Abstract: An imaging apparatus (20) includes an interface (50) and a processor (30). The interface is configured to receive a sequence of images of an object (38) acquired at respective acquisition times, the object is labeled with fluorescent emitters. The images depict intensity fluctuations of emitters on an acquisition grid, and the intensity fluctuations being uncorrelated among the emitters and during an overall time over which the images in the sequence are acquired. The a processor is configured to calculate a temporal correlation function of the intensity fluctuations over the sequence of images, and to estimate locations of the emitters on a super-resolution grid having a higher resolution than the acquisition grid, by applying to the temporal correlation function a recovery process in which the locations on the super-resolution grid are assumed to be sparse or compressible in a predefined domain. The recovery process includes a sparse-recovery process or a regularized process.

Abstract: An imaging apparatus (20) includes an interface (50) and a processor (30). The interface is configured to receive a sequence of images of an object (38) acquired at respective acquisition times, the object is labeled with fluorescent emitters. The images depict intensity fluctuations of emitters on an acquisition grid, and the intensity fluctuations being uncorrelated among the emitters and during an overall time over which the images in the sequence are acquired. The a processor is configured to calculate a temporal correlation function of the intensity fluctuations over the sequence of images, and to estimate locations of the emitters on a super-resolution grid having a higher resolution than the acquisition grid, by applying to the temporal correlation function a recovery process in which the locations on the super-resolution grid are assumed to be sparse or compressible in a predefined domain. The recovery process includes a sparse-recovery process or a regularized process.

Abstract: An electron beam shaping unit for use in electron beam column and a method for designing thereof is presented. The electron beam shaping unit is configured for affecting electron beams of high density or strong electron-electron repulsion. These 5 beams can always be modeled with multi electron wave function. The electron beam shaping unit comprises a mask unit configured for affecting propagation of electrons therethrough to thereby form a propagating electron beam having, at far field, radial shape as determined by multi-electron non-linear function being an eigen function determined by a multi-electron Hartree-Fock Hamiltonian.

Abstract: An electron beam shaping unit for use in electron beam column and a method for designing thereof is presented. The electron beam shaping unit is configured for affecting electron beams of high density or strong electron-electron repulsion. These 5 beams can always be modeled with multi electron wave function. The electron beam shaping unit comprises a mask unit configured for affecting propagation of electrons therethrough to thereby form a propagating electron beam having, at far field, radial shape as determined by multi-electron non-linear function being an eigen function determined by a multi-electron Hartree-Fock Hamiltonian.