Patents by Inventor Marc Bergendahl

Marc Bergendahl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11673766
    Abstract: Systems, computer-implemented methods, and computer program products that can facilitate elevator analytics and/or elevator optimization components are provided. According to an embodiment, a system can comprise a memory that stores computer executable components and a processor that executes the computer executable components stored in the memory. The computer executable components can comprise a prediction component that can predict a current destination of an elevator passenger based on historical elevator usage data of the elevator passenger. The computer executable components can further comprise an assignment component that can assign the elevator passenger to an elevator based on the current destination.
    Type: Grant
    Filed: October 29, 2018
    Date of Patent: June 13, 2023
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Gauri Karve, Tara Astigarraga, Eric Miller, Kangguo Cheng, Fee Li Lie, Sean Teehan, Marc Bergendahl
  • Patent number: 11263059
    Abstract: An example operation may include one or more of connecting, by a load leveler, to a blockchain network comprising a plurality of nodes and configured to store a common work item, computing, by the load leveler, loads across the plurality of the nodes that need to execute the common work item upon completion of current tasks, determining, by the load leveler, a network load impact based on execution of a common blockchain consensus checking process on the network nodes, executing, by the load leveler, a work assessment process based on the loads computed across the plurality of the nodes and on the determined network load impact of the blockchain network, and assigning, by the load leveler, new tasks to the nodes based on results of the execution of the work assessment process.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: March 1, 2022
    Assignee: International Business Machines Corporation
    Inventors: Jonathan Fry, Christopher J. Penny, Marc Bergendahl, Christopher J. Waskiewicz, Jean Wynne, James Demarest
  • Patent number: 11257716
    Abstract: According to embodiments of the present invention, a method of forming a self-aligned contact includes depositing an etch-stop liner on a surface of a gate cap and a contact region. A dielectric oxide layer is deposited onto the etch-stop layer. The dielectric oxide layer and the etch-stop liner are removed in a region above the contact region to form a removed region. A contact is deposited in the etched region.
    Type: Grant
    Filed: November 20, 2019
    Date of Patent: February 22, 2022
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Michael P. Belyansky, Marc Bergendahl, Victor W. C. Chan, Jeffrey C. Shearer
  • Patent number: 11222820
    Abstract: According to embodiments of the present invention, a method of forming a self-aligned contact includes depositing an etch-stop liner on a surface of a gate cap and a contact region. A dielectric oxide layer is deposited onto the etch-stop layer. The dielectric oxide layer and the etch-stop liner are removed in a region above the contact region to form a removed region. A contact is deposited in the etched region.
    Type: Grant
    Filed: June 27, 2018
    Date of Patent: January 11, 2022
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Michael P. Belyansky, Marc Bergendahl, Victor W. C. Chan, Jeffrey C. Shearer
  • Patent number: 11005646
    Abstract: A blockchain may be used as a stochastic timer. The posting of a blockchain solution for verification may be a trigger that determines an event schedule. Because the only entity that knows when the solution will be posted is the solving entity, the solving entity may be rewarded with the ability to potentially exploit this knowledge. However, because the solving of a blockchain is a competitive process, there is a risk that if the solving entity retains the solution for greater exploitation, then another entity will post the solution and therefore gain the benefit. A blockchain stochastic timer can thus provide the necessary incentive for entities to invest computational resources into blockchain solutions.
    Type: Grant
    Filed: May 23, 2018
    Date of Patent: May 11, 2021
    Assignee: International Business Machines Corporation
    Inventors: Jonathan Fry, Christopher J. Penny, James Demarest, Marc Bergendahl, Jean Wynne, Christopher J. Waskiewicz
  • Patent number: 10923401
    Abstract: Embodiments of the present invention are directed to techniques for providing a gate cut critical dimension (CD) shrink and active gate defect healing using selective deposition. The selective silicon on silicon deposition described herein effectively shrinks the gate cut CD to below lithographic limits and repairs any neighboring active gate damage resulting from a processing window misalignment by refilling the inadvertently removed sacrificial material. In a non-limiting embodiment of the invention, a sacrificial gate is formed over a shallow trench isolation region. A portion of the sacrificial gate is removed to expose a surface of the shallow trench isolation region. A semiconductor material is selectively deposited on exposed sidewalls of the sacrificial gate. A gate cut dielectric is formed on a portion of the shallow trench isolation between sidewalls of the semiconductor material.
    Type: Grant
    Filed: October 26, 2018
    Date of Patent: February 16, 2021
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Andrew Greene, Marc Bergendahl, Ekmini A. De Silva, Alex Joseph Varghese, Yann Mignot, Matthew T. Shoudy, Gangadhara Raja Muthinti, Dallas Lea
  • Patent number: 10692776
    Abstract: A semiconductor device includes etching fins into a bulk substrate in an active region, the bulk substrate including an intermediate layer formed over a base layer and a first semiconductor layer formed over the intermediate layer such that the fins extend through the first semiconductor layer into the intermediate layer to form tapered bottom portions of the fins within the intermediate layer and vertical fin sidewalls of a semiconductor portions of the fins within the first semiconductor layer. A second semiconductor layer is formed around the tapered bottom portions below the semiconductor portions of the fins such that the second semiconductor layer covers the tapered bottom portions to form a top surface proximal to the semiconductor portions of the fins that is substantially parallel to a bottom surface of the top surface of the base layer. A gate structure is formed around the fins.
