Patents by Inventor Maoqian ZHU

Maoqian ZHU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11188700
    Abstract: The present application relates to a resistance simulation method for a power device, comprising: establishing an equivalent resistance model of a power device, wherein the connection relationship of N fingers is equivalent to N resistors Rb connected in parallel, input ends of adjacent resistors Rb are connected by means of a resistor Ra, output ends of adjacent resistors Rb are connected by means of a resistor Rc, R a = 1 N ? R 0 , R c = 1 N ? R 1 , and Rb=RDEV*N+RS+RD, wherein R0 and R1 are respectively resistances of a source metal strip and a drain metal strip, Rs is a metal resistor of a first intermediate layer connecting one source region to the source metal strip, RD is a metal resistor of a second intermediate layer connecting one drain region to the drain metal strip, and RDEV is the channel resistance of the power device; and calculating the resistance of the equivalent resistance model as the resistance of the power device.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: November 30, 2021
    Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
    Inventors: Nan Zhang, Jing Zhou, Hao Wang, Zhan Gao, Maoqian Zhu, Cheng Zhou, Zhijin Li, Lin Wu, Shuming Guo, Yong Huang
  • Publication number: 20210240898
    Abstract: The present application relates to a resistance simulation method for a power device, comprising: establishing an equivalent resistance model of a power device, wherein the connection relationship of N fingers is equivalent to N resistors Rb connected in parallel, input ends of adjacent resistors Rb are connected by means of a resistor Ra, output ends of adjacent resistors Rb are connected by means of a resistor Rc, R a = 1 N ? R 0 , R c = 1 N ? R 1 , and Rb=RDEV*N+RS+RD, wherein R0 and R1 are respectively resistances of a source metal strip and a drain metal strip, Rs is a metal resistor of a first intermediate layer connecting one source region to the source metal strip, RD is a metal resistor of a second intermediate layer connecting one drain region to the drain metal strip, and RDEV is the channel resistance of the power device; and calculating the resistance of the equivalent resistance model as the resistance of the power device.
    Type: Application
    Filed: August 15, 2019
    Publication date: August 5, 2021
    Inventors: Nan ZHANG, Jing ZHOU, Hao WANG, Zhan GAO, Maoqian ZHU, Cheng ZHOU, Zhijin LI, Lin WU, Shuming GUO, Yong HUANG