Wei-Ho Ting, Mao-Syong Lin, Chia-Cheng Chang, Hsin-Cheng Chiu, Sheng-hong Dai, Ru-Jong Jeng
  • Method for Providing a Side-Chain Dendrimer Vesicle
    Publication number: 20140135451
    Abstract: A method disclosed for making a side-chain dendrimer vesicle. The method includes the steps of: At first, there is provided a random copolymer with a narrow distribution of molecular weights by active polymerization and chemical modification. Then, chemical modification is executed to graft various generations of dendrimers to the random copolymer to provide a side-chain dendritic random copolymer with various generations. Two steps of emulsification are taken to induce macromolecular self-assembling of the side-chain dendritic random copolymer solution to form the macromolecular vesicle. The side-chain dendrimer includes C10˜C18 hydrophobic alkyl chains.
    Type: Application
    Filed: January 23, 2014
    Publication date: May 15, 2014
    Applicant: Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense
    Inventors: Wen-Chiung Su, Wei-Ho Ting, Mao-Syong Lin, Chia-Cheng Chang, Hsin-Cheng Chiu, Sheng-hong Dai, Ru-Jong Jeng
  • Method for Providing a Side-Chain Dendrimer Vesicle
    Publication number: 20120130022
    Abstract: A method for making a side-chain dendrimer vesicle includes the following steps. At first, there is provided a random copolymer with a narrow distribution of molecular weights by active polymerization and chemical modification. Then, chemical modification is executed to graft various generations of dendrimers to the random copolymer to provide a side-chain dendritic random copolymer with various generations. Two steps of emulsification are taken to induce macromolecular self-assembling of the side-chain dendritic random copolymer solution to form the macromolecular vesicle. The side-chain dendrimer includes C10˜C18 hydrophobic alkyl chains.
    Type: Application
    Filed: May 7, 2011
    Publication date: May 24, 2012
    Inventors: Wen-Chiung Su, Wei-Ho Ting, Mao-Syong Lin, Chia-Cheng Chang, Hsin-Cheng Chiu, Sheng-hong Dai, Ru-Jong Jeng