    Type: Grant
    Filed: November 6, 2018
    Date of Patent: June 23, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Eric R. Miller, Marc Bergendahl, Kangguo Cheng, Yann Mignot
  • Publication number: 20200144131
    Abstract: A semiconductor device includes etching fins into a bulk substrate in an active region, the bulk substrate including an intermediate layer formed over a base layer and a first semiconductor layer formed over the intermediate layer such that the fins extend through the first semiconductor layer into the intermediate layer to form tapered bottom portions of the fins within the intermediate layer and vertical fin sidewalls of a semiconductor portions of the fins within the first semiconductor layer. A second semiconductor layer is formed around the tapered bottom portions below the semiconductor portions of the fins such that the second semiconductor layer covers the tapered bottom portions to form a top surface proximal to the semiconductor portions of the fins that is substantially parallel to a bottom surface of the top surface of the base layer. A gate structure is formed around the fins.
    Type: Application
    Filed: November 6, 2018
    Publication date: May 7, 2020
    Inventors: Eric R. Miller, Marc Bergendahl, Kangguo Cheng, Yann Mignot
  • Publication number: 20200130983
    Abstract: Systems, computer-implemented methods, and computer program products that can facilitate elevator analytics and/or elevator optimization components are provided. According to an embodiment, a system can comprise a memory that stores computer executable components and a processor that executes the computer executable components stored in the memory. The computer executable components can comprise a prediction component that can predict a current destination of an elevator passenger based on historical elevator usage data of the elevator passenger. The computer executable components can further comprise an assignment component that can assign the elevator passenger to an elevator based on the current destination.
    Type: Application
    Filed: October 29, 2018
    Publication date: April 30, 2020
    Inventors: Gauri Karve, Tara Astigarraga, Eric Miller, Kangguo Cheng, Fee Li Lie, Sean Teehan, Marc Bergendahl
  • Publication number: 20200135575
    Abstract: Embodiments of the present invention are directed to techniques for providing a gate cut critical dimension (CD) shrink and active gate defect healing using selective deposition. The selective silicon on silicon deposition described herein effectively shrinks the gate cut CD to below lithographic limits and repairs any neighboring active gate damage resulting from a processing window misalignment by refilling the inadvertently removed sacrificial material. In a non-limiting embodiment of the invention, a sacrificial gate is formed over a shallow trench isolation region. A portion of the sacrificial gate is removed to expose a surface of the shallow trench isolation region. A semiconductor material is selectively deposited on exposed sidewalls of the sacrificial gate. A gate cut dielectric is formed on a portion of the shallow trench isolation between sidewalls of the semiconductor material.
    Type: Application
    Filed: October 26, 2018
    Publication date: April 30, 2020
    Inventors: Andrew Greene, Marc Bergendahl, Ekmini A. De Silva, Alex Joseph Varghese, Yann MIGNOT, Matthew T. Shoudy, GANGADHARA RAJA MUTHINTI, DALLAS LEA
  • Publication number: 20200090998
    Abstract: According to embodiments of the present invention, a method of forming a self-aligned contact includes depositing an etch-stop liner on a surface of a gate cap and a contact region. A dielectric oxide layer is deposited onto the etch-stop layer. The dielectric oxide layer and the etch-stop liner are removed in a region above the contact region to form a removed region. A contact is deposited in the etched region.
    Type: Application
    Filed: November 20, 2019
    Publication date: March 19, 2020
    Inventors: Michael P. Belyansky, Marc Bergendahl, Victor W. C. Chan, JEFFREY C. SHEARER
  • Publication number: 20200081746
    Abstract: An example operation may include one or more of connecting, by a load leveler, to a blockchain network comprising a plurality of nodes and configured to store a common work item, computing, by the load leveler, loads across the plurality of the nodes that need to execute the common work item upon completion of current tasks, determining, by the load leveler, a network load impact based on execution of a common blockchain consensus checking process on the network nodes, executing, by the load leveler, a work assessment process based on the loads computed across the plurality of the nodes and on the determined network load impact of the blockchain network, and assigning, by the load leveler, new tasks to the nodes based on results of the execution of the work assessment process.
    Type: Application
    Filed: September 7, 2018
    Publication date: March 12, 2020
    Inventors: Jonathan Fry, Christopher J. Penny, Marc Bergendahl, Christopher J. Waskiewicz, Jean Wynne, James Demarest
  • Publication number: 20200006137
    Abstract: According to embodiments of the present invention, a method of forming a self-aligned contact includes depositing an etch-stop liner on a surface of a gate cap and a contact region. A dielectric oxide layer is deposited onto the etch-stop layer. The dielectric oxide layer and the etch-stop liner are removed in a region above the contact region to form a removed region. A contact is deposited in the etched region.
