Patents by Inventor Marc Delaunay

Marc Delaunay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11189752
    Abstract: A process for producing a structure (100) comprising a membrane (3) of a first material, in particular indium-tin oxide, in contact with receiving ends (13) of a plurality of nanowires (1), the process comprising forming a nanowire device (10) comprising the receiving ends (13), the receiving ends being formed so as to form planar surfaces, and (ii) placing, especially by transfer, a membrane device (3; 34) directly on the nanowires the planar surfaces of the ends for receiving the membrane.
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: November 30, 2021
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Bruno Daudin, Marc Delaunay
  • Patent number: 11075061
    Abstract: A device for producing an amorphous carbon layer by electron cyclotron resonance plasma, the device including a plasma chamber; a gas supply; a magnetic mirror; a waveguide extending along a reference axis; a system for injecting microwave power; a magnetic field generator for generating a magnetic field in the plasma chamber, the magnetic field generator being configured to create a beam of magnetic field lines along which plasma is diffused; a target made from carbon; a substrate holder, wherein the target is arranged at a distance from the reference axis of between Rtarget/2 and Rtarget, and wherein the device further includes a screen arranged between the waveguide and the substrate holder.
    Type: Grant
    Filed: October 25, 2016
    Date of Patent: July 27, 2021
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Marc Delaunay, Anne Ghis
  • Patent number: 11039255
    Abstract: A capacitive vibrating-membrane ultrasonic transducer includes a carrier with a cavity, a vibrating membrane fastened to the carrier and covering the cavity, and a conductive element separated from the membrane by the cavity. The vibrating membrane has a resonant frequency in membrane mode fm and a resonant frequency in plate mode fp according to the relationship fm>fp. An exciting circuit has terminals connected to the vibrating membrane and the conductive element, and is configured to apply, across its terminals, an electrical signal the maximum frequency fo according to the relationship fm>1.5*fo; or a measuring circuit is connected to the vibrating membrane and the conductive element and configured to measure capacitance variations up to a frequency fo.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: June 15, 2021
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Anne Ghis, Marc Delaunay
  • Publication number: 20200374636
    Abstract: A capacitive vibrating-membrane ultrasonic transducer includes a carrier with a cavity, a vibrating membrane fastened to the carrier and covering the cavity, and a conductive element separated from the membrane by the cavity. The vibrating membrane has a resonant frequency in membrane mode fm and a resonant frequency in plate mode fp according to the relationship fm>fp. An exciting circuit has terminals connected to the vibrating membrane and the conductive element, and is configured to apply, across its terminals, an electrical signal the maximum frequency fo according to the relationship fm>1.5*fo; or a measuring circuit is connected to the vibrating membrane and the conductive element and configured to measure capacitance variations up to a frequency fo.
    Type: Application
    Filed: December 20, 2019
    Publication date: November 26, 2020
    Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Anne GHIS, Marc DELAUNAY
  • Publication number: 20200028027
    Abstract: A process for producing a structure (100) comprising a membrane (3) of a first material, in particular indium-tin oxide, in contact with receiving ends (13) of a plurality of nanowires (1), the process comprising forming a nanowire device (10) comprising the receiving ends (13), the receiving ends being formed so as to form planar surfaces, and (ii) placing, especially by transfer, a membrane device (3; 34) directly on the nanowires the planar surfaces of the ends for receiving the membrane.
    Type: Application
    Filed: March 19, 2018
    Publication date: January 23, 2020
    Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Bruno Daudin, Marc Delaunay
  • Publication number: 20180315584
    Abstract: A device for producing an amorphous carbon layer by electron cyclotron resonance plasma, the device including a plasma chamber; a gas supply; a magnetic mirror; a waveguide extending along a reference axis; a system for injecting microwave power; a magnetic field generator for generating a magnetic field in the plasma chamber, the magnetic field generator being configured to create a beam of magnetic field lines along which plasma is diffused; a target made from carbon; a substrate holder, wherein the target is arranged at a distance from the reference axis of between Rtarget/2 and Rtarget, and wherein the device further includes a screen arranged between the waveguide and the substrate holder.
    Type: Application
    Filed: October 25, 2016
    Publication date: November 1, 2018
    Inventors: Marc DELAUNAY, Anne GHIS
  • Patent number: 9975755
    Abstract: A microelectromechanical system includes a membrane of amorphous carbon having a thickness between 1 nm and 50 nm, and for example between 3 nm and 20 nm.
    Type: Grant
    Filed: March 10, 2017
    Date of Patent: May 22, 2018
    Assignee: COMMISSARIAT À L'ÉNERGIE ATOMIQUE ET AUX ÉNERGIES ALTERNATIVES
    Inventors: Anne Ghis, Marc Delaunay
  • Publication number: 20170260041
    Abstract: A microelectromechanical system includes a membrane of amorphous carbon having a thickness between 1 nm and 50 nm, and for example between 3 nm and 20 nm.
    Type: Application
    Filed: March 10, 2017
    Publication date: September 14, 2017
    Inventors: Anne GHIS, Marc DELAUNAY
  • Publication number: 20090152473
    Abstract: The invention relates to a photon source comprising an electron cyclotron resonance (ECR) multicharged ion plasma source, the multicharged ions corresponding to several charge states of a first constituent (g1) inserted into a vacuum chamber (CH), and at least one charge state emitting photons with a wavelength ?o by de-excitation, wherein means set up a pressure gradient within the chamber (CH) of the first constituent (g1) and/or at least one second constituent (g2) different from the first constituent (g1), the pressure gradient being capable of creating an energy gradient of plasma electrons such that additional multicharged ions are created emitting photons with a wavelength equal to approximately ?o by de-excitation.
    Type: Application
    Filed: May 11, 2006
    Publication date: June 18, 2009
    Applicant: Commissariat A L'Energie Atomique
    Inventors: Denis Hitz, Marc Delaunay
  • Patent number: 7338554
    Abstract: The invention relates to a process for synthesizing nanorods of a carbide of one metal M1 on a substrate, which comprises: a) the deposition, on the substrate, of a layer of nanocrystals of oxide of the metal M1 and nanocrystals of oxide of at least one metal M2 different from metal M1, the M1 metal oxide nanocrystals being dispersed within this layer; b) the reduction of the M1 and M2 metal oxide nanocrystals into corresponding metal nanocrystals; and c) the selective growth of the M1 metal nanocrystals. The invention also relates to a process for growing nanorods of a carbide of one metal M1 on a substrate from nanocrystals of this metal, to the substrates thus obtained and to their applications: fabrication of Microsystems provided with chemical or biological functionalities, in particular the fabrication of biosensors; electron emission sources, for example for flat television or computer screens; etc.
    Type: Grant
    Filed: December 4, 2003
    Date of Patent: March 4, 2008
    Assignee: Commissariat a L'Energie Atomique
    Inventors: Marc Delaunay, Francoise Vinet
  • Patent number: 7303790
    Abstract: Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes (SWNTs) on a catalyst-free substrate, by injection of microwave power into a deposition chamber comprising a magnetic confinement structure with a magnetic mirror, and at least one electron cyclotron resonance area inside or at the border of the deposition chamber and facing the substrate, whereby dissociation and/or ionization of a gas containing carbon is caused, at a pressure of less than 10?3 mbars, in the magnetic mirror at the center of the deposition chamber, producing species that will be deposited on said heated substrate. The substrate surface includes raised and/or lowered reliefs. The invention concerns the SWNTs thus obtained.
    Type: Grant
    Filed: October 26, 2001
    Date of Patent: December 4, 2007
    Assignee: Commissariat A l'Energie Atomique
    Inventors: Marc Delaunay, Cyril Vannufel
  • Patent number: 7160585
    Abstract: A process makes at least one nanotube between two electrically conducting elements located on a substrate, using, inside a deposition chamber, a microwave power, a magnetic field, and at least one electronic cyclotron resonance zone faciliting ionization and/or dissociation of a gas containing carbon injected into the deposition chamber at a low pressure inside the deposition chamber, causing ionization and/or dissociation of this gas in each electronic cyclotron resonance zone. The ions and electrons produced are located along the field lines of the magnetic field set up in the deposition chamber. The process also includes a screening operation of the various species produced in each electronic cyclotron resonance zone to enable exclusive access of CxHy°non condensable free radicals produced to access a deposition zone adjacent to at least one part of the substrate including the two electrically conducting elements to make the nanotube.
    Type: Grant
    Filed: December 26, 2002
    Date of Patent: January 9, 2007
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Marc Delaunay, Anne Senillou, Marie-Noelle Semeria
  • Publication number: 20050271815
    Abstract: The invention relates to a process for synthesizing nanorods of a carbide of one metal M1 on a substrate, which comprises: a) the deposition, on the substrate, of a layer of nanocrystals of oxide of the metal M1 and nanocrystals of oxide of at least one metal M2 different from metal M1, the M1 metal oxide nanocrystals being dispersed within this layer; b) the reduction of the M1 and M2 metal oxide nanocrystals into corresponding metal nanocrystals; and c) the selective growth of the M1 metal nanocrystals. The invention also relates to a process for growing nanorods of a carbide of one metal M1 on a substrate from nanocrystals of this metal, to the substrates thus obtained and to their applications: fabrication of Microsystems provided with chemical or biological functionalities, in particular the fabrication of biosensors; electron emission sources, for example for flat television or computer screens; etc.
    Type: Application
    Filed: December 4, 2003
    Publication date: December 8, 2005
    Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE
    Inventors: Marc Delaunay, Francoise Vinet
  • Patent number: 6787200
    Abstract: Process and device for depositing, by electron cyclotron resonance plasma, a web of carbon nanofibres or nanotubes, on a substrate without a catalyst, by injection of a microwave power into a deposition chamber including a magnetic structure with a highly unbalanced magnetic mirror and at least one electron cyclotron resonance zone within the interior of the deposition chamber itself and opposite the substrate. Under a pressure of less than 10−4 mbar, ionization and/or dissociation of a gas containing carbon is induced in the magnetic mirror in the center of the deposition chamber, thus producing species that deposit on the substrate, which is heated.
