Abstract: A method includes forming a plurality of nanostructures over a substrate; etching the plurality of nanostructures to form recesses; forming source/drain regions in the recesses; removing first nanostructures of the plurality of nanostructures leaving second nanostructures of the plurality of nanostructures; depositing a gate dielectric over and around the second nanostructures; depositing a protective material over the gate dielectric; performing a fluorine treatment on the protective material; removing the protective material; depositing a first conductive material over the gate dielectric; and depositing a second conductive material over the first conductive material.

Abstract: A floor surface cleaning machine includes a suction mechanism disposed at a bottom side of a machine frame for suction of dust and dirt on the floor surface, a brush mechanism disposed at the bottom side of the machine frame rearwardly of the suction mechanism for brushing the floor surface with cleaning liquid, and a squeegee unit disposed at the bottom side of the machine frame rearwardly of the brush mechanism for gathering dirty liquid. Before brushing the floor surface, fibers may be removed from the floor surface together with the dust and dirt for preventing the fibers from being tangled up with bristles of the brush mechanism.

Abstract: A floor surface cleaning machine includes a suction mechanism disposed at a bottom side of a machine frame for suction of dust and dirt on the floor surface, a brush mechanism disposed at the bottom side of the machine frame rearwardly of the suction mechanism for brushing the floor surface with cleaning liquid, and a squeegee unit disposed at the bottom side of the machine frame rearwardly of the brush mechanism for gathering dirty liquid. Before brushing the floor surface, fibers may be removed from the floor surface together with the dust and dirt for preventing the fibers from being tangled up with bristles of the brush mechanism.