Patents by Inventor Marc Klosner
Marc Klosner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8942265Abstract: In one embodiment, the instant invention provides a method that includes: outputting a first laser beam having: a beam quality factor (M2) between 1 and 5, and a spectral width of less than 0.15 nm, where the outputting is performed by a laser generating component that includes a alexandrite laser oscillator; converting the first laser beam through a first Raman cell to produce a second laser beam, where the first Raman cell is filled with a first gas; and converting the second laser beam through a second Raman cell to produce a final laser beam, where the second Raman cell is filled with a second gas and is operationally positioned after the first Raman cell, where the first gas and the second gas are different gasses, and where the final laser beam having: a second energy of at least 1 mJ, and at least one wavelength longer than 2.5 micron.Type: GrantFiled: July 22, 2013Date of Patent: January 27, 2015Assignee: Light Age, Inc.Inventors: Donald F. Heller, Marc Klosner, Brian A. Pryor, Thangavel Thevar, Bruce Boczar
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Publication number: 20140376573Abstract: In one embodiment, the instant invention provides a method that includes: outputting a first laser beam having: a beam quality factor (M2) between 1 and 5, and a spectral width of less than 0.15 nm, where the outputting is performed by a laser generating component that includes a alexandrite laser oscillator; converting the first laser beam through a first Raman cell to produce a second laser beam, where the first Raman cell is filled with a first gas; and converting the second laser beam through a second Raman cell to produce a final laser beam, where the second Raman cell is filled with a second gas and is operationally positioned after the first Raman cell, where the first gas and the second gas are different gasses, and where the final laser beam having: a second energy of at least 1 mJ, and at least one wavelength longer than 2.5 micron.Type: ApplicationFiled: July 22, 2013Publication date: December 25, 2014Applicant: Light Age, Inc.Inventors: Donald F. Heller, Marc Klosner, Brian A. Pryor, Thangavel Thevar, Bruce Boczar
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Patent number: 8494012Abstract: In one embodiment, the instant invention provides a method that includes: outputting a first laser beam having: a beam quality factor (M2) between 1 and 5, and a spectral width of less than 0.15 nm, where the outputting is performed by a laser generating component that includes a alexandrite laser oscillator; converting the first laser beam through a first Raman cell to produce a second laser beam, where the first Raman cell is filled with a first gas; and converting the second laser beam through a second Raman cell to produce a final laser beam, where the second Raman cell is filled with a second gas and is operationally positioned after the first Raman cell, where the first gas and the second gas are different gasses, and where the final laser beam having: a second energy of at least 1 mJ, and at least one wavelength longer than 2.5 micron.Type: GrantFiled: April 5, 2012Date of Patent: July 23, 2013Assignee: Light Age, Inc.Inventors: Donald F. Heller, Marc Klosner, Brian A. Pryor, Thangavel Thevar, Bruce Boczar
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Publication number: 20120314722Abstract: In one embodiment, the instant invention provides a method that includes: outputting a first laser beam having: a beam quality factor (M2) between 1 and 5, and a spectral width of less than 0.15 nm, where the outputting is performed by a laser generating component that includes a alexandrite laser oscillator; converting the first laser beam through a first Raman cell to produce a second laser beam, where the first Raman cell is filled with a first gas; and converting the second laser beam through a second Raman cell to produce a final laser beam, where the second Raman cell is filled with a second gas and is operationally positioned after the first Raman cell, where the first gas and the second gas are different gasses, and where the final laser beam having: a second energy of at least 1 mJ, and at least one wavelength longer than 2.5 micron.Type: ApplicationFiled: April 5, 2012Publication date: December 13, 2012Inventors: Don F. Heller, Marc Klosner, Brian A. Pryor, Thangavel Thevar, Bruce Boczar
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Publication number: 20070139791Abstract: An optimized illumination system that efficiently produces uniform illumination for exposure, photoablation, and laser crystallization systems. The illumination system includes a homogenizer that uniformizes and shapes a light beam, which is directed onto a mask by condenser optics. The illumination system recycles radiation by directing light reflected by the mask back into the illumination system, where an apertured mirror situated at the input end re-directs it back toward the mask. The relative mirror and aperture sizes affect recycling efficiency and system throughput, so the system features a wide recycling segment enabling greater mirror-to-aperture area ratios. An added segment at the output end of the homogenizer matches the homogenizer diameter to the projection imaging system object field size. This standardizes the homogenizer and condenser lens construction system, reducing the need for customized parts and thus reducing manufacturing time and expense.Type: ApplicationFiled: December 18, 2006Publication date: June 21, 2007Applicant: Anvik CorporationInventors: Shyam Raghunandan, Kanti Jain, Marc Zemel, Marc Klosner, Sivarama Kuchibhotla
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Publication number: 20070024830Abstract: A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.Type: ApplicationFiled: August 30, 2006Publication date: February 1, 2007Inventors: Sivarama Kuchibhotla, Kanti Jain, Marc Klosner
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Publication number: 20060012766Abstract: A versatile maskless patterning system with capability for selecting rapidly among a plurality of projection lenses mounted on a turret. This provides the ability to rapidly select multiple choices for resolution and enables optimization of the combination of the imaging resolution and exposure throughput, making possible cost-effective fabrication of microelectronics packaging products. A preferred embodiment uses a digital micromirror device array spatial light modulator as a virtual mask. Another preferred embodiment use multiple closely spaced digital micromirror device array spatial light modulators to enhance throughput.Type: ApplicationFiled: July 13, 2004Publication date: January 19, 2006Inventors: Marc Klosner, Kanti Jain
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Publication number: 20060001845Abstract: An optimized illumination system that efficiently produces uniform illumination for exposure, photoablation, and laser crystallization systems. The illumination system includes a homogenizer that uniformizes and shapes a light beam, which is directed onto a mask by condenser optics. The illumination system recycles radiation by directing light reflected by the mask back into the illumination system, where an apertured mirror situated at the input end re-directs it back toward the mask. The relative areas of the mirror and aperture affect recycling efficiency and system throughput, so the system features a larger-diameter recycling segment enabling greater mirror-to-aperture area ratios. An added segment at the output end of the homogenizer matches the homogenizer diameter to the projection imaging system object field size. This standardizes the homogenizer and condenser lens integration, reducing the need for customized parts and thus reducing manufacturing time and expense.Type: ApplicationFiled: June 29, 2004Publication date: January 5, 2006Applicant: Anvik CorporationInventors: Shyam Raghunandan, Kanti Jain, Marc Zemel, Marc Klosner, Sivarama Kuchibhotla
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Publication number: 20050122494Abstract: A Zerogon, a zero power identical pair of oppositely-oriented meniscus lens elements mounted in the illumination light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The Zerogon, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence parameters and resolution capabilities of projection lithography. This novel optical device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration in any generic optical system.Type: ApplicationFiled: December 9, 2003Publication date: June 9, 2005Inventors: Sivarama Kuchibhotla, Kanti Jain, Marc Klosner