Patents by Inventor Maosheng Zhao
Maosheng Zhao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230037732Abstract: A powder coating device includes a reaction device, a driving device, a gas supply device, and a gas delivery device. The gas delivery device includes a rotating shaft and a sleeve. The rotating shaft is connected to an inner cylinder and the driving device, and a first gas path communicated with a reaction chamber is defined along an axis of the rotating shaft, and a plurality of gas holes for communicating the first gas path with outside of the rotating shaft are defined in the rotating shaft. The sleeve is sleeved on the rotating shaft, and a second gas path for the rotating shaft to pass through is defined in the sleeve, the second gas path is communicated with the gas supply device, and the plurality of the gas holes is located inside the second gas path.Type: ApplicationFiled: October 8, 2022Publication date: February 9, 2023Inventors: YUNYU WANG, MAOSHENG ZHAO, TONG WANG, YANFENG LIU
-
Publication number: 20170121813Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.Type: ApplicationFiled: January 17, 2017Publication date: May 4, 2017Inventors: Maosheng ZHAO, Juan Carlos ROCHA-ALVAREZ, Inna SHMURUN, Soovo SEN, Mao D. LIM, Shankar VENKATARAMAN, Ju-Hyung LEE
-
Publication number: 20150093898Abstract: A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.Type: ApplicationFiled: December 8, 2014Publication date: April 2, 2015Inventors: Rick Endo, Jeremy Cheng, Indranil De, James Tsung, Kurt Weiner, Maosheng Zhao
-
Patent number: 8932995Abstract: A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.Type: GrantFiled: December 21, 2011Date of Patent: January 13, 2015Assignee: Intermolecular, Inc.Inventors: Rick Endo, Kurt Weiner, Indranil De, James Tsung, Maosheng Zhao, Jeremy Cheng
-
Publication number: 20140311408Abstract: The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using the same are described.Type: ApplicationFiled: July 1, 2014Publication date: October 23, 2014Inventors: Indranil De, Rick Endo, James Tsung, Kurt Weiner, Maosheng Zhao
-
Patent number: 8770143Abstract: The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using the same are described.Type: GrantFiled: May 12, 2011Date of Patent: July 8, 2014Assignee: Intermolecular, Inc.Inventors: Rick Endo, Kurt Weiner, Indranil De, James Tsung, Maosheng Zhao
-
Patent number: 8771483Abstract: A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.Type: GrantFiled: February 7, 2008Date of Patent: July 8, 2014Assignee: Intermolecular, Inc.Inventors: Rick Endo, Kurt Weiner, Indranil De, James Tsung, Maosheng Zhao, Jeremy Cheng
-
Patent number: 8758581Abstract: A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.Type: GrantFiled: September 5, 2008Date of Patent: June 24, 2014Assignee: Intermolecular, Inc.Inventors: Rick Endo, Kurt Weiner, Indranil De, James Tsung, Maosheng Zhao, Jeremy Cheng
-
Publication number: 20140166840Abstract: A substrate carrier is provided. The substrate carrier includes a base for supporting a substrate. A plurality of support tabs is affixed to a surface of the base. The plurality of support tabs have a cavity defined within an inner region of each support tab of the plurality of support tabs. A plurality of protrusions extends from the surface of the base, wherein one of the plurality of protrusions mates with one cavity to support one of the plurality of support tabs. A film is deposited over the surface of the base, surfaces of the plurality of support tabs and surfaces of the plurality of protrusions.Type: ApplicationFiled: December 14, 2012Publication date: June 19, 2014Applicant: INTERMOLECULAR, INC.Inventors: Wayne R. French, Kent Riley Child, Alonzo T. Collins, Jay B. Dedontney, Richard R. Endo, Aaron T. Francis, Zachary Fresco, Edward L. Haywood, Ashley David Lacey, Monica Sawkar Mathur, James Tsung, Danny Wang, Kenneth A. Williams, Maosheng Zhao
-
Publication number: 20140158048Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.Type: ApplicationFiled: February 12, 2014Publication date: June 12, 2014Applicant: APPLIED MATERIALS, INC.Inventors: Maosheng ZHAO, Juan Carlos ROCHA- ALVAREZ, Inna SHMURUN, Soovo SEN, Mao D. LIM, Shankar VENKATARAMAN, Ju-Hyung LEE
-
Patent number: 8449678Abstract: A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.Type: GrantFiled: February 8, 2008Date of Patent: May 28, 2013Assignee: Intermolecular, Inc.Inventors: Rick Endo, Kurt Weiner, Indranil De, James Tsung, Maosheng Zhao, Jeremy Cheng
-
Patent number: 8387563Abstract: A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.Type: GrantFiled: February 14, 2012Date of Patent: March 5, 2013Assignee: Intermolecular, Inc.Inventors: Rick Endo, Jeremy Cheng, Indranil De, James Tsung, Kurt Weiner, Maosheng Zhao
-
Publication number: 20120149180Abstract: A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.Type: ApplicationFiled: December 21, 2011Publication date: June 14, 2012Applicant: Intermolecular, Inc.Inventors: Rick Endo, Kurt Weiner, Indranil De, James Tsung, Maosheng Zhao, Jeremy Cheng
-
Publication number: 20120142197Abstract: A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.Type: ApplicationFiled: February 14, 2012Publication date: June 7, 2012Applicant: Intermolecular, Inc.Inventors: Rick Endo, Kurt Weiner, Indranil De, James Tsung, Maosheng Zhao, Jeremy Cheng
-
Patent number: 8039052Abstract: The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using the same are described.Type: GrantFiled: December 27, 2007Date of Patent: October 18, 2011Assignee: Intermolecular, Inc.Inventors: Rick Endo, Kurt Weiner, Indranil De, James Tsung, Maosheng Zhao
-
Publication number: 20110209663Abstract: The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using the same are described.Type: ApplicationFiled: May 12, 2011Publication date: September 1, 2011Applicant: INTERMOLECULAR, INC.Inventors: Rick Endo, Kurt Weiner, Indranil De, James Tsung, Maosheng Zhao
-
Publication number: 20100095891Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.Type: ApplicationFiled: January 7, 2010Publication date: April 22, 2010Inventors: Maosheng Zhao, Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman, Ju-Hyung Lee
-
Patent number: 7654224Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.Type: GrantFiled: February 17, 2009Date of Patent: February 2, 2010Assignee: Applied Materials, Inc.Inventors: Maosheng Zhao, Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman, Ju-Hyung Lee
-
Publication number: 20090145360Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.Type: ApplicationFiled: February 17, 2009Publication date: June 11, 2009Inventors: Maosheng Zhao, Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman, Ju-Hyung Lee
-
Publication number: 20090069924Abstract: A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.Type: ApplicationFiled: September 5, 2008Publication date: March 12, 2009Inventors: Rick Endo, Kurt Weiner, Indranil De, James Tsung, Maosheng Zhao, Jeremy Cheng