Patents by Inventor Marc J. Olivares

Marc J. Olivares has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography correction method and device
    Patent number: 6783904
    Abstract: A method (10) for correcting lithography error includes generating (18) data that defines relationships between at least one predetermined design layout parameter and a known minimum required lithographic process capability (e.g. minimum feature spacing), and then using the data to upsize (30) predetermined isolated features or portions of predetermined isolated or semi-isolated features. In some embodiments, the resulting wafer circuit pattern (70) has isolated features (71, 72, 74) that are all larger than a predetermined minimum width. The upsized features are larger in the wafer circuit pattern (70) than they are drawn in a designed database. The method for correcting the lithography error, in some embodiments, is stored on a computer readable storage medium.
    Type: Grant
    Filed: May 17, 2002
    Date of Patent: August 31, 2004
    Assignee: Freescale Semiconductor, Inc.
    Inventors: Kirk J. Strozewski, Kevin D. Lucas, Marc J. Olivares, Chi-Min Yuan
  • Lithography correction method and device
    Publication number: 20030213613
    Abstract: A method (10) for correcting lithography error includes generating (18) data that defines relationships between at least one predetermined design layout parameter and a known minimum required lithographic process capability (e.g. minimum feature spacing), and then using the data to upsize (30) predetermined isolated features or portions of predetermined isolated or semi-isolated features. In some embodiments, the resulting wafer circuit pattern (70) has isolated features (71, 72, 74) that are all larger than a predetermined minimum width. The upsized features are larger in the wafer circuit pattern (70) than they are drawn in a designed database. The method for correcting the lithography error, in some embodiments, is stored on a computer readable storage medium.
    Type: Application
    Filed: May 17, 2002
    Publication date: November 20, 2003
    Inventors: Kirk J. Strozewski, Kevin D. Lucas, Marc J. Olivares, Chi-Min Yuan