Abstract: A process for making a partially coated electrode active material may involve: (a) providing an electrode active material of the formula Li1+xTM1?xO2, wherein TM is a combination of Ni, Co and, optionally, Mn, and, optionally, at least one metal selected from Al, Ti, Mo, W, and Zr, and x is in the range of from zero to 0.2, wherein at least 60 mole-% of the transition metal of TM is Ni, and wherein the electrode active material has a residual moisture content in the range of from 50 to 1,000 ppm; (b) treating the electrode active material with a metal alkoxide or metal halide or metal amide or alkyl metal compound; (c) treating the material obtained in (b) with moisture; and (d) repeating the sequence of (b) and (c) twice to 4 times, wherein, in the last sequence of (b) and (c), moisture is at least partially substituted by ozone.

Abstract: The present invention is in the field of processes for producing flexible organic-inorganic laminates as well as barrier films comprising flexible organic-inorganic laminates by atomic layer deposition. In particular the present invention relates to a process for producing a laminate comprising more than once the sequence comprising: (a) depositing an inorganic layer by performing 4 to 150 cycles of an atomic layer deposition process, and (b) depositing an organic layer comprising sulfur by a molecular layer deposition process.

Abstract: The present invention is in the field of processes for producing organic-inorganic laminates by atomic layer deposition. In particular the present invention relates to a process for producing a laminate comprising moving a substrate relative to at least two separate orifices arranged along the relative moving trajectory wherein through at least one orifice an organic compound in the gaseous state is passed towards the surface of the substrate and through at least one other orifice a (semi)metal-containing compound in the gaseous state is passed towards the surface of the substrate and wherein the orifices are mounted on a rotating drum.

Abstract: The present invention is related to a process for coating anoxide material, said process comprising the following steps: (a) providing a particulate material selected from lithiated nickel-cobalt aluminum oxides, lithiated cobalt-manganese oxides and lithiated layered nickel-cobalt-manganese oxides, (b) treating said cathode active material with a metal alkoxide or metal amide or alkyl metal compound, (c) treating the material obtained in step (b) with moisture, and, optionally, repeating the sequence of steps (b) and (c), wherein steps (b) and (c) are carried out in a mixer that mechanically introduces mixing energy into the particulate material, or by way of a moving bed or fixed bed, and wherein steps (b) and (c) are carried out at a pressure that is in the range of from 5 mbar to 1 bar above normal pressure.

Abstract: Processes for producing flexible organic-inorganic laminates are described herein. In particular, a process is provided for producing a laminate comprising at least twice a sequence comprising (a) depositing an inorganic layer by performing 3 to 150 cycles of an atomic layer deposition process, and (b) depositing an organic layer comprising nitrogen by performing 1 to 3 cycles of a molecular layer deposition process.

Abstract: Process for making a coated oxide material wherein said process comprises the following steps: (a) providing a particulate material selected from lithiated nickel-cobalt aluminum oxides, lithium cobalt oxide, lithiated cobalt-manganese oxides and lithiated layered nickel-cobalt-manganese oxides, (b) treating said particulate material with an aqueous medium, (c) removing said aqueous medium, (d) drying said treated particulate material, (e) treating said particulate material from step (d) with a metal amide or alkyl metal compound, (f) treating the material obtained in step (e) with moisture or an oxidizing agent, and, optionally, repeating the sequence of steps (e) and (f).

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates. In particular, the present invention relates to a process comprising depositing the compound of general formula (I) onto a solid substrate, wherein R1, R2, R3, R4, and R5 is hydrogen, an alkyl group, an alkenyl group, an aryl group or a silyl group, wherein not more than three of R1, R2, R3, R4, and R5 are hydrogen, X is a group which binds to silicon, m is 1 or 2, n is 0, 1, or 2, and Si is in the oxidation state +2.

Abstract: The present disclosure relates to a process for coating an oxide material, process comprising: (a) providing a particulate material chosen from lithiated nickel-cobalt aluminum oxides, lithiated cobalt-manganese oxides, and lithiated layered nickel-cobalt-manganese oxides, (b) treating the cathode active material with a metal alkoxide, a metal halide, a metal chloride, a metal amide, or an alkyl metal compound, (c) treating the material obtained in step (b) with a gas containing HF, and, optionally, repeating the sequence of steps (b) and (c), wherein step (b) is carried out in a mechanical mixer, or step (b) is carried out using a moving bed or fixed bed wherein steps (b) and (c) are carried out at a pressure that is in the range of from 5 mbar to 1 bar above ambient pressure.

Abstract: The present disclosure relates to a process for coating an oxide material comprising: (a) providing a particulate material chosen from lithiated nickel-cobalt aluminum oxides, lithiated cobalt-manganese oxides, and lithiated layered nickel-cobalt-manganese oxides, (b) treating the cathode active material with a metal alkoxide, metal amide, alkyl metal compound, metal halide, or metal hydride at a pressure ranging from 5 mbar to 1 bar above ambient pressure, (c) deactivating the material obtained in step (b) with a HF containing gas at ambient pressure, ?wherein step (b) is carried out in a mechanical mixer chosen from compulsory mixers and free-fall mixers, or step (b) is carried out using a moving bed or a fixed bed.

