Patents by Inventor Marc Haast

Marc Haast has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080007844
    Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
    Type: Application
    Filed: September 7, 2007
    Publication date: January 10, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Haico Kok, Marcus Van De Kerhof, Borgert Kruizinga, Timotheus Sengers, Bearrach Moest, Marc Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
  • Publication number: 20060227310
    Abstract: A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
    Type: Application
    Filed: March 21, 2006
    Publication date: October 12, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Buurman, Thomas Castenmiller, Johannes Wilhelmus Teeuwsen, Bearrach Moest, Marc Haast
  • Publication number: 20060192093
    Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
    Type: Application
    Filed: February 28, 2005
    Publication date: August 31, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Haico Kok, Marcus Van De Kerhof, Borgert Kruizinga, Timotheus Sengers, Bearrach Moest, Marc Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf