Abstract: An optoelectronic apparatus includes an array of emitters configured to emit beams of optical radiation. An optical substrate is mounted over the array. An optical metasurface is disposed on the optical substrate and configured to collimate and split each of the emitted beams into a respective group of collimated sub-beams, and to direct the collimated sub-beams toward a target to form a pattern of spots on the target.

Abstract: An image sensing device includes a detector assembly, which includes a matrix of optical sensing elements having a predefined pitch. Each optical sensing element includes an active area having a width that is less than 90% of the pitch. An array of optical apertures are respectively aligned with the optical sensing elements such that each optical aperture is positioned at a distance from a respective optical sensing element that is no less than twice the width of the active area. Objective optics are configured to focus light from a scene onto the detector assembly.

Abstract: An optoelectronic apparatus includes a substrate and first and second arrays of emitters disposed on the substrate and configured to emit respective first and second beams of optical radiation. The apparatus further includes an optical metasurface disposed on the substrate and configured to collimate and diffuse the first beams without diffusing the second beams, and an optical projection element, configured to intercept both the first and the second beams that have passed through the optical metasurface and to direct both the first and the second beams toward a target while focusing the second beams to form a pattern of spots on the target.

Abstract: An optical device includes a substrate that includes a parallelepiped of a transparent dielectric material. The substrate is configured for propagation of a beam of optical radiation through the substrate along a beam path that includes multiple internal reflections within the substrate. The device further includes first and second optical metasurfaces disposed on one or more faces of the substrate at different, first and second points of incidence of the beam path with the one or more faces.