Abstract: An improved chemical vapor deposition system including a lid having a channel configured for delivering reactive cleaning gas to the interior of the vapor deposition system. The lid including a cleaning gas distribution channel fluidly connected to a plurality of cleaning gas injection ports. The lid geometry is configured to generate desirable concentration gradients of reactive cleaning gas to the interior of a vapor deposition chamber. In some embodiments, the concentration gradient is selected to compensate for the temperature dependence of cleaning reactions. Methods of using the disclose system are disclosed.

Abstract: In flat panel displays wherein thermionic electrons are focused to a narrow beam by means of an anode or gating grids, such grids structures are subjected to temperature deformation and vibratory stress. In high resolution displays individual grid structures are placed in close proximity to similar structures, often less than 0.0265 inch apart. Failure to accommodate physical deformation due to wide variations in temperature and or physical stress caused by shock and vibration will cause the grid wires to short circuit and the display to fail. The invention operates to maintain the relative separation of the individual grid structures within a range of temperatures, shock, and vibration.