Patents by Inventor Marc Hubertus Lorenz Van Der Velden

Marc Hubertus Lorenz Van Der Velden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, and device manufacturing method
    Patent number: 7928412
    Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
    Type: Grant
    Filed: March 17, 2009
    Date of Patent: April 19, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn, Yurii Victorovitch Sidelnikov, Marc Hubertus Lorenz Van der Velden, Wouter Anthon Soer, Thomas Stein, Kurt Gielissen
  • Lithographic apparatus, and device manufacturing method
    Patent number: 7629594
    Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: December 8, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn, Yurii Victorovitch Sidelnikov, Marc Hubertus Lorenz Van Der Velden, Wouter Anthon Soer, Thomas Stein, Kurt Gielissen
  • Lithographic Apparatus, and Device Manufacturing Method
    Publication number: 20090173360
    Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
    Type: Application
    Filed: March 17, 2009
    Publication date: July 9, 2009
    Applicants: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Maarten Marinus Johannes Wilhelmus VAN HERPEN, Vadim Yevgenyevich BANINE, Johannes Peterus Henricus DE KUSTER, Johannes Hubertus Josephina MOORS, Lucas Henricus Johannes STEVENS, Bastiaan Theodoor WOLSCHRIJN, Yurii Victorovitch SIDELNIKOV, Marc Hubertus Lorenz VAN DER VELDEN, Wouter Anthon SOER, Thomas STEIN, Kurt Gielissen
  • Lithographic apparatus, system and device manufacturing method
    Patent number: 7491951
    Abstract: The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.
    Type: Grant
    Filed: December 28, 2005
    Date of Patent: February 17, 2009
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Marc Hubertus Lorenz Van Der Velden, Vadim Yevgenyevich Banine, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Markus Weiss, Bastiaan Theodoor Wolschrijn, Michiel D. Nijkerk
  • Lithographic apparatus, and device manufacturing method
    Publication number: 20080083885
    Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
    Type: Application
    Filed: October 10, 2006
    Publication date: April 10, 2008
    Applicants: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn, Yurii Victorovitch Sidelnikov, Marc Hubertus Lorenz Van Der Velden, Wouter Anton Soer, Thomas Stein, Kurt Gielissen
  • Lithographic apparatus and device manufacturing method
    Patent number: 7279690
    Abstract: A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: October 9, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Frank Jeroen Pieter Schuurmans, Givi Georgievitch Zukavishvili, Bastiaan Theodoor Wolschrijn, Marc Hubertus Lorenz Van Der Velden