    Type: Application
    Filed: June 27, 2018
    Publication date: January 2, 2020
    Inventors: Michael P. Belyansky, Marc Bergendahl, Victor W. C. Chan, JEFFREY C. SHEARER
  • Publication number: 20190363873
    Abstract: A blockchain may be used as a stochastic timer. The posting of a blockchain solution for verification may be a trigger that determines an event schedule. Because the only entity that knows when the solution will be posted is the solving entity, the solving entity may be rewarded with the ability to potentially exploit this knowledge. However, because the solving of a blockchain is a competitive process, there is a risk that if the solving entity retains the solution for greater exploitation, then another entity will post the solution and therefore gain the benefit. A blockchain stochastic timer can thus provide the necessary incentive for entities to invest computational resources into blockchain solutions.
    Type: Application
    Filed: May 23, 2018
    Publication date: November 28, 2019
    Inventors: Jonathan Fry, Christopher J. Penny, James Demarest, Marc Bergendahl, Jean Wynne, Christopher J. Waskiewicz
  • Patent number: 7164470
    Abstract: An optical device inspection system and method employing a narrow aperture on a magnifying objective lens in order to reduce the circle of confusion and increase the depth of field. The smaller aperture resulting in an increase in depth of field allows for simultaneous focus for all portions of objects being inspected. An arc lamp with an elliptical reflector in combination with a condenser lens focuses a more intense beam of light through the objective lens, thereby providing sufficient brightness without sacrificing any depth of field.
    Type: Grant
    Filed: October 14, 2003
    Date of Patent: January 16, 2007
    Assignee: Bausch & Lomb Incorporated
    Inventors: Marc Bergendahl, David Lewison, Raymond H. Puffer, Jr.
  • Patent number: 7079239
    Abstract: A method and apparatus for an inspection cell that allows contact lenses to be presented in a known orientation to an operator or vision system for inspection. The cell can be tipped to allow the inspected lens to be placed into a known pick-cup location upon passing inspection, or if the lens does not pass inspection, it can be discarded. The placement or discarding of the lens can be readily automated by selecting the rate at which the cell is tipped.
    Type: Grant
    Filed: October 7, 2003
    Date of Patent: July 18, 2006
    Assignee: Bausch & Lomb Incorporated
    Inventors: Marc Bergendahl, David Lewison, Raymond H. Puffer, Jr.
  • Publication number: 20050078302
    Abstract: An optical device inspection system and method employing a narrow aperture on a magnifying objective lens in order to reduce the circle of confusion and increase the depth of field. The smaller aperture resulting in an increase in depth of field allows for simultaneous focus for all portions of objects being inspected. An arc lamp with an elliptical reflector in combination with a condenser lens focuses a more intense beam of light through the objective lens, thereby providing sufficient brightness without sacrificing any depth of field.
    Type: Application
    Filed: October 14, 2003
    Publication date: April 14, 2005
    Inventors: Marc Bergendahl, David Lewison, Raymond Puffer
  • Publication number: 20050073677
    Abstract: A method and apparatus for an inspection cell that allows contact lenses to be presented in a known orientation to an operator or vision system for inspection. The cell can be tipped to allow the inspected lens to be placed into a known pickup pick-cup location upon passing inspection, or if the lens does not pass inspection, it can be discarded. The placement or discarding of the lens can be readily automated by selecting the rate at which the cell is tipped.
    Type: Application
    Filed: October 7, 2003
    Publication date: April 7, 2005
    Inventors: Marc Bergendahl, David Lewison, Raymond Puffer
  • Patent number: 6729835
    Abstract: An assembly for orienting and fixturing an array of contact lenses in a lens-fixturing tray to enable automated picking of the lenses includes an array of tubes to which a first support tray having an array of lens receptacles each having a respective contact lens therein is removably mounted. A lens-fixturing tray having an array of lens receptacles is removably mounted to the other end of the tubes and the assembly is rotated and submerged in a fluid bath whereby the lenses release from the first support tray and float downwardly through a respective tube coming to rest in a centered, concave side-up position in a respective receptacle of the lens-fixturing tray.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: May 4, 2004
    Assignee: Bausch & Lomb Incorporated
    Inventors: William J. Appleton, Marc Bergendahl, Ted Foos, David Lewison, Raymond H. Puffer, Jr., Sunil Singh
  • Publication number: 20030185662
    Abstract: An assembly for orienting and fixturing an array of contact lenses in a lens-fixturing tray to enable automated picking of the lenses includes an array of tubes to which a first support tray having an array of lens receptacles each having a respective contact lens therein is removably mounted. A lens-fixturing tray having an array of lens receptacles is removably mounted to the other end of the tubes and the assembly is rotated and submerged in a fluid bath whereby the lenses release from the first support tray and float downwardly through a respective tube coming to rest in a centered, concave side-up position in a respective receptacle of the lens-fixturing tray.
    Type: Application
    Filed: March 28, 2002
    Publication date: October 2, 2003
    Inventors: William J. Appleton, Marc Bergendahl, Ted Foos, David Lewison, Raymond H. Puffer, Sunil Singh