    Type: Grant
    Filed: January 2, 2002
    Date of Patent: September 7, 2004
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Marc Delaunay, Marie-Noëlle Semeria
  • Publication number: 20040011291
    Abstract: Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes on a catalyst-free substrate, by injection of microwave power into a deposition chamber comprising a magnetic confinement structure with a magnetic mirror, and at least one electron cyclotron resonance area inside or at the border of said deposition chamber and facing said substrate, whereby dissociation and/or ionization of a gas containing carbon is caused, at a pressure of less than 10−3 mbars, in said magnetic mirror at the center of the deposition chamber, producing species that will be deposited on said heated substrate; process in which the substrate surface includes raised and/or lowered reliefs.
    Type: Application
    Filed: April 15, 2003
    Publication date: January 22, 2004
    Inventors: Marc Delaunay, Cyril Vannuffel
  • Publication number: 20030173206
    Abstract: This invention relates to a process for making at least one nanotube (2) between two electrically conducting elements (4) located on a substrate (8), the said process using microwave power in a deposition chamber (6), a gas containing organic molecules injected at low pressure inside the deposition chamber (6). According to the invention, the process also uses a magnetic field and at least one electronic cyclotron resonance zone (16) facilitating ionization and/or dissociation of the injected gas, the process also comprising a screening operation of the various species produced in each electronic cyclotron resonance zone (16), in order to exclusively enable CxHyo type non condensable free radicals to access the deposition zone (24) to make the said nanotube.
    Type: Application
    Filed: December 26, 2002
    Publication date: September 18, 2003
    Inventors: Marc Delaunay, Anne Senillou, Marie-Noelle Semeria
  • Patent number: 6337110
    Abstract: The present invention relates to a process for electron cyclotron resonance plasma deposition of electron-emitting carbon films, in which by injecting a microwave power into a plasma chamber incorporating an electron cyclotron resonance zone (9), ionization takes place of a gaseous mixture under a low pressure, the thus created ions and electrons diffusing along the magnetic field lines (6) to a substrate (3), the gaseous mixture comprising organic molecules and hydrogen molecules. Said process comprises the following stages: heating the substrate (3), creating a plasma from the ionized gaseous mixture, creating a potential difference between the plasma and the substrate, diffusion of the plasma up to the substrate (3) which, by heating, has reached a temperature such that said electron-emitting material is deposited on the substrate.
    Type: Grant
    Filed: June 11, 1999
    Date of Patent: January 8, 2002
    Assignee: Commissariat a l′ Energie Atomique
    Inventors: Marc Delaunay, Marie-Noëlle Semeria
  • Patent number: 6319372
    Abstract: A linear microwave plasma source comprises a leaktight chamber (10) under negative pressure and a microwave injection guide (12) that ends in a 90° elbow (13) opening perpendicularly into the chamber, a leaktight microwave window (15) being placed between the microwave injection guide (12) and the 90° elbow (13) such that they cause ionization of the gas in a zone (35) of electron cyclotron resonance located a few centimeters inside the elbow (13) that is under negative pressure. First and second permanent magnets (13, 17) are disposed on either side of said window (15), said magnets (16, 17) being installed with alternating polarity. A sputtering target (21) is located inside the plasma stream and electrically insulated from the chamber and charged with a negative polarity, and means (27) for injecting gas for controlling the ionic species of the plasma stream are provided.
    Type: Grant
    Filed: January 13, 1999
    Date of Patent: November 20, 2001
    Assignee: Commissariat a l'Energie Atomique
    Inventor: Marc Delaunay
  • Patent number: 5336961
    Abstract: A device for optimizing a source of ions with electronic cyclotronic resonance (ECR) is provided. The present invention comprises a conventional ECR source to which an apparatus is added for moving the resonance point (C) which appears in the dielectric pipe when the source is in operation. The controlled adjustment of the position of the resonance point (C) ensures an optimal positioning of points A and B of the equimagnetic surface, points (A) and (B) being dependent on point (C). The resonance displacement apparatus comprises, in one embodiment, a magnetic screw threaded onto its periphery so as to form a screw/nut system with the armouring of the ECR source. Particular utility is found in the area of particle accelerator equipment for use in scientific and medical applications, although other utilities are contemplated.
    Type: Grant
    Filed: May 1, 1992
    Date of Patent: August 9, 1994
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Bernard Jacquot, Marc Delaunay
  • Patent number: 5178763
    Abstract: The invention is directed to an apparatus and method for transforming a sterile pyrogen-free liquid into a substitution liquid using an exchanger. The method includes the steps of flowing first and second liquids over opposite sides of a semipermeable membrane, the first liquid being sterile and pyrogen-free. Both liquids contain at least some electrolytes of blood including at least a buffer agent or a precursor of a buffer agent. At least some of the electrolytes have different concentrations in the two liquids. When purifying blood by hemodiafiltration, this method has the particular advantage that, rather than discarding the second liquid, it can be used for hemodiafiltration.
    Type: Grant
    Filed: April 10, 1991
    Date of Patent: January 12, 1993
    Assignee: Hospal Industrie
    Inventor: Marc Delaunay