Patents by Inventor Marc Altman

Marc Altman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12162294
    Abstract: Printing apparatus includes a donor supply assembly, which positions a transparent donor substrate having opposing first and second surfaces and a donor film formed on the second surface so that the donor film is in proximity to a target area on an acceptor substrate. An optical assembly directs one or more beams of laser radiation to pass through the first surface of the donor substrate and impinge on the donor film so as to induce ejection of material from the donor film onto the acceptor substrate. Means are provided to mitigate or compensate for the variation in reflection of the laser radiation across an area of the donor substrate, so as to equalize a flux of the laser radiation that is absorbed in the donor film across the area of the donor substrate.
    Type: Grant
    Filed: May 4, 2020
    Date of Patent: December 10, 2024
    Inventors: Marc Altman, Zvi Kotler, Itay Peled, Oleg Ermak, Sharona Cohen
  • Patent number: 12042984
    Abstract: A method for manufacturing includes applying patterned electromagnetic energy to each of a sequence of layers of a dry film comprising a photosensitive material so as to create in the photosensitive material in each of the layers a respective two-dimensional (2D) pattern corresponding to a slice of a predefined three-dimensional (3D) structure. The layers in the sequence in which the respective 2D pattern has been created are laminated together to produce a multi-layer stack. The multi-layer stack is developed so as to remove the photosensitive material in which the 2D pattern has not been created, thereby forming the 3D structure.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: July 23, 2024
    Assignee: ORBOTECH LTD.
    Inventors: Zvi Kotler, Gil Bernstein Toker, Marc Altman
  • Publication number: 20220024223
    Abstract: Printing apparatus includes a donor supply assembly, which positions a transparent donor substrate having opposing first and second surfaces and a donor film formed on the second surface so that the donor film is in proximity to a target area on an acceptor substrate. An optical assembly directs one or more beams of laser radiation to pass through the first surface of the donor substrate and impinge on the donor film so as to induce ejection of material from the donor film onto the acceptor substrate. Means are provided to mitigate or compensate for the variation in reflection of the laser radiation across an area of the donor substrate, so as to equalize a flux of the laser radiation that is absorbed in the donor film across the area of the donor substrate.
    Type: Application
    Filed: May 4, 2020
    Publication date: January 27, 2022
    Inventors: Marc Altman, Zvi Kotler, Itay Peled, Oleg Ermak, Sharona Cohen
  • Publication number: 20190263054
    Abstract: A method for manufacturing includes applying patterned electromagnetic energy to each of a sequence of layers of a dry film comprising a photosensitive material so as to create in the photosensitive material in each of the layers a respective two-dimensional (2D) pattern corresponding to a slice of a predefined three-dimensional (3D) structure. The layers in the sequence in which the respective 2D pattern has been created are laminated together to produce a multi-layer stack. The multi-layer stack is developed so as to remove the photosensitive material in which the 2D pattern has not been created, thereby forming the 3D structure.
    Type: Application
    Filed: October 31, 2017
    Publication date: August 29, 2019
    Inventors: Zvi Kotler, Gil Bernstein Toker, Marc Altman
  • Patent number: 10015887
    Abstract: A method for manufacturing includes coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate. A pattern (42) is fixed in the matrix by directing an energy beam to impinge on the coated substrate so as to fix the pattern in the matrix without fully sintering the pattern. The matrix remaining on the substrate outside the fixed pattern is removed, and after removing the matrix, the material in the pattern is sintered.
    Type: Grant
    Filed: February 18, 2014
    Date of Patent: July 3, 2018
    Assignee: ORBOTECH LTD.
    Inventors: Michael Zenou, Marc Altman, Claudio Rottman, Zvi Kotler
  • Publication number: 20150382476
    Abstract: A method for manufacturing includes coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate. A pattern (42) is fixed in the matrix by directing an energy beam to impinge on the coated substrate so as to fix the pattern in the matrix without fully sintering the pattern. The matrix remaining on the substrate outside the fixed pattern is removed, and after removing the matrix, the material in the pattern is sintered.
    Type: Application
    Filed: February 18, 2014
    Publication date: December 31, 2015
    Inventors: Michael Zenou, Marc Altman, Claudio Rottman, Zvi Kotler