Abstract: Processes for producing flexible organic-inorganic laminates by atomic layer deposition are described, as well as barrier films comprising flexible organic-inorganic laminates. In particular, a process for producing a laminate including (a) depositing an inorganic layer by an atomic layer deposition process, and (b) depositing an organic layer comprising selenium by a molecular layer deposition process is provided.

Abstract: An electrochemical cell has a cathode active material selected from mixed lithium transition metal oxides containing Mn and at least one second transition metal; lithium intercalating mixed oxides containing Ni, Al and at least one second transition metal; and lithium metal phosphates, wherein the outer surface of the particulate cathode active material is at least partially coated with an oxide selected from transition metal oxides, lanthanide oxides, and oxides of metals and half metals of groups 2, 13, and 14 of the periodic system; and an electrolyte composition containing at least one silyl ester phosphonate of formula (I) and at least one silyl ester phosphonate of formula (II)

Abstract: A process for making a partially coated electrode active material may involve: (a) providing an electrode active material of the formula Li1+xTM1?xO2, wherein TM is a combination of Ni, Co and, optionally, Mn, and, optionally, at least one metal selected from Al, Ti, Mo, W, and Zr, and x is in the range of from zero to 0.2, wherein at least 60 mole-% of the transition metal of TM is Ni, and wherein the electrode active material has a residual moisture content in the range of from 50 to 1,000 ppm; (b) treating the electrode active material with a metal alkoxide or metal halide or metal amide or alkyl metal compound; (c) treating the material obtained in (b) with moisture; and (d) repeating the sequence of (b) and (c) twice to 4 times, wherein, in the last sequence of (b) and (c), moisture is at least partially substituted by ozone.

Abstract: Process for making a partially coated electrode active material wherein said process comprises the following steps: (a) Providing an electrode active material according to general formula Li1+x, TM1+XO2, wherein TM is a combination of Ni, Co and, optionally, Mn, and, optionally, at least one metal selected from Al, Ti and Zr, and x is in the range of from zero to 0.2, wherein at least 60 mole-% of the transition metal of TM is Ni, and wherein said electrode active material has a residual moisture content in the range of from 50 to 1,000 ppm, (b) treating said electrode active material with a metal alkoxide or metal halide or metal amide or alkyl metal compound, (c) treating the material obtained in step (b) with moisture, (d) repeating the sequence of steps (b) and (c) twice to ten times, (e) performing a post-treatment by heating the material obtained after the last step (d) at a temperature from 200 to 400° C.

Abstract: Described herein is a process for switching an electrochromic cell including at least a first electrode layer and a second electrode layer. The cell also includes an ion-conducting layer that separates the first and second electrode layers and a temperature sensor for measuring a temperature in or on or in the vicinity of the electrochromic cell. Moreover, a first contact member is electronically connected with the first electrode layer, and a second contact member is electronically connected with the second electrode layer. Furthermore, at least the first electrode layer includes an organic polymer matrix and, dispersed therein, an electrochromic material, electronically conductive nanoobjects, and an electrolyte dissolved in a solvent. Further, the process including measuring the current flowing through the cell if a voltage is applied to the electrode layers, applying a voltage to the contact members, and varying the applied voltage as a function of the current.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.

Abstract: The present invention is related to a process for coating anoxide material, said process comprising the following steps: (a) providing a particulate material selected from lithiated nickel-cobalt aluminum oxides, lithiated cobalt-manganese oxides and lithiated layered nickel-cobalt-manganese oxides, (b) treating said cathode active material with a metal alkoxide or metal amide or alkyl metal compound, (c) treating the material obtained in step (b) with moisture, and, optionally, repeating the sequence of steps (b) and (c), wherein steps (b) and (c) are carried out in a mixer that mechanically introduces mixing energy into the particulate material, or by way of a moving bed or fixed bed, and wherein steps (b) and (c) are carried out at a pressure that is in the range of from 5 mbar to 1 bar above normal pressure.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates. In particular, the present invention relates to a process comprising depositing the compound of general formula (I) onto a solid substrate, wherein R1, R2, R3, R4, and R5 is hydrogen, an alkyl group, an alkenyl group, an aryl group or a silyl group, wherein not more than three of R1, R2, R3, R4, and R5 are hydrogen, X is a group which binds to silicon, m is 1 or 2, n is 0, 1, or 2, and Si is in the oxidation state +2.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.

Abstract: Described are a process for preparing a layer structure for an electrochromic device and a process for preparing an electrochromic device.

Abstract: Described are electrochromic devices and compositions as well as manufacturing methods for making such electrochromic devices by printing or wet processing of the compositions. The compositions are in the form of a suspension and comprise two or more monomers, nanoparticles of an electrochromic metal oxide, one or more metal salts of the form (M)z(R)y, where M is a metal cation and R is the corresponding salt anion, a carrier liquid and a solvent. The compositions are polymerised to form a composite layer comprising a polymer matrix that hosts the electrochromic nanoparticles and the electrolyte. At least a part of the metal salts (e.g. zinc acetate) is physically adsorbed onto the surface of the nanoparticles and acts as a dispersant.