Patents by Inventor Marc Boerner

Marc Boerner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for the removal of sidewall residues
    Patent number: 7531492
    Abstract: A composition for the production of semiconductors, comprising H2SiF6 and/or HBF4 in a total amount of 10-500 mg/kg, 1-17 % by weight of H2S04, 1-15% by weight of H202, optionally in combination with additives, in aqueous solution and a process of removing residual polymers using the composition.
    Type: Grant
    Filed: June 5, 2008
    Date of Patent: May 12, 2009
    Assignee: BASF SE
    Inventors: Raimund Mellies, Marc Boerner, Lucia Arnóld, Andrea Barko, Rudolf Rhein
  • COMPOSITION FOR THE REMOVAL OF SIDEWALL RESIDUES
    Publication number: 20080280803
    Abstract: The present invention relates to a composition for the removal of so-called sidewall residues from metal surfaces, in particular from aluminium or aluminium-containing surfaces, during the production of semiconductor elements.
    Type: Application
    Filed: June 5, 2008
    Publication date: November 13, 2008
    Inventors: Raimund MELLIES, Marc Boerner, Lucia Arnold, Andrea Barko, Rudolf Rhein
  • Composition for the removing of sidewall residues
    Patent number: 7417016
    Abstract: The present invention relates to a composition for the removal of so-called “sidewall residues” from metal surfaces, in particular from aluminium or aluminium-containing surfaces, in particular from aluminium or aluminium-containing surfaces, during the production of semiconductor elements.
    Type: Grant
    Filed: May 27, 2003
    Date of Patent: August 26, 2008
    Assignee: BASF SE
    Inventors: Raimund Mellies, Marc Boerner, Lucia Arnold, Andrea Barko, Rudolf Rhein
  • Composition for the removing of sidewall residues
    Publication number: 20060086372
    Abstract: The present invention relates to a composition for the removal of so-called “sidewall residues” from metal surfaces, in particular from aluminium or aluminium-containing surfaces, in particular from aluminium or aluminium-containing surfaces, during the production of semiconductor elements.
    Type: Application
    Filed: May 27, 2003
    Publication date: April 27, 2006
    Inventors: Raimund Mellies, Marc Boerner, Lucia Arnold, Andrea Barko, Rudolf Rhein