Patents by Inventor Marc Christopher Kryger

Marc Christopher Kryger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SYSTEMS FOR PARSING MATERIAL PROPERTIES FROM WITHIN SHG SIGNALS
    Publication number: 20220317060
    Abstract: Semiconductor metrology systems based on directing radiation on a wafer, detecting second harmonic generated (SHG) radiation from the wafer and correlating the second harmonic generated (SHG) signal to one or more electrical properties of the wafer are disclosed. The disclosure also includes parsing the SHG signal to remove contribution to the SHG signal from one or more material properties of the sample such as thickness.
    Type: Application
    Filed: November 12, 2021
    Publication date: October 6, 2022
    Inventors: Viktor Koldiaev, Marc Christopher Kryger, John Paul Changala, Jianing Shi
  • Systems for parsing material properties from within SHG signals
    Patent number: 11199507
    Abstract: Semiconductor metrology systems based on directing radiation on a wafer, detecting second harmonic generated (SHG) radiation from the wafer and correlating the second harmonic generated (SHG) signal to one or more electrical properties of the wafer are disclosed. The disclosure also includes parsing the SHG signal to remove contribution to the SHG signal from one or more material properties of the sample such as thickness. Systems and methods described herein include machine learning methodologies to automatically classify obtained SHG signal.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: December 14, 2021
    Assignee: FemtoMetrix, Inc.
    Inventors: Viktor Koldiaev, Marc Christopher Kryger, John Paul Changala, Jianing Shi
  • SYSTEMS FOR PARSING MATERIAL PROPERTIES FROM WITHIN SHG SIGNALS
    Publication number: 20200408699
    Abstract: Semiconductor metrology systems based on directing radiation on a wafer, detecting second harmonic generated (SHG) radiation from the wafer and correlating the second harmonic generated (SHG) signal to one or more electrical properties of the wafer are disclosed. The disclosure also includes parsing the SHG signal to remove contribution to the SHG signal from one or more material properties of the sample such as thickness.
    Type: Application
    Filed: December 20, 2019
    Publication date: December 31, 2020
    Inventors: Viktor Koldiaev, Marc Christopher Kryger, John Paul Changala, Jianing Shi
  • Systems for parsing material properties from within SHG signals
    Patent number: 10551325
    Abstract: Semiconductor metrology systems based on directing radiation on a wafer, detecting second harmonic generated (SHG) radiation from the wafer and correlating the second harmonic generated (SHG) signal to one or more electrical properties of the wafer are disclosed. The disclosure also includes parsing the SHG signal to remove contribution to the SHG signal from one or more material properties of the sample such as thickness. Systems and methods described herein include machine learning methodologies to automatically classify obtained SHG signal data from the wafer based on an electrical property of the wafer.
    Type: Grant
    Filed: November 12, 2015
    Date of Patent: February 4, 2020
    Assignee: FemtoMetrix, Inc.
    Inventors: Viktor Koldiaev, Marc Christopher Kryger, John Paul Changala, Jianing Shi
  • SYSTEMS FOR PARSING MATERIAL PROPERTIES FROM WITHIN SHG SIGNALS
    Publication number: 20160131594
    Abstract: Semiconductor metrology systems based on directing radiation on a wafer, detecting second harmonic generated (SHG) radiation from the wafer and correlating the second harmonic generated (SHG) signal to one or more electrical properties of the wafer are disclosed. The disclosure also includes parsing the SHG signal to remove contribution to the SHG signal from one or more material properties of the sample such as thickness. Systems and methods described herein include machine learning methodologies to automatically classify obtained SHG signal data from the wafer based on an electrical property of the wafer.
    Type: Application
    Filed: November 12, 2015
    Publication date: May 12, 2016
    Inventors: Viktor Koldiaev, Marc Christopher Kryger, John Paul Changala, Jianing Shi