Patents by Inventor Marc D. Natter

Marc D. Natter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5352310
    Abstract: The three dimensional configuration of an article is generated from a plurality of sheets of polymer material having a base resin constituent, a reactive diluent constituent and a reaction modifying constituent which effects a latent change in chemical reactivity of the polymer material in an area of each sheet imaged with actinic radiation in the configuration of an incremental heighth of the article, successive sheets are exposed to actinic radiation corresponding to the configuration of successive incremental planar heighths of the article and are stacked in a matrix. The imaged areas of all sheets are thereafter simultaneously cured with heat or aging, the configuration of the article is separated from the remainder of the matrix by altering the dimensional stability of the uncured polymer material. The sheets may be initially positioned on a carrier web for transport through an apparatus for constructing the shape of an article.
    Type: Grant
    Filed: June 25, 1992
    Date of Patent: October 4, 1994
    Inventor: Marc D. Natter
  • Patent number: 5174843
    Abstract: A system for forming an article includes an apparatus for stacking successive sheets of a polymer mixture and selectively irradiating each sheet with an electron beam deflected to trace the configuraiton of an incremental heighth of the article. The polymer mixture may include a polymer resin mixed with a reactive diluent and, if required, an initiator. The stacked sheets form a matrix which supports the article as it is being shaped. After integration of all incremental heighths of the article, heat or chemical dissolution is employed to remove the matrix. The sheets may be a laminate of a stratum bonded to a substratum. The substratum is easily compressed under heat to reference the level of the upper surface of the sheet irrespective of thickness variations of the sheet. To compensate for beam intensity absorption, the substratum is formulated with increased sensitivity. Successive sheets are heated while being transported to a platen which is positioned beneath an electron gun.
    Type: Grant
    Filed: February 17, 1989
    Date of Patent: December 29, 1992
    Assignee: Honatech, Inc.
    Inventor: Marc D